Abstract:
Disclosed is a semiconductor device capable of realizing a reduction in the area of each pixel without degrading noise resistance. A switching transistor (13) and a signal accumulation capacitor (15) are formed on a semiconductor substrate (base semiconductor region) (11) of a first conduction type, on the basis of each unit region for constituting a pixel Px. The switching transistor (13) has a structure in which a source region (13S) and a drain region (13D) of a second conduction type are formed on the semiconductor substrate (11), and a gate electrode (13G) is formed on the region between the source region (13S) and the drain region (13D), with an insulating layer (12a) therebetween. The signal accumulation capacitor (15) has a structure in which high-concentration semiconductor regions (15D) and (15S) of the first conduction type are formed on the semiconductor substrate (11), and an electrode (15G) is formed on the region between the semiconductor regions (15D) and (15S), with an insulating layer (12b) therebetween. A structure may be adopted in which a bias semiconductor region (17) is not provided, and the semiconductor regions (15D) and (15S) are made to serve also as the bias semiconductor region.
Abstract:
A data slice circuit (30) capable of generating an optimal data slice level and separating data for VBI signals of different specifications, provided with a line detection circuit (33) for detecting any line on which a VBI signal having a CRI signal is superposed and outputting a line detection pulse only during the period and detecting any line on which a VBI signal having a reference signal is superposed and outputting another line detection pulse only during that period, a window pulse generation circuit (34) for outputting pulses changing a period of averaging the VBI signal in accordance with the detection pulses, a data slice reference voltage detection circuit (35) for sampling and holding an average voltage of the clamped VBI signal only while the output pulses are at a high level "H", and a data slice level generation circuit (37) for adding a direct current voltage changed in accordance with the detection pulsed to the output voltage.
Abstract:
Der Zweck der vorliegenden Erfindung besteht darin, eine Phasenmodulationsvorrichtung, eine Beleuchtungsvorrichtung und einen Projektor bereitzustellen, bei denen es möglich ist, die Beugungseffizienz eines optischen Phasenmodulationselements zu verbessern. Eine Phasenmodulationsvorrichtung gemäß der vorliegenden Erfindung umfasst zum Beispiel ein optisches Phasenmodulationselement, das eine Vielzahl von Pixeln (10) aufweist und das die Phase von Licht auf Pixelbasis moduliert, wobei die Vielzahl von Pixeln (10) mit wechselseitig unterschiedlichen Pixelpitches p angeordnet ist, um eine Pixelstruktur zu bilden, die das Erzeugen von Beugungsstrahlen hoher Ordnung unterdrückt. Außerdem umfasst die Phasenmodulationsvorrichtung gemäß der vorliegenden Erfindung optische Erfassungssysteme (91, 92, 93, 310), die eine Vielzahl von Beugungsstrahlen hoher Ordnung, die an den einzelnen Pixeln erzeugt werden, erfassen.
Abstract:
Disclosed is a semiconductor device capable of realizing a reduction in the area of each pixel without degrading noise resistance. A switching transistor (13) and a signal accumulation capacitor (15) are formed on a semiconductor substrate (base semiconductor region) (11) of a first conduction type, on the basis of each unit region for constituting a pixel Px. The switching transistor (13) has a structure in which a source region (13S) and a drain region (13D) of a second conduction type are formed on the semiconductor substrate (11), and a gate electrode (13G) is formed on the region between the source region (13S) and the drain region (13D), with an insulating layer (12a) therebetween. The signal accumulation capacitor (15) has a structure in which high-concentration semiconductor regions (15D) and (15S) of the first conduction type are formed on the semiconductor substrate (11), and an electrode (15G) is formed on the region between the semiconductor regions (15D) and (15S), with an insulating layer (12b) therebetween. A structure may be adopted in which a bias semiconductor region (17) is not provided, and the semiconductor regions (15D) and (15S) are made to serve also as the bias semiconductor region.
