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公开(公告)号：DE2756619A1
公开(公告)日：1978-07-20
申请号：DE2756619
申请日：1977-12-19
Applicant: SONY CORP
Inventor： OGISU KENJI , ENOMOTO MASAHISA
Abstract: In a process for electrodeposition of a metal or alloy, there is provided in a fused salt electrolytic bath a rotary drum device comprising a relatively rotatable cooling drum and scraper, salt particles deposited on the surface of the cooling drum being scraped off within the bath and dispersed in the bath thereby to assist the production of a smooth and compact electrodeposit.
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公开(公告)号：CA1055879A
公开(公告)日：1979-06-05
申请号：CA236614
申请日：1975-09-29
Applicant: SONY CORP
Inventor： TOKUMOTO SHIN-ICHI , TANAKA EIJI , OGISU KENJI , ENOMOTO MASAHISA
Abstract: An electolyzer is provided with a vessel containing an electrolyte and in which a lower temperature portion and a higher temperature portion are respectively defined, and with stirring devices or the like for forming circular flows of the electrolyte within the lower and higher temperature portions respectively and for circulating the electrolyte between the lower and higher temperature portions to permit the electrolysis to be carried out.
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公开(公告)号：DE2543454A1
公开(公告)日：1976-04-22
申请号：DE2543454
申请日：1975-09-29
Applicant: SONY CORP
Inventor： TOKUMOTO SHIN-ICHI , TANAKA EIJI , OGISU KENJI , ENOMOTO MASAHISA
Abstract: An electrolyzer is provided with a vessel containing an electrolyte and in which a lower temperature portion and a higher temperature portion are respectively defined, and with stirring devices or the like for forming circular flows of the electrolyte within the lower and higher temperature portions respectively and for circulating the electrolyte between the lower and higher temperature portions to permit the electrolysis to be carried out.
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公开(公告)号：CA1104519A
公开(公告)日：1981-07-07
申请号：CA293382
申请日：1977-12-19
Applicant: SONY CORP
Inventor： OGISU KENJI , ENOMOTO MASAHISA
Abstract: In a process for electrodeposition of a metal or alloy, there is provided in a fused salt electrolytic bath a rotary drum device comprising a relatively rotatable cooling drum and scraper, salt particles deposited on the surface of the cooling drum being scrapped off within the bath and dispersed in the bath thereby to assist in the production of a smooth and compact electrodeposit.
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公开(公告)号：AU8529475A
公开(公告)日：1977-04-07
申请号：AU8529475
申请日：1975-09-30
Applicant: SONY CORP
Inventor： TOKYMOTO SHIN-ICHI , TANAKA EIJI , OGISU KENJI , ENOMOTO MASAHISA
Abstract: An electrolyzer is provided with a vessel containing an electrolyte and in which a lower temperature portion and a higher temperature portion are respectively defined, and with stirring devices or the like for forming circular flows of the electrolyte within the lower and higher temperature portions respectively and for circulating the electrolyte between the lower and higher temperature portions to permit the electrolysis to be carried out.
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Patent Agency Ranking
公开(公告)号：JPH06338456A
公开(公告)日：1994-12-06
申请号：JP12979993
申请日：1993-05-31
Applicant: SONY CORP
Inventor： KAWAI HIROHARU , ENOMOTO MASAHISA , WADA SHINICHI
IPC: H01L21/205
Abstract: PURPOSE:To allow stable vapor growth which provides uniform film thickness by dividing a material gas introducing part for a vapor growth reaction chamber, in which a substrate is arranged, into a plurality of parts. CONSTITUTION:A substrate 1 whereupon vapor phase growth is to be performed is arranged in a tube-shaped vapor growth reaction chamber. A material gas introducing part 3 which introduces material gas by separating the gas is air- tightly connected at the edge of the vapor growth reaction chamber 2. A plurality of recessed parts 5 separated by isolating walls 4 are formed, and material gas introducing ports 6 are arranged at the bottom. Each material gas introducing port 6 is connected with a material gas introducing pipe 12 formed of stainless steel, for example, and the pipe 12 is supplied with material gas by a material gas distributor 7. Thus, vapor phase growing speed for the substrate 1 is uniformized and vapor phase growing which provides uniform film thickness is performed.
