Abstract:
PROBLEM TO BE SOLVED: To provide a display device capable of confining defect generated between an inter-electrode insulation film formed between electrodes, and an upper electrode to the minimum, for example, in one pixel, by dividing the inter-electrode insulation film between lower electrodes, and between lower electrode and an auxiliary electrode. SOLUTION: On the display device 1, an organic EL element 31 having an organic layer 33 between the upper electrode 34 and the lower electrode 32 is formed on a second insulation layer 23 made of inorganic insulation film at every pixels, and the inter-electrode insulation layer 41 is arranged between adjacent lower electrodes 32, 32, and between the lower electrode 32 and the auxiliary electrode 35. The inter-electrode insulation layer 41 is divided at an area laid between lower electrodes 32, and between lower electrode 32 and an auxiliary electrode 35, and the second insulation layer 23 made of inorganic insulation film is connected to the upper electrode 34 at the area where the inter-electrode insulation layer 41 is divided. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method for a display device capable of suppressing generation of removing gas from a planarizing insulation film in a process of baking the insulation film between electrodes, with low cost and high reliability. SOLUTION: The planarizing insulation film 13 which is composed of photosensitive resin such as polyimide or polybenzoxazole is formed and baked on a board for driving 11. A plurality of first electrodes 14 are formed on the planarizing insulation film 13 and an insulation film 15 between electrodes which is composed of photosensitive resin such as polyimide or polybenzoxazole is formed and baked in a region between the first electrodes 14. By setting a temperature for baking the planirizing insulator film 13 higher than the temperature for baking the insulation film 15 between electrodes, the generation of removing gas from the planarizing insulation film 13 is suppressed in the process of baking the insulation film 15 between electrodes, and surfaces of the first electrodes 14 and the insulation film 15 between electrodes are prevented to get rough. Thereafter, an organic layer 16 including a light emitting layer and second electrodes 17 are sequentially formed on the plurality of first electrodes 14. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a donor substrate which can enhance the fabrication yield of organic light emitting element, and to provide a method of fabricating the same. SOLUTION: The donor substrate 2 has a reflective layer 32A patterned in a region 40B corresponding to blue, a light and heat conversion layer 34 formed on the entire surface of a supporting substrate 30 to cover the reflective layer 32A, and a reflective layer 32B patterned in a region 40R corresponding to red sequentially from the surface of the supporting substrate. When laser light L is irradiated from the surface of the supporting substrate 30, the laser light L is reflected on the reflective layer 32B in the region 40R corresponding to red and light and heat conversion is carried out by the light and heat conversion layer 34 in the region other than the region 40R corresponding to red. When the laser light L is irradiated from the backside of the supporting substrate 30, the laser light L is reflected on the reflective layer 32B in the region 40B corresponding to blue and light and heat conversion is carried out by the light and heat conversion layer 34 in the region other than the region 40B corresponding to blue. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a display device in which light extraction efficiency from a light emitting element to the outside can be enhanced furthermore.SOLUTION: The display device includes (A) a first substrate 11 on which a plurality of light-emitting elements 10, each formed by laminating a first electrode 21, a light-emitting part 23 composed of an organic layer including a luminous layer and a second electrode 22, are formed, and (B) a second substrate 34 disposed above the second electrode 22. The first substrate 11 includes a light reflection layer 50 consisting of a first member 51 which propagates the light from each light-emitting element 10 to the outside, and a second member 52 filling between the first members 51. Following relations 1.1≤n≤1.8 and n-n≥0.20 are satisfied, where nis the refractive index of the first member 51, and nis the refractive index of the second member 52. On the surface of the second member 52 facing the first member 51, the light propagating on the first member 51 is reflected at least partially.
