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    CLEANING METHOD AND CLEANING FLUID FOR AERATION BODIES
    1.
    发明专利
    CLEANING METHOD AND CLEANING FLUID FOR AERATION BODIES 未知

    公开(公告)号：AU2003205410A1

    公开(公告)日：2003-07-30

    申请号：AU2003205410

    申请日：2003-01-16

    Applicant: THONHAUSER CHRISTIAN A ,  FREY WILHELM

    Inventor： FREY WILHELM ,  THONHAUSER CHRISTIAN A

    IPC: B01F3/04 ,  B01F15/00 ,  B08B3/08 ,  B08B9/00 ,  B08B9/02 ,  C02F1/72 ,  C02F1/74 ,  C02F5/08 ,  C02F3/20 ,  B08B7/00

    Abstract: Disclosed is a method for cleaning aeration elements (1) provided with pores or bores in aerated basins (2) of wastewater treatment plants or water treatment plants. The aeration field (4) formed by the aeration elements (1) and the pipes (3) connecting said aeration elements to each other is completely filled with a cleaning agent in a fluid form by applying pressure that is high enough to send said cleaning agent through the pores or bores of the aeration elements (1). After applying the cleaning fluid on the pores or bores of the aeration elements (1) for a variable amount of time, the aeration field (4) is emptied again. In a further optional cleaning step, the aeration field (4) is cleaned once again with a rinsing fluid, preferably water. Also disclosed are the use of an alkaline cleaning agent with a pH value of at least 10, preferably 12, and advantageous compositions of the cleaning fluid used for cleaning aeration elements.

    ANTI-STICTION TECHNIQUE FOR ELECTROMECHANICAL SYSTEMS AND ELECTROMECHANICAL DEVICE EMPLOYING SAME
    2.
    发明申请
    ANTI-STICTION TECHNIQUE FOR ELECTROMECHANICAL SYSTEMS AND ELECTROMECHANICAL DEVICE EMPLOYING SAME 审中-公开
    机电系统的防伪技术及其使用的电子设备

    公开(公告)号：WO2006115592A8

    公开(公告)日：2007-11-01

    申请号：PCT/US2006008600

    申请日：2006-03-10

    Applicant: BOSCH GMBH ROBERT ,  ULM MARKUS ,  METZ MATTHIAS ,  STARK BRIAN ,  YAMA GARY ,  LUTZ MARKUS ,  PARTRIDGE AARON ,  FREY WILHELM

    Inventor： ULM MARKUS ,  METZ MATTHIAS ,  STARK BRIAN ,  YAMA GARY ,  LUTZ MARKUS ,  PARTRIDGE AARON ,  FREY WILHELM

    IPC: B81C1/00

    CPC classification number: B81C1/0096 ,  B81B3/0005 ,  B81C2201/112 ,  B82Y30/00 ,  H01L2224/13 ,  H01L2924/1461 ,  H01L2924/00

    Abstract: A mechanical structure is disposed in a chamber, at least a portion of which is defined by the encapsulation structure. A first method provides a channel cap having at least one preform portion disposed over or in at least a portion of an anti-stiction channel to seal the anti-stiction channel, at least in part. A second method provides a channel cap having at least one portion disposed over or in at least a portion of an anti-stiction channel to seal the anti-stiction channel, at least in part. The at least one portion is fabricated apart from the electromechanical device and thereafter affixed to the electromechanical device. A third method provides a channel cap having at least one portion disposed over or in at least a portion of the anti-stiction channel to seal an anti-stiction channel, at least in part. The at least one portion may comprise a wire ball, a stud, metal foil or a solder preform. A device includes a substrate, an encapsulation structure and a mechanical structure. An anti-stiction layer is disposed on at least a portion of the mechanical structure. An anti-stiction channel is formed in at least one of the substrate and the encapsulation structure. A cap has at least one preform portion disposed over or in at least a portion of the anti-stiction channel to seal the anti-stiction channel, at least in part.

    Abstract translation: 机械结构设置在室中，其至少一部分由封装结构限定。 第一种方法提供了一种通道盖，其具有至少部分地设置在防静电通道上方或至少一部分中的至少一个预制件部分，以密封抗静电通道。 第二种方法提供了通道盖，其具有至少部分地设置在防静电通道上方或至少一部分中的至少一部分，以密封抗静脉通道。 该至少一个部分与机电装置分开制造，然后固定在机电装置上。 第三种方法提供了通道盖，其具有至少部分地设置在抗静电通道上方或至少一部分中的至少一个部分，以密封抗静脉通道。 所述至少一个部分可以包括线球，螺柱，金属箔或焊料预制件。 一种器件包括衬底，封装结构和机械结构。 抗静电层设置在机械结构的至少一部分上。 在基板和封装结构中的至少一个中形成抗静电通道。 至少部分地，盖具有至少一个预制件部分设置在防静电通道的上方或其至少一部分中，以密封抗静电通道。

