PULSED GROWTH OF GAN NANOWIRES AND APPLICATIONS IN GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE MATERIALS AND DEVICES

    公开(公告)号:MY149865A

    公开(公告)日:2013-10-31

    申请号:MYPI20083234

    申请日:2007-03-09

    Applicant: STC UNM

    Abstract: EXEMPLARY EMBODIMENTS PROVIDE SEMICONDUCTOR DEVICES INCLUDING HIGH-QUALITY (I.E., DEFECT FREE) GROUP III-N NANOWIRES AND UNIFORM GROUP III-N NANOWIRE ARRAYS AS WELL AS THEIR SCALABLE PROCESSES FOR MANUFACTURING, WHERE THE POSITION, ORIENTATION, CROSS-SECTIONAL FEATURES, LENGTH AND THE CRYSTALLINITY OF EACH NANOWIRE CAN BE PRECISELY CONTROLLED. A PULSED GROWTH MODE CAN BE USED TO FABRICATE THE DISCLOSED GROUP III-N NANOWIRES AND/OR NANOWIRE ARRAYS PROVIDING A UNIFORM LENGTH OF ABOUT 10 NM TO ABOUT 1000 MICRONS WITH CONSTANT CROSS-SECTIONAL FEATURES INCLUDING AN EXEMPLARY DIAMETER OF ABOUT 10-1000 NM. IN ADDITION, HIGH-QUALITY GaN SUBSTRATE STRUCTURES CAN BE FORMED BY COALESCING THE PLURALITY OF GaN NANOWIRES AND/OR NANOWIRE ARRAYS TO FACILITATE THE FABRICATION OF VISIBLE LEDs AND LASERS. FURTHERMORE, CORE-SHELL NANOWIRE/MQW ACTIVE STRUCTURES CAN BE FORMED BY A CORE-SHELL GROWTH ON THE NONPOLAR SIDEWALLS OF EACH NANOWIRE AND CAN BE CONFIGURED IN NANOSCALE PHOTOELECTRONIC DEVICES SUCH AS NANOWIRE LEDs AND/OR NANOWIRE LASERS TO PROVIDE TREMENDOUSLY-HIGH EFFICIENCIES.

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