公开(公告)号：EP2237309B1

公开(公告)日：2019-10-02

申请号：EP10154656.2

申请日：2010-02-25

Applicant: SPP Process Technology Systems UK Limited

Inventor： Ansell, Oliver ,  Barrass, Anthony ,  Bennett, Paul ,  Tossell, David

IPC: H01J37/32 ,  H01L21/67

公开(公告)号：EP2237309A2

公开(公告)日：2010-10-06

申请号：EP10154656.2

申请日：2010-02-25

Applicant: SPP Process Technology Systems UK Limited

Inventor： Ansell, Oliver ,  Barrass, Anthony ,  Bennett, Paul ,  Tossell, David

IPC: H01L21/00

CPC classification number: H01L21/67253 ,  H01J37/32917 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J37/32981 ,  H01J37/3299

Abstract: Apparatus for chemically etching a Workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a Workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the Workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.

Abstract translation: 用于化学蚀刻工件的设备包括用于接收处理气体并具有用于抽取废气的泵送端口的室，以及位于泵送端口上游的室中的工件支撑件。 腔室还包括位于泵送端口的上游并且在工件支撑件下游的子室，并且子室包括与窗口相邻的窗口和激发源，用于在废气样本中产生等离子体 产生可以通过窗口监测的光发射。

公开(公告)号：EP2237309A3

公开(公告)日：2011-08-03

申请号：EP10154656.2

申请日：2010-02-25

Applicant: SPP Process Technology Systems UK Limited

Inventor： Ansell, Oliver ,  Barrass, Anthony ,  Bennett, Paul ,  Tossell, David

IPC: H01L21/00

CPC classification number: H01L21/67253 ,  H01J37/32917 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J37/32981 ,  H01J37/3299

Abstract: Apparatus for chemically etching a Workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a Workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the Workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.