公开(公告)号：EP0680101A1

公开(公告)日：1995-11-02

申请号：EP95302967.5

申请日：1995-05-01

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Robinson, James E. ,  Belcher, James F. ,  Beratan, Howard R. ,  Frank, Steven N. ,  Hanson, Charles M. ,  Johnson, Paul O. ,  Kyle, Robert J.S. ,  Meissner, Edward G. ,  Owen, Robert A. ,  Shelton, Gail D. ,  Walker, William K.

IPC: H01L37/02 ,  H01L27/16

CPC classification number: G01J5/34 ,  H01L37/02 ,  Y10T29/49117 ,  Y10T29/49126 ,  Y10T29/49144

Abstract: A thermal detection system (10) includes a focal plane array (12), a thermal isolation structure (14), and an integrated circuit substrate (16). Focal plane array (12) includes thermal sensors (28), each having an associated thermal sensitive element (30). Thermal sensitive element (30) is coupled with one side to infrared absorber and common electrode assembly (36) and on the opposite side to an associated contact pad (20) disposed on the integrated circuit substrate (16). Reticulation kerfs (52a, 52b) separate adjacent thermal sensitive elements (30a, 30b, 30c) by a distance at least half the average width (44, 46) of a single thermal sensitive element (30a, 30b, 30c). A continuous, non-reticulated optical coating (38) may be disposed over thermal sensitive elements (30a, 30b, 30c) to maximize absorption of thermal radiation incident to focal plane array (12).

Abstract translation: 热检测器（10）包括焦平面阵列（12），热隔离结构（14）和集成电路基板（16）。 焦平面阵列（12）包括热传感器（28），每个具有相关联的热敏元件（30）。 热敏元件（30）与一侧耦合到红外线吸收器和公共电极组件（36），并且与设置在集成电路基板（16）上的相关接触焊盘（20）的相对侧耦合。 网状切口（52a，52b）将相邻的热敏元件（30a，30b，30c）分开距离为单个热敏元件（30a，30b，30c）的平均宽度（44,46）的至少一半。 连续的非网状光学涂层（38）可以设置在热敏元件（30a，30b，30c）之上，以最大程度地吸收入射到焦平面阵列（12）的热辐射。

公开(公告)号：EP0685573A1

公开(公告)日：1995-12-06

申请号：EP95105236.4

申请日：1995-04-07

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Belcher, James F. ,  Beratan, Howard R. ,  Johnson, Paul O.

IPC: C23F1/00 ,  C04B41/53 ,  B24B37/04

CPC classification number: B24B37/04 ,  C04B41/5353 ,  Y10S505/728

Abstract: A method of polishing ferroelectric materials and specifically perovskite materials and still more specifically barium strontium titanate wherein the surface to be polished is initially partially smoothened or planarized by mechanical abrading with final smoothening or planarization provided by a chemical polishing with a polishing wheel using an acidic solution containing essentially the acid, hydrogen peroxide and water. Preferred acids are perchloric acid, acetic acid, nitric acid and combinations thereof.

Abstract translation: 一种抛光铁电材料，特别是钙钛矿材料，更具体地说是钛酸钡锶的方法，其中待抛光的表面最初通过机械研磨部分地平滑化或平坦化，最终的平滑化或平坦化，通过使用酸性溶液的抛光轮进行化学抛光 基本上含有酸，过氧化氢和水。 优选的酸是高氯酸，乙酸，硝酸及其组合。