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公开(公告)号：JPH0667132A
公开(公告)日：1994-03-11
申请号：JP35591491
申请日：1991-12-21
Applicant: SONY CORP
Inventor： MATSUI ERIKO , ENOMOTO MASAHISA , YASUDA AKIO , NITO KEIICHI , TAKANASHI HIDEHIKO , MIYASHITA MAYUMI , KATAOKA NOBUE
IPC: G02F1/13
Abstract: PURPOSE:To uniformly form the gap between the glass substrates of a liquid crystal display element at a prescribed value with good accuracy by specifying the surface roughness of the pressurizing surface of the jig for pressure adhering to a specific value or below. CONSTITUTION:The jig 10 for pressure adhering is constituted of a lower metallic plate 1a, an upper metallic plate 1b parallel therewith and guide rods 2a, 2b erecting perpendicularly on the lower metallic plate 1a. Holes are so bored in the upper metallic plate 1b that the guide rods 2a, 2b are fitted therein. The surface roughness of the opposite surfaces of the lower metallic plate 1a and the upper metallic plate 1b is specified to 0.4S pr smaller surface roughness specified by the requirements specified in JIS(Japanese Industrial Standards) B0601, i.e., 0.4mum or smaller in order to control the gap between the glass substrates to 1.4mum+ or -0.1mum at the time of assembling the liquid crystal element for which, for example, a ferroelectric liquid crystal is used. Such metallic plates 1a, 1b are produced preferably of a material having a high hardness; for example, plates of alloy tool steel SKS-3 provided with titanium layers of 4mum thickness on the surfaces to be formed as pressurizing surfaces thereof are usable.
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公开(公告)号：JPS5229403A
公开(公告)日：1977-03-05
申请号：JP10571975
申请日：1975-09-01
Applicant: SONY CORP
Inventor： TOKUMOTO SHINICHI , TANAKA EIJI , OGISU KENJI , ENOMOTO MASAHISA
Abstract: PURPOSE:The captioned sealing device suitable for rotary cathodes or the like in obtaining metal Ti or metal Al by molten salt electroysis.
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公开(公告)号：JP2006287256A
公开(公告)日：2006-10-19
申请号：JP2006166986
申请日：2006-06-16
Inventor： KAWAI HIROHARU , ENOMOTO MASAHISA
IPC: H01L21/205 , C23C16/455 , C23C16/46 , C30B25/10
Abstract: PROBLEM TO BE SOLVED: To provide a chemical vapor deposition equipment which can realize optimized gas composition and growth condition for obtaining good crystals in epitaxial growth of a GaN system semiconductor. SOLUTION: The chemical vapor deposition equipment has a plurality of susceptors 7 arranged on one periphery, a plurality of gas passages for supplying reactant gas toward the susceptor 7, and a heating means for heating the susceptor 7, wherein the heating means is composed of a circular optical source 30, and a circular reflectors 32a and 33a for collecting the light, which the optical source 30 emits, to the susceptor. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种能够实现优化的气体组成和生长条件以在GaN系半导体的外延生长中获得良好晶体的化学气相沉积设备。 解决方案：化学气相沉积设备具有设置在一个周边的多个基座7，用于向基座7供应反应气体的多个气体通道和用于加热基座7的加热装置，其中加热装置是 由圆形光源30和用于将光源30发射的光收集到基座的圆形反射器32a和33a组成。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2000097887A
公开(公告)日：2000-04-07
申请号：JP27204398
申请日：1998-09-25
Applicant: SONY CORP
Inventor： RYU KOSUKE , KUDO YOSHIHIRO , KAWATO SEIJI , ENOMOTO MASAHISA
IPC: G01N23/223 , G21K1/06
Abstract: PROBLEM TO BE SOLVED: To reduce a size as the whole analyzer, and to stably conduct inspection. SOLUTION: This analyzer 10 has a hollow part 14a, and is provided with a chamber 14 arranged with an object W inside the hollow part 14a, an excitation light source 17 for irradiating the object W with an excited ray to inspect the object W, a detector 16 arranged in a position facing to the object W to inspect a surface of the object W, an object holding part 15 arranged inside the chamber 14 to hold movably the object W for adjusting a positional relation between the object W and an optical axis of the excited ray, and a rotation mechanism 13 for holding rotatably the chamber 14 to change an angle between the object W and the optical axis of the excited ray.
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