公开(公告)号：GB2253051A

公开(公告)日：1992-08-26

申请号：GB9103563

申请日：1991-02-20

Applicant: TENCOR INSTRUMENTS

Inventor： STOKOWSKI STANLEY ,  WOLZE DAVID ,  NEUKERMANS ARMAND P

IPC: G01B11/06 ,  G01N23/227

Abstract: For determining the presence, and measuring the thickness of a contaminant layer on the surface of an electrically conductive material (33) such as a semiconductor, a metal or a metal silicide, a change in photoemission current from an illuminated spot on the surface is used to determine the presence and extent of a contaminant layer at the illuminated site (39). Compensation is provided for the effects of capacitive current and photovoltaic current. A pattern of illumination sites (39) on the surface of the conductor (33) can cover all points on the surface.

公开(公告)号：GB2253051B

公开(公告)日：1994-10-19

申请号：GB9103563

申请日：1991-02-20

Applicant: TENCOR INSTRUMENTS

Inventor： STOKOWSKI STANLEY ,  WOLZE DAVID ,  NEUKERMANS ARMAND P

IPC: G01B11/06 ,  G01N23/227 ,  G01B15/02

Abstract: Methods for determining the presence or absence of, and the thickness or other spacial extent of, a contaminant layer at each of a plurality of two or more sites on the surface of an electrically conductive material such as a semiconductor, a metal or a metal silicide. The invention uses a change in photoemission current from an illuminated spot on the surface to determine the presence and extent of a contaminant layer at the illuminated site. Compensation is provided for the effects of capacitive current and photovoltaic current. The invention provides a pattern of illumination sites on the conductor surface that can, if desired, cover all points on the surface.

公开(公告)号：FR2673725A1

公开(公告)日：1992-09-11

申请号：FR9102547

申请日：1991-03-04

Applicant: TENCOR INSTRUMENTS

Inventor： STANLEY STOKOWSKI ,  DAVID WOLZE ,  NEUKERMANS ARMAND P

IPC: G01B11/06 ,  G01N23/227

Abstract: The invention relates to the assessment of the presence or absence of contaminating materials It relates to a method in which the locations (39) to be studied are successively illuminated at the surface of an electrically conducting material (33), this illumination stimulating the photoelectric emission of material below each location. An electron collector device (41) measures the photoelectric current, and another electron collector (49), placed at a distance, makes it possible to compensate for the capacitive effects existing between the surface of the conducting material (33) and the first collector device (41). Application to the analysis of the surfaces of semiconductor wafers during the manufacture of integrated circuits.

公开(公告)号：DE4106841A1

公开(公告)日：1992-09-10

申请号：DE4106841

申请日：1991-03-04

Applicant: TENCOR INSTRUMENTS

Inventor： STOKOWSKI STANLEY ,  WOLZE DAVID ,  NEUKERMANS ARMAND P

IPC: G01B11/06 ,  G01N23/227

Abstract: Methods for determining the presence or absence of, and the thickness or other spacial extent of, a contaminant layer at each of a plurality of two or more sites on the surface of an electrically conductive material such as a semiconductor, a metal or a metal silicide. The invention uses a change in photoemission current from an illuminated spot on the surface to determine the presence and extent of a contaminant layer at the illuminated site. Compensation is provided for the effects of capacitive current and photovoltaic current. The invention provides a pattern of illumination sites on the conductor surface that can, if desired, cover all points on the surface.