Method for detecting the presence of impurities on surfaces

    公开(公告)号:FR2673725A1

    公开(公告)日:1992-09-11

    申请号:FR9102547

    申请日:1991-03-04

    Abstract: The invention relates to the assessment of the presence or absence of contaminating materials It relates to a method in which the locations (39) to be studied are successively illuminated at the surface of an electrically conducting material (33), this illumination stimulating the photoelectric emission of material below each location. An electron collector device (41) measures the photoelectric current, and another electron collector (49), placed at a distance, makes it possible to compensate for the capacitive effects existing between the surface of the conducting material (33) and the first collector device (41). Application to the analysis of the surfaces of semiconductor wafers during the manufacture of integrated circuits.

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