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a display device, and the display device having a long light emitting service life and superior productivity, and capable of reducing non-lighting defects of each organic EL devices. SOLUTION: The display device is provided with a plurality of pixel apertures W arranged and formed on an insulating film on a board, and a rib 16a comprised by projecting one part of the insulating film 16 upward. A device comprised by holding an organic layer 18 between a lower electrode 15 and an upper electrode is provided in the pixel aperture W. The manufacturing method of the display device has a process of forming a plurality of the lower electrodes 15 corresponding to each device on the board, a process of forming the insulating film 16 on the board in a state covering the lower electrodes 15, and a process of forming the pixel aperture W reaching the lower electrode 15 in the insulating film 16 by lithographic treatment of carrying out pattern exposure with partially controlled light exposure, and forming the rib 16a comprised by projecting one part of the insulating film 16 upward by partially removing an upper part of the insulating film 16 between pixel apertures W to form a step shape. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a display device capable of forming an auxiliary wiring connected to an upper electrode of an organic EL element without complicating a lamination structure and increasing the number of processes, and to provide a manufacturing method of the same. SOLUTION: The display device 1' comprises a plurality of lower electrodes 9 formed into pattern on respective pixels on a substrate 3; an auxiliary wiring 9 composed of a layer same with the lower electrode 9, arranged so as to keep an insulating property against the lower electrode 9; an insulation film 17 formed on the substrate 3 having pixel openings A making a central part of the lower electrode 9 exposed and connection holes 17a coming up to the auxiliary wiring 9a; organic layers 11B, 11G, 11R covering a bottom part of the pixel openings A, formed into pattern in a state that a part of end part overlaps with each other between adjacent pixels; and the upper electrode 13 covering the organic layers 11B, 11G, 11R, connected to the auxiliary wiring 9a through the connection holes 17a between the organic layers 11B, 11G, 11R. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To reduce the warp of a wafer and prevent the microcrack development and break of the wafer by relaxing the stress caused in previous step by a preheater on the wafer and then moving it onto a susceptor. SOLUTION: A wafer 2 being moved from a carrier to a susceptor 3 is laid on a preheater 6 where the stress caused in previous step is removed and then the wafer is laid on the susceptor 3. The wafer before being laid on the carrier 1 is at nearly room temp. while the susceptor is at about 400 deg.C and preheater 6 at about 200 deg.C. The residence time of the wafer on the preheater 6 is about 11.5sec.
Abstract:
PROBLEM TO BE SOLVED: To provide a display device in which short circuit of the side surface of a first electrode and a second electrode is limited while reducing the material and the number of manufacturing steps.SOLUTION: An unbaked mask is formed in a first electrode formation region by forming a photosensitive material film on a first electrode material film and then subjecting the photosensitive material to first time exposure and first time development. After forming a first electrode by etching the first electrode material film by using the unbaked mask, the unbaked mask is subjected to second time exposure and second time development thus forming a second insulating film 14 on the upper surface of a first electrode 13 at the peripheral part thereof. The second insulating film 14 has an eaves 14C stretching farther than the side surface 13A of the first electrode 13.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device by which a terminal can be easily taken out with a usual process facility, and a flexible display can be easily manufactured without degradation of its characteristics. SOLUTION: An element layer and terminals 38 are formed on a glass substrate, are covered with a protective film 34, and then, double sealers 39, 40 are applied thereon. After sealing the element layer by forming a filler inside the sealer 39, a flexible substrate is pasted on the sealers 39, 40 and the filler. After removing the glass substrate, a flexible substrate is pasted on the exposed face. The flexible substrates are cut along the line which is drawn through outside the element layer and the terminals 38 and inside the sealer 40, and then the filler-side flexible substrate is cut along the line which is drawn through outside the sealer 39 and base side of the terminals 38 to its crossing direction. By removal of the protective film 34 at an outside part of the flexible substrate, the terminals 38 are made exposed. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a display unit that controls film thickness distribution of a transcriptional light emitting layer within a luminous region and improves the level of display quality. SOLUTION: A transcribed substrate 11 and a donor substrate 40 are so arranged that they face each other with an insulating layer 14 in between, and a laser beam is irradiated to sublimate or evaporize a transfer layer 50 and transcribe it at least to a luminous region 13A. Assuming an intersection of a tangent to the insulating layer 14 drawn from the edge of the luminous region 13A and the surface of the donor substrate 40 is A, and an intersection between a perpendicular drawn from A to the transcribed substrate 11 and the surface of the insulating substrate 14 is C, the light emitting layer 15C is formed so as to include C and preferably not to include D. The film thickness distribution of the light emitting layer 15C within the luminous region 13A and color mixture into the adjacent luminous region 13A are controlled, thus improving the display quality. The distance d in a direction to a line between an edge 13B of the luminous region 13A and the contact surface of the insulating layer 14 and the donor substrate 40 should preferably be 4 μm or more. COPYRIGHT: (C)2008,JPO&INPIT