公开(公告)号：DE60201599T2

公开(公告)日：2005-11-10

申请号：DE60201599

申请日：2002-05-21

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS JOSEF ,  VERHOEVEN JAN ,  DEN HARTOG JOHANNES

IPC: G21K1/06

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

公开(公告)号：DE60201599D1

公开(公告)日：2004-11-18

申请号：DE60201599

申请日：2002-05-21

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS JOSEF ,  VERHOEVEN JAN ,  DEN HARTOG JOHANNES

IPC: G21K1/06

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.