Abstract:
A lithographic printing original plate which sequentially comprises, on a substrate, at least a heat-sensitive layer and a silicone rubber layer in this order, and wherein the heat-sensitive layer contains a polyurethane that has a carbonate structure. A method for producing a lithographic printing plate using this lithographic printing original plate. A method for producing a printed matter. To provide: a lithographic printing original plate which is capable of preventing background stain, while having excellent dot reproducibility and printing durability; a method for producing a lithographic printing plate using this lithographic printing original plate; and a method for producing a printed matter.
Abstract:
Provided is a lithographic ink having superior surface staining resistance and fluidity. Also provided is a method for manufacturing a printed material using the lithographic ink. The lithographic ink has all of a viscosity (A) at a rotational speed of 0.5 rpm, a viscosity (B) at a rotational speed of 20 rpm, and a viscosity (C) at a rotational speed of 50 rpm of 5 Pa·s or more and 100 Pa·s or less, the viscosities (A), (B), and (C) being measured by using a cone-plate rotating viscometer at 25°C, and has a viscosity ratio (C)/(B) of 0.8 or more and 1.0 or less.
Abstract:
There is provided a mask paste composition having superior cracking resistance and masking properties in a post-application impurity diffusion step, superior patterning properties during application, and superior storage stability of its pre-cured solution by means of a mask paste composition characterized by including (a) a specific polysiloxane, (b) silica particles having an average particle diameter of not greater than 150 nm, and (c) a solvent having a boiling point of not lower than 130? C, wherein the weight average molecular weight of (a) the polysiloxane is not less than 1000, the content of the silica particles in the solid fraction of the composition is 20% by weight to 70% by weight, and the concentrations of P, B and Al in the entire composition are each not more than 20 ppm.
Abstract:
The purpose of the present invention is to provide a p-type impurity diffusion composition with which it is possible to improve storage stability of a coating liquid, and to achieve uniform diffusion of the coating liquid on a semiconductor substrate. In order to achieve the above-mentioned purpose, the present invention has the following composition. Namely, a p-type impurity diffusion composition characterized by including (A) a group-13 element compound, (B) a hydroxyl-group-containing polymer, and (C) an organic solvent, (C1) a cyclic ester solvent being contained as the organic solvent.
Abstract:
Procedimiento para la fabricación de un material impreso, que comprende las etapas de: permitir que una tinta a base de agua se adhiera a una superficie de una capa sensible al calor de una plancha de impresión litográfica que tiene una superficie sobre la que existen una capa repelente de tinta y la capa sensible al calor; y transferir la tinta a base de agua adherente directamente o mediante una mantilla a un sustrato de impresión, en el que la capa sensible al calor contiene una resina novolac y un compuesto de complejo orgánico, y la capa sensible al calor contiene la resina novolac y el compuesto de complejo orgánico en una proporción en masa de 2 a 6.