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公开(公告)号:DE69913337T2
公开(公告)日:2004-10-07
申请号:DE69913337
申请日:1999-07-26
Applicant: ST MICROELECTRONICS SRL
Inventor: GOMIERO ENRICO , PIO FEDERICO
Abstract: The programming method comprises supplying a turnoff voltage to the source terminal of the selected cells when writing the cells. The turnoff voltage is a positive voltage of greater amplitude than the absolute value of the threshold voltage of the most written cell, i.e., the most depleted cell, taking into account the body effect. For example, the turnoff voltage may be 1 V greater than the absolute value of the threshold voltage of the most written cell. Advantageously, the turnoff voltage may be 5-6 V; to take into account the process, supply, and temperature variations, the turnoff voltage may be 7-8 V. The programming method is advantageously applicable to EEPROM memory devices with divided source lines, so as to apply the turnoff voltage only to the addressed byte or bytes, or to the page containing the addressed byte.
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公开(公告)号:DE69941829D1
公开(公告)日:2010-01-28
申请号:DE69941829
申请日:1999-04-21
Applicant: ST MICROELECTRONICS SRL
Inventor: GOMIERO ENRICO , PIO FEDERICO , ZULIANI PAOLA
Abstract: A non-volatile memory portion (1) includes a matrix of memory cells (2) comprising rows as the wordlines (WL) and columns as the bit-lines (BL). Control circuitry (3) includes a program voltage generator (7), an adjuster (25) of the voltage (Vst) applied to the matrix rows, a first adjuster (4) of an erase voltage (VppE) and a second adjuster (5) of a write voltage (VppW). The program voltage during the erasing phase is set higher than during the writing phase. An independent claim is also included for a process of fabricating a semiconductor non-volatile memory including forming a bit-switch element inside a well and a byte switch element directly in the substrate.
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公开(公告)号:DE69913337D1
公开(公告)日:2004-01-15
申请号:DE69913337
申请日:1999-07-26
Applicant: ST MICROELECTRONICS SRL
Inventor: GOMIERO ENRICO , PIO FEDERICO
Abstract: The programming method comprises supplying a turnoff voltage to the source terminal of the selected cells when writing the cells. The turnoff voltage is a positive voltage of greater amplitude than the absolute value of the threshold voltage of the most written cell, i.e., the most depleted cell, taking into account the body effect. For example, the turnoff voltage may be 1 V greater than the absolute value of the threshold voltage of the most written cell. Advantageously, the turnoff voltage may be 5-6 V; to take into account the process, supply, and temperature variations, the turnoff voltage may be 7-8 V. The programming method is advantageously applicable to EEPROM memory devices with divided source lines, so as to apply the turnoff voltage only to the addressed byte or bytes, or to the page containing the addressed byte.
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公开(公告)号:DE69932703T2
公开(公告)日:2007-09-06
申请号:DE69932703
申请日:1999-04-21
Applicant: ST MICROELECTRONICS SRL
Inventor: GOMIERO ENRICO , PIO FEDERICO , ZULIANI PAOLA
Abstract: A non-volatile memory portion (1) includes a matrix of memory cells (2) comprising rows as the wordlines (WL) and columns as the bit-lines (BL). Control circuitry (3) includes a program voltage generator (7), an adjuster (25) of the voltage (Vst) applied to the matrix rows, a first adjuster (4) of an erase voltage (VppE) and a second adjuster (5) of a write voltage (VppW). The program voltage during the erasing phase is set higher than during the writing phase. An independent claim is also included for a process of fabricating a semiconductor non-volatile memory including forming a bit-switch element inside a well and a byte switch element directly in the substrate.
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公开(公告)号:DE69932703D1
公开(公告)日:2006-09-21
申请号:DE69932703
申请日:1999-04-21
Applicant: ST MICROELECTRONICS SRL
Inventor: GOMIERO ENRICO , PIO FEDERICO , ZULIANI PAOLA
Abstract: A non-volatile memory portion (1) includes a matrix of memory cells (2) comprising rows as the wordlines (WL) and columns as the bit-lines (BL). Control circuitry (3) includes a program voltage generator (7), an adjuster (25) of the voltage (Vst) applied to the matrix rows, a first adjuster (4) of an erase voltage (VppE) and a second adjuster (5) of a write voltage (VppW). The program voltage during the erasing phase is set higher than during the writing phase. An independent claim is also included for a process of fabricating a semiconductor non-volatile memory including forming a bit-switch element inside a well and a byte switch element directly in the substrate.
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公开(公告)号:DE60119483D1
公开(公告)日:2006-06-14
申请号:DE60119483
申请日:2001-01-24
Applicant: ST MICROELECTRONICS SRL
Inventor: PIO FEDERICO , GOMIERO ENRICO
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