公开(公告)号：JPH05267430A

公开(公告)日：1993-10-15

申请号：JP33743092

申请日：1992-12-17

Applicant: ST MICROELECTRONICS SRL

Inventor： CANESTRARI PAOLO ,  CARRERA SAMUELE ,  RIVERA GIOVANNI

IPC: G01B21/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

Abstract: PURPOSE: To directly measure errors by using a metrologic means for accurate statistic research of alignment. CONSTITUTION: A first measuring and statistical analysis procedure which naturally accompanies a position measurement along the X-axis of an n-th processed alignment making 21 and an n-th metrological alignment marking 22a by an alignment system, if Pn, Aan, Abn and Acn are relative positions of elements forming an array. The overall error includes the errors at detecting the positions of the processed marking 21 and metrologic making 22, however, the error is always small. The relative distance value of the pair of metrologic markings 22 is determined. When a comparatively large no. of samples or relative distance measurements are obtd., the mean error of the distance between the markings 22 is obtd., thus enabling direct measurement of the errors.

公开(公告)号：IT1252539B

公开(公告)日：1995-06-19

申请号：ITMI913385

申请日：1991-12-18

Applicant: ST MICROELECTRONICS SRL

Inventor： CANESTRARI PAOLO ,  CARRERA SAMUELE ,  RIVERA GIOVANNI

IPC: G01B21/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  H01L

Abstract: Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems, whose peculiarity consists in forming, on the same substrate, metrological alignment markings (4,15) and processed alignment markings (5,18) in arrays of preset numerical size.