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    CURABLE RESIN