公开(公告)号：NL1018139C2

公开(公告)日：2002-11-26

申请号：NL1018139

申请日：2001-05-23

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS MARCUS JOZEF HENRICUS ,  VERHOEVEN JAN ,  HARTOG MARKUS JOHANNES HARMEN

IPC: G21K1/06 ,  G02B5/28

公开(公告)号：DE60201599D1

公开(公告)日：2004-11-18

申请号：DE60201599

申请日：2002-05-21

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS JOSEF ,  VERHOEVEN JAN ,  DEN HARTOG JOHANNES

IPC: G21K1/06

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

公开(公告)号：NL1034039C2

公开(公告)日：2008-12-30

申请号：NL1034039

申请日：2007-06-26

Applicant: STICHTING FUND OND MATERIAL

Inventor： WIEGGERS ROB CARLO ,  GOEDHEER WILLEM JAN ,  BIJKERK FREDERIK

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：AT279775T

公开(公告)日：2004-10-15

申请号：AT02736274

申请日：2002-05-21

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS MARCUS JOSEF HENRICUS ,  VERHOEVEN JAN ,  DEN HARTOG MARKUS JOHANNES HAR

IPC: G21K1/06

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

公开(公告)号：NL1032674C2

公开(公告)日：2008-04-15

申请号：NL1032674

申请日：2006-10-13

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  YAKSHIN ANDREY EVGENJEVICH ,  AKDIM MOHAMED REDA ,  KLEIJN AART WILLEM

IPC: G21K1/06 ,  G03F7/20 ,  H05G2/00

公开(公告)号：DE60201599T2

公开(公告)日：2005-11-10

申请号：DE60201599

申请日：2002-05-21

Applicant: STICHTING FUND OND MATERIAL

Inventor： BIJKERK FREDERIK ,  LOUIS ERIC ,  KESSELS JOSEF ,  VERHOEVEN JAN ,  DEN HARTOG JOHANNES

IPC: G21K1/06

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.