Abstract:
integrated circuits are fabricated on a substrate 11 of gallium arsenide using a substrate emitter device structure. The use of gallium arsenide improves the speed of this family of bipolar integrated circuits, because the electron mobility of GaAs is greater than that of comparably doped silicon. Device isolation is accomplished by implant damage, increasing the circuit density. The substrate emitter bipolar implementation provides high noise immunity and simple layout, while power consumption is at a low level.
Abstract:
Photothermal effects of a material (10) may be detected and analyzed in order to identify and characterize the material (10). The material (10) is illuminated by a light (32) from a light source (34). The material (10) absorbs the light (32), causing an increase in temperature and size of the material (10). An atomic force probe tip (30) detects the increase in temperature and size of the material (10) in order to determine characteristic properties of the material (10). The characteristic properties of the material (10) are used in identifying the nature of the material (10).
Abstract:
integrated circuits are fabricated on a substrate 11 of gallium arsenide using a substrate emitter device structure. The use of gallium arsenide improves the speed of this family of bipolar integrated circuits, because the electron mobility of GaAs is greater than that of comparably doped silicon. Device isolation is accomplished by implant damage, increasing the circuit density. The substrate emitter bipolar implementation provides high noise immunity and simple layout, while power consumption is at a low level.
Abstract:
Photothermal effects of a material (10) may be detected and analyzed in order to identify and characterize the material (10). The material (10) is illuminated by a light (32) from a light source (34). The material (10) absorbs the light (32), causing an increase in temperature and size of the material (10). An atomic force probe tip (30) detects the increase in temperature and size of the material (10) in order to determine characteristic properties of the material (10). The characteristic properties of the material (10) are used in identifying the nature of the material (10).
Abstract:
A silicon-based microlaser formed of rare-earth-doped CaF₂ thin films has a semiconductor substrate material (2.40) and a CaF₂ film layers (234) grown on semiconductor substrate material (240). The CaF₂ film layer (234) is doped with a predetermined amount of rare-earth-dopant that is sufficient to cause a spectral emission from the CaF₂ film layer (234) having a narrow linewidth when the CaF₂ film layer (234) is optically or electrically pumped.