Abstract:
A data slice circuit (30) capable of generating an optimal data slice level and separating data for VBI signals of different specifications, provided with a line detection circuit (33) for detecting any line on which a VBI signal having a CRI signal is superposed and outputting a line detection pulse only during the period and detecting any line on which a VBI signal having a reference signal is superposed and outputting another line detection pulse only during that period, a window pulse generation circuit (34) for outputting pulses changing a period of averaging the VBI signal in accordance with the detection pulses, a data slice reference voltage detection circuit (35) for sampling and holding an average voltage of the clamped VBI signal only while the output pulses are at a high level "H", and a data slice level generation circuit (37) for adding a direct current voltage changed in accordance with the detection pulsed to the output voltage.
Abstract:
A method for inspecting a semiconductor substrate constituting a liquid crystal display by reliably detecting a change in potential due to a failure of a pixel cell driver circuit irrespective of the decreased ratio of the pixel capacitance to the wiring capacitance because of the small size of the display and higher definition. The method comprises a charge retaining step of allowing pixel capacitors connected to pixel switches selected from among all the pixel switches connected to one data line to retain the charge and a detecting step for simultaneously detecting the charge retained by the pixel capacitors at the charge retaining step from the one data line.
Abstract:
Two voltages for scanning a scanning line, i.e., AVD1 below a gate breakdown voltage of a switching element and AVD2 over the gate breakdown voltage are selectively used. After the scanning of a scanning line by the AVD1 is started, a data line is precharged. Thereafter, the scanning voltage is changed to the AVD2. At this change, a voltage corresponding to the precharging voltage is generated in a pixel capacitor. Therefore, even if the AVD2 over the gate breakdown voltage is applied to the pixel switch, it is possible to cause a potential difference not exceeding the breakdown voltage between the terminals of the switching element.
Abstract:
Disclosed is a semiconductor device capable of realizing a reduction in the area of each pixel without degrading noise resistance. A switching transistor (13) and a signal accumulation capacitor (15) are formed on a semiconductor substrate (base semiconductor region) (11) of a first conduction type, on the basis of each unit region for constituting a pixel Px. The switching transistor (13) has a structure in which a source region (13S) and a drain region (13D) of a second conduction type are formed on the semiconductor substrate (11), and a gate electrode (13G) is formed on the region between the source region (13S) and the drain region (13D), with an insulating layer (12a) therebetween. The signal accumulation capacitor (15) has a structure in which high-concentration semiconductor regions (15D) and (15S) of the first conduction type are formed on the semiconductor substrate (11), and an electrode (15G) is formed on the region between the semiconductor regions (15D) and (15S), with an insulating layer (12b) therebetween. A structure may be adopted in which a bias semiconductor region (17) is not provided, and the semiconductor regions (15D) and (15S) are made to serve also as the bias semiconductor region.
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid crystal display device whose picture quality is improved by reducing a coupling noise and a jump-in noise with an adjacent wire or an element and which can be treated as a defect-free device by being imparted with redundancy even when a wiring short circuit of a pixel is generated. SOLUTION: Display pixels are arranged on respective intersections of a plurality of vertical signal lines and a plurality of horizontal signal lines. At the same time, shield lines are arranged along the respective vertical and horizontal signal lines. Furthermore, the potential of the shield lines is set to be a value with which the display pixel is displayed in black. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To miniaturize the size of a semiconductor substrate by improving the layout of pixel cells. SOLUTION: The respective pixel cells are constituted of pixel switches M 20 to M 23 selected by gate lines, pixel electrodes into which image data is written from data lines D 20 and D 21 through the selected pixel switches, and pixel capacitors CS 20 to CS 23 which are connected to the pixel switches and hold the image data. The pixel cells, one pair of which is arranged symmetrically with a horizontal scanning direction as one unit, are arranged in a matrix form. The boundaries between the pixel capacitors adjacent to each other in a vertical scanning direction are made of the same arrangement in all the pixel cells. Also, the pixel cells, one pair of which are arranged symmetrically with the vertical scanning direction as one unit, are arranged in the matrix form and the data lines D 20 and D 21 connected to the drains D of the transistors constituting the respective pixel switches are wired adjacently in parallel to each other and are always driven at the same timing. COPYRIGHT: (C)2005,JPO&NCIPI