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公开(公告)号:EP3984944A1
公开(公告)日:2022-04-20
申请号:EP21202712.2
申请日:2021-10-14
Applicant: STMicroelectronics S.r.l.
Inventor: BONI, Nicolò , VINCIGUERRA, Lorenzo , CARMINATI, Roberto , MERLI, Massimiliano
Abstract: The MEMS device (1) is formed by a body (5) of semiconductor material, which defines a support structure (10); by a pass-through cavity (15) in the body, which is surrounded by the support structure; by a movable structure (20) suspended in the pass-through cavity; by an elastic structure (25), which extends in the pass-through cavity between the support structure (10) and the movable structure (20). The elastic structure has a first portion (25A) and a second portion (25B) and is subject, in use, to mechanical stress. The MEMS device is further formed by a metal region (45), which extends on the first portion (25A) of the elastic structure (25), and by a buried cavity (30) in the elastic structure, wherein the buried cavity extends between the first and the second portions of the elastic structure.
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公开(公告)号:EP3742506A1
公开(公告)日:2020-11-25
申请号:EP20176147.5
申请日:2020-05-22
Applicant: STMicroelectronics S.r.l.
Inventor: ASSANELLI, Davide , MARTINI, Irene , VINCIGUERRA, Lorenzo , LAZZARI, Carla Maria , FERRARINI, Paolo
IPC: H01L41/29 , H01L41/23 , H01L41/047 , H01L41/053 , B41J2/14
Abstract: A method for manufacturing a piezoelectric transducer (100) is disclosed, which comprises forming a bottom electrode (34, 40) on a semiconductor body (32), forming a piezoelectric element (36) on the bottom electrode, forming a protective layer (42) having a first opening (44) through which a portion of the piezoelectric element is exposed and a second opening (45) through which a portion of the bottom electrode is exposed, forming a conductive layer on the protective layer and within the first and second openings, and patterning the conductive layer to contextually form a top electrode (48) in electrical contact with the piezoelectric element at the first opening, a first biasing stripe (51) in electrical contact with the top electrode, and a second biasing stripe (52) in electrical contact with the bottom electrode at the second opening. A passivation layer (56) and metal contacts (61, 62) may be formed thereafter.
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