2.
    发明专利
    未知

    公开(公告)号:ITMI991768A1

    公开(公告)日:2001-02-05

    申请号:ITMI991768

    申请日:1999-08-05

    Abstract: A partially transparent layer made of phase shift material having octagonal window (17), is placed over the quartz plate of the attenuated phase shifting mask (Att.PSM). Independent claims are also included for the following: (1) method of defining contacts on integrated circuit device using electromagnetic wave; and (2) integrated circuit contact.

    3.
    发明专利
    未知

    公开(公告)号:ITMI991768D0

    公开(公告)日:1999-08-05

    申请号:ITMI991768

    申请日:1999-08-05

    Abstract: A partially transparent layer made of phase shift material having octagonal window (17), is placed over the quartz plate of the attenuated phase shifting mask (Att.PSM). Independent claims are also included for the following: (1) method of defining contacts on integrated circuit device using electromagnetic wave; and (2) integrated circuit contact.

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