公开(公告)号：MY177765A

公开(公告)日：2020-09-23

申请号：MYPI2015704259

申请日：2014-06-30

Applicant: TORAY INDUSTRIES

Inventor： INABA SACHIO ,  MURASE SEIICHIRO ,  SHIMIZU HIROJI ,  DAN KOUICHI ,  SUWA MITSUHITO

Abstract: A impurity-diffusing composition comprising (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. (In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 1 0 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m is 95:5 to 25:75.) Provided is a impurity-diffusing composition that is excellent in printability on a semiconductor substrate and impurity diffusibility thereinto, less prone to cracks during the process of firing and diffusion, and becomes, when fired, a fired film having sufficient masking properties for other impurity diffusion agents.

公开(公告)号：PH12015502750B1

公开(公告)日：2016-03-21

申请号：PH12015502750

申请日：2015-12-09

Applicant: TORAY INDUSTRIES

Inventor： INABA SACHIO ,  MURASE SEIICHIRO ,  SHIMIZU HIROJI ,  DAN KOUICHI ,  SUWA MITSUHITO

IPC: H01L21/225 ,  H01L31/068

Abstract: A impurity-diffusing composition comprising (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. (In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 1 to 6 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m = 95:5 to 25:75.) Provided is a impurity-diffusing composition that is excellent in printability on a semiconductor substrate and impurity diffusibility thereinto, less prone to cracks during the process of firing and diffusion, and becomes, when fired, a fired film having sufficient masking properties for other impurity diffusion agents.

公开(公告)号：MY193704A

公开(公告)日：2022-10-26

申请号：MYPI2017703830

申请日：2016-03-22

Applicant: TORAY INDUSTRIES

Inventor： MOTOSHIROMIZU TAKAHIRO ,  SAKAMOTO JUN ,  DAN KOUICHI ,  KOJIMA HIROJI ,  MATSUMOTO MAYUMI ,  SUZUKI KEN ,  KAWAKAMI TOMONORI

IPC: C08L67/00

Abstract: A polyester resin composition which exhibits a reduced amount of production of the acid component monomer and/or oligomers of the polyester is provided. In other words, the object of the present invention is achieved by the following means. (1) A polyester resin composition, wherein the surface roughness Ra of a capture plate is less than 0.150 ?m, as measured when a sample of the polyester resin composition is melt at 300?C for 60 minutes under a nitrogen atmosphere, quickly cooled and thermally treated at 220?C for 8 hours to form scattered products which are then attached to the capture plate. (2) A polyester resin composition, wherein the production rate of an acid component monomer and/or the production rate of oligomers is/are less than 0.70, as defined by the following formulas ( I) and (II): Production rate of acid component monomer = (amount of produced acid component monomer)/(acid component monomer content) (I) Production rate of oligomers = (amount of produced oligomers)/(oligomer content) (II). (3) A method for producing a polyester resin composition, wherein an ionic liquid is added. [Selected Drawing] None

公开(公告)号：PH12017501874A1

公开(公告)日：2018-02-26

申请号：PH12017501874

申请日：2017-10-13

Applicant: TORAY INDUSTRIES

Inventor： MOTOSHIROMIZU TAKAHIRO ,  SAKAMOTO JUN ,  DAN KOUICHI ,  KOJIMA HIROJI ,  MATSUMOTO MAYUMI ,  SUZUKI KEN ,  KAWAKAMI TOMONORI

IPC: C08L67/00

Abstract: Provided is a polyester resin composition in which the amount of acid-component monomer and/or oligomer produced in the polyester is reduced. That is to say, the purpose of the present invention is achieved by the following means: (1) a polyester resin composition characterized in that, after rapidly cooling a sample that has been melted in a nitrogen atmosphere at 300oC for 60 minutes, the surface roughness Ra of a collecting plate to which scattered matter has attached during 8 hours of heat treatment at 220oC is less than 0.150 mm; (2) a polyester resin composition characterized in that the acid-component monomer production rate and/or the oligomer production rate defined by formulas (I) and (II) below is less than 0.70; and (3) a method of producing a polyester resin composition characterized by adding an ionic liquid. Formula (I): acid-component monomer production rate = (amount of acid-component monomer produced)/(acid-component monomer content) Formula (II): oligomer production rate = (amount of oligomer produced)/(oligomer content)

公开(公告)号：EP3018699A4

公开(公告)日：2017-02-22

申请号：EP14819841

申请日：2014-06-30

Applicant: TORAY INDUSTRIES

Inventor： INABA SACHIO ,  MURASE SEIICHIRO ,  SHIMIZU HIROJI ,  DAN KOUICHI ,  SUWA MITSUHITO

IPC: H01L21/225 ,  C09D183/04 ,  H01L31/068

CPC classification number: H01L31/1876 ,  C08G77/08 ,  C08G77/80 ,  C08K3/32 ,  C08K3/36 ,  C08K2003/329 ,  C09D11/03 ,  C09D11/102 ,  C09D11/52 ,  C09D183/04 ,  H01L21/2225 ,  H01L21/2254 ,  H01L31/0682 ,  H01L31/103 ,  H01L31/1804 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521 ,  C08K3/38

Abstract: An impurity-diffusing composition comprising (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. (In the formula, R 1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R 1 may be the same or different. R 2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R 2 may be the same or different. R 3 and R 4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R 3 and a plurality of R 4 each may be the same or different. The ratio of n:m is 95:5 to 25:75.) Provided is an impurity-diffusing composition that is excellent in printability on a semiconductor substrate and impurity diffusibility thereinto, less prone to cracks during the process of firing and diffusion, and becomes, when fired, a fired film having sufficient masking properties for other impurity diffusion agents.

Abstract translation: 杂质扩散组合物，包括（A）由式（1）和杂质扩散成分的（B）表示的聚硅氧烷。 （式中，R 1 darstellt具有6至15个碳原子的芳基，并且R 1的一个多元化可以是相同的或不同的。R 2 darstellt任何羟基的烷基具有1至6个碳原子基团， 在具有1至6个碳原子具有2至10个碳原子的烯基，具有2至6个碳原子，和具有6至15个碳原子的芳基，和R 2的一个多元化可以是酰基的烷氧基 相同或不同。R 3和R 4各自表示任何的羟基的，在具有1至6个碳原子的具有1至6个碳原子具有2至10个碳原子的链烯基烷氧基烷基基团，并且在酰基 具有2至6个碳原子，和R 3中的一个多元化和R 4各自的多元基团可以是相同或不同的n个:.米的比例为95：5至25:75）本发明提供一种杂质扩散。 组合物确实具有优异的适印性的半导体基片和扩散杂质烧制到其中和diffusio的过程中，不易发生裂纹 n和变为发射时，对其他杂质扩散剂的烧成具有膜充足的掩蔽特性。