    METHOD FOR PRODUCING SURFACE MICROMECHANICAL STRUCTURES, AND SENSOR
    4.
    发明申请
    METHOD FOR PRODUCING SURFACE MICROMECHANICAL STRUCTURES, AND SENSOR 审中-公开
    方法：用于产生表面细观结构和SENSOR

    公开(公告)号：WO02062698A3

    公开(公告)日：2003-07-17

    申请号：PCT/DE0200397

    申请日：2002-02-04

    Applicant: BOSCH GMBH ROBERT ,  FISCHER FRANK ,  FREY WILHELM ,  METZGER LARS

    Inventor： FISCHER FRANK ,  FREY WILHELM ,  METZGER LARS

    IPC: B81B3/00 ,  B81C1/00 ,  G01P15/08 ,  G01P15/125

    CPC classification number: G01P15/125 ,  B81B2201/025 ,  B81C1/00619 ,  B81C2201/0112 ,  G01P15/0802 ,  G01P2015/0814

    Abstract: The invention relates to a method for producing surface micromechanical structures having a high aspect ratio. At least one sacrificial layer (20) is provided between a substrate (30) and a functional layer (10). Trenches (60, 61) are provided in said functional layer (10) by means of a plasma etching process, said trenches uncovering at least some surface areas (21, 22) of the sacrificial layer (20). According to the invention, a further layer (70) is deposited at least partially on the lateral walls of the trenches, but not on the uncovered surface areas (21, 22) of the sacrificial layer (20), in order to increase the aspect ratio of said trenches. The invention also relates to a sensor, especially an acceleration or rotational rate sensor.

    Abstract translation: 本发明涉及一种用于制造表面微机械结构具有高的纵横比，其特征在于，在基板（30）和一个功能层（10）的至少一个牺牲层（20）之间设置，其特征在于，在所述功能层（10）（由Palsma蚀刻沟槽 60，61）被提供，其中至少所述牺牲层（20）的某些表面区域（21，22）暴露。 根据本发明，在为了扩大至少在沟槽的侧壁上的部分的沟槽的深宽比但没有在牺牲层（20）的暴露表面区域（21，22），另外的层（70）沉积。 此外，本发明涉及一种，特别是加速或旋转速率传感器。

    THERMAL MEMBRANE SENSOR AND METHOD FOR THE PRODUCTION THEREOF
    5.
    发明申请
    THERMAL MEMBRANE SENSOR AND METHOD FOR THE PRODUCTION THEREOF 审中-公开
    热膜传感器及其生产方法

    公开(公告)号：WO9927325A2

    公开(公告)日：1999-06-03

    申请号：PCT/DE9803444

    申请日：1998-11-23

    Applicant: BOSCH GMBH ROBERT ,  HEYERS KLAUS ,  FREY WILHELM

    Inventor： HEYERS KLAUS ,  FREY WILHELM

    IPC: G01F1/68 ,  G01F1/684 ,  G01K7/02 ,  G01K7/16 ,  H01L35/34 ,  G01F

    CPC classification number: G01F1/6845 ,  G01K7/028

    Abstract: The invention relates to a method for producing a membrane sensor, especially a thermal membrane sensor, over a silicon substrate (1). A thin layer (4) comprised of silicon carbide or silicon nitride is deposited over an area (2) made of porous silicon which is configured in the surface of the substrate (1). Openings (5, 7) are then formed in said silicon carbide or silicon nitride layer (4), said layer extending to the porous silicon layer (2), by means of a dry etching method. Afterwards, semiconductor and circuit-board structures (6) are implanted in the upper surface of the membrane layer (4) by means of lithographic steps and the sacrificial layer (2) comprised of porous silicon is then removed by a suitable solvent, for example ammoniac. As a result, a cavity (8) is produced underneath the membrane layer (4) which thermally decouples the sensor membrane from the substrate (1).

    Abstract translation: 本发明涉及一种用于在硅衬底（1）上，特别是热膜传感器上制造膜传感器的方法。 在基板（1）区域的表面上形成碳化硅或氮化硅的薄层（4）（2）多孔硅的沉积，然后通过干法蚀刻开口（5,7）（在该碳化硅或氮化硅层4 ），其延伸到多孔氮化硅层（2）。 随后，通过平版印刷步骤的半导体和导体轨道结构（6）注入到薄膜层的（4），然后该牺牲层（2）用合适的溶剂多孔硅的，例如上表面 氨，删除。 这在膜层（4）的下面形成将传感器膜与基板（1）热分离的空腔（8）。

    IN-PLANE MECHANICALLY COUPLED MICROELECTROMECHANICAL TUNING FORK RESONATORS
    6.
    发明申请
    IN-PLANE MECHANICALLY COUPLED MICROELECTROMECHANICAL TUNING FORK RESONATORS 审中-公开
    平面机械耦合微电子机械调谐器谐振器

    公开(公告)号：WO2007046869A3

    公开(公告)日：2007-12-21

    申请号：PCT/US2006019531

    申请日：2006-05-19

    Applicant: BOSCH GMBH ROBERT ,  UNIV LELAND STANFORD JUNIOR ,  PAN ZHIYU ,  CHANDLER ROB NORRIS ,  LUTZ MARKUS ,  PARTRIDGE AARON ,  MATERNA VOLKER ,  YAMA GARY ,  FREY WILHELM

