Abstract:
A novel fluid delivery system includes a mounting panel, where the mounting panel includes channels that define the flow of fluid between any flow-control components mounted on the mounting panel. The mounting panel comprises a top plate and a bottom plate, and the channels are carved out of the underside of the top plate and are enclosed by the bottom plate. In a complex fluid delivery system having many fluid channels, the mounting panel may include one or more interior panels with additional channels carved out of the interior plates to accommodate all routing paths. The channels run in two or more directions to connect two or more gas/channel sticks together.
Abstract:
A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated (210) with either an organic compound resistant to attack by atomic fluorine or a material capable of being passivated by atomic fluorine. The device is then exposed to a gas that decomposes into active fluorine compounds (220) when activated by a plasma discharge. One example of such a gas is CF4, an inert gas that is easier and safer to work with than volatile gases like CIF3. The gas will passivate the material (if applicable) and corrode any exposed silicon. The device is tested (230) in such a manner that any unacceptable corrosion of the wetted path will cause the device to fail. If the device operates properly, the wetted path is deemed to be resistant to corrosion by fluorine or other corrosive compounds, as applicable.
Abstract:
A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated with either (1) an organic compound resistant to attack by atomic fluorine or (2) a material capable of being passivated by atomic fluorine. The device is then exposed to a gas that decomposes into active fluorine compounds when activated by a plasma discharge. One example of such a gas is CF 4 , an inert gas that is easier and safer to work with than volatile gases like ClF 3 . The gas will passivate the material (if applicable) and corrode any exposed silicon. The device is tested in such a manner that any unacceptable corrosion of the wetted path will cause the device to fail. If the device operates properly, the wetted path is deemed to be resistant to corrosion by fluorine or other corrosive compounds, as applicable.
Abstract:
A method of correcting drift in a sensor includes the step of identifying a calibration command. A nominal zero pressure sensor drift correction factor for the sensor is identified by relying upon a calibration voltage value and a calibration temperature value secured at a nominal zero pressure condition. Sensor output is subsequently adjusted according to the nominal zero pressure sensor drift correction factor.
Abstract:
A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated with either (1) an organic compound resistant to attack by atomic fluorine or (2) a material capable of being passivated by atomic fluorine. The device is then exposed to a gas that decomposes into active fluorine compounds when activated by a plasma discharge. One example of such a gas is CF 4 , an inert gas that is easier and safer to work with than volatile gases like ClF 3 . The gas will passivate the material (if applicable) and corrode any exposed silicon. The device is tested in such a manner that any unacceptable corrosion of the wetted path will cause the device to fail. If the device operates properly, the wetted path is deemed to be resistant to corrosion by fluorine or other corrosive compounds, as applicable.