Double-sided semiconductor structure and method for manufacturing the same
    1.
    发明公开
    Double-sided semiconductor structure and method for manufacturing the same 有权
    Doppelseitige Halbleiterstruktur und Herstellungsverfahren

    公开(公告)号:EP2317553A1

    公开(公告)日:2011-05-04

    申请号:EP10188931.9

    申请日:2010-10-26

    Abstract: A semiconductor structure (100; 200; 300) comprising; a substrate (5; 302) of semiconductor material of a first type of conductivity; a first semiconductor layer (7) set in direct electrical contact with the substrate on a first side (2) of the substrate; a second semiconductor layer (8) set in direct electrical contact with the substrate on a second side (4) of the substrate; a first active electronic device (10; 303) formed in the first semiconductor layer (7); and a second active electronic device (12; 62; 305) formed in the second semiconductor layer (8).

    Abstract translation: 一种半导体结构(100; 200; 300),包括: 具有第一类导电性的半导体材料的衬底(5; 302); 在衬底的第一侧(2)上与衬底直接电接触的第一半导体层(7); 在所述基板的第二侧(4)上与所述基板直接电接触的第二半导体层(8); 形成在第一半导体层(7)中的第一有源电子器件(10; 303)。 和形成在第二半导体层(8)中的第二有源电子器件(12; 62; 305)。

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