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公开(公告)号:EP2333807A2
公开(公告)日:2011-06-15
申请号:EP10275127.8
申请日:2010-12-14
Applicant: SPP Process Technology Systems UK Limited
Inventor: Macneil, John , Bennet, Paul George
IPC: H01J27/02
CPC classification number: H01J27/022 , H01J37/24 , H01J2237/0206 , H01J2237/08 , H01J2237/3146
Abstract: This invention relates an ion beam source (10) for use with a non-electrical conducting target (14) including a grid (13) for extracting ions and a power supply for supplying pulsed power to the grid (13) to extract the ions.
Abstract translation: 本发明涉及一种用于非导电靶(14)的离子束源(10),其包括用于提取离子的栅极(13)和用于向栅极(13)提供脉冲功率以提取离子的电源。
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公开(公告)号:EP2333807A3
公开(公告)日:2015-11-18
申请号:EP10275127.8
申请日:2010-12-14
Applicant: SPP Process Technology Systems UK Limited
Inventor: Macneil, John , Bennet, Paul George
CPC classification number: H01J27/022 , H01J37/24 , H01J2237/0206 , H01J2237/08 , H01J2237/3146
Abstract: This invention relates an ion beam source (10) for use with a non-electrical conducting target (14) including a grid (13) for extracting ions and a power supply for supplying pulsed power to the grid (13) to extract the ions.
Abstract translation: 本发明涉及一种用于包括用于提取离子的栅格(13)和用于向栅格(13)提供脉冲功率以提取离子的电源的非导电目标(14)的离子束源(10)。
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