    Inventor： PAN ZHIYU ,  CHANDLER ROB NORRIS ,  LUTZ MARKUS ,  PARTRIDGE AARON ,  MATERNA VOLKER ,  YAMA GARY ,  FREY WILHELM

    IPC: H03H9/50 ,  H03H9/02

    CPC classification number: H03H9/505 ,  H03H9/0023 ,  H03H9/02338 ,  H03H9/2468 ,  H03H2009/02496

    Abstract: In one aspect, the present invention is directed to a resonator architecture including a plurality of in-plane vibration microelectromechanical resonators (for example, 2 or 4 resonators) that are mechanically coupled to provide, for example, a differential signal output. In one embodiment, the present invention includes four commonly shaped microelectromechanical tuning fork resonators (12, 14, 16, 18) (for example, tuning fork resonators having two or more rectangular-shaped or square-shaped tines). Each resonator is mechanically coupled to another resonator of the architecture. For example, each resonator of the architecture is mechanically coupled to another one of the resonators on one side or a corner of one of the sides. In this way, all of the resonators, when induced, vibrate at the same frequency.

    Abstract translation: 在一个方面，本发明涉及一种包括机械耦合以提供例如差分信号输出的多个平面内振动微机电谐振器（例如，2或4个谐振器）的谐振器结构。 在一个实施例中，本发明包括四个通常形状的微机电音叉谐振器（12,14,16,18）（例如，具有两个或更多个矩形或正方形形状的叉的音叉谐振器）。 每个谐振器机械耦合到该架构的另一谐振器。 例如，该架构的每个谐振器在其中一个侧面的一侧或拐角上机械耦合到另一个谐振器。 以这种方式，所有谐振器在被感应时以相同的频率振动。

    PROCEDIMIENTO DE LIMPIEZA Y LIQUIDO PARA CUERPOS DE VENTILACION.
    8.
    发明专利
    PROCEDIMIENTO DE LIMPIEZA Y LIQUIDO PARA CUERPOS DE VENTILACION. 未知

    公开(公告)号：ES2260602T3

    公开(公告)日：2006-11-01

    申请号：ES03702182

    申请日：2003-01-16

    Applicant: FREY WILHELM

    Inventor： FREY WILHELM

    IPC: B08B3/08 ,  B01F3/04 ,  B01F15/00 ,  B08B7/00 ,  B08B9/00 ,  B08B9/02 ,  C02F1/72 ,  C02F1/74 ,  C02F3/20 ,  C02F5/08

    Abstract: Procedimiento para la limpieza de elementos (1) de ventilación provistos con poros u orificios en tanques (2) ventilados de instalaciones de depuración de aguas residuales o de tratamiento de aguas, en el que se somete el campo (4) del ventilador formado por los elementos (1) de ventilación y las tuberías (3) que los unen a un líquido de limpieza, que se alimenta a través de tuberías adicionales, tales como por ejemplo tuberías (5) de caída, que unen el campo (4) del ventilador con una tubería (6) de distribución, y en el que está previsto una etapa de limpieza, en la que se llena el campo (4) del ventilador con el líquido de limpieza y a razones de presión, que provocan el paso del líquido de limpieza a través de los poros u orificios de los elementos (1) de ventilación, y en el que en una etapa de limpieza adicional tras un tiempo de acción variable del líquido de limpieza en los poros u orificios de los elementos (1) de ventilación vuelve a vaciarse el campo (4) del ventilador, caracterizado porque el líquido de limpieza contiene un agente para asegurar un medio alcalino con un valor de pH de al menos 10, preferiblemente 12.

    9.
    发明专利
    未知

    公开(公告)号：AT320323T

    公开(公告)日：2006-04-15

    申请号：AT03702182

    申请日：2003-01-16

    Applicant: FREY WILHELM

    Inventor： FREY WILHELM

    IPC: B01F3/04 ,  B01F15/00 ,  B08B3/08 ,  B08B9/00 ,  B08B9/02 ,  C02F1/72 ,  C02F1/74 ,  C02F5/08 ,  B08B7/00 ,  C02F3/20

    Abstract: Disclosed is a method for cleaning aeration elements (1) provided with pores or bores in aerated basins (2) of wastewater treatment plants or water treatment plants. The aeration field (4) formed by the aeration elements (1) and the pipes (3) connecting said aeration elements to each other is completely filled with a cleaning agent in a fluid form by applying pressure that is high enough to send said cleaning agent through the pores or bores of the aeration elements (1). After applying the cleaning fluid on the pores or bores of the aeration elements (1) for a variable amount of time, the aeration field (4) is emptied again. In a further optional cleaning step, the aeration field (4) is cleaned once again with a rinsing fluid, preferably water. Also disclosed are the use of an alkaline cleaning agent with a pH value of at least 10, preferably 12, and advantageous compositions of the cleaning fluid used for cleaning aeration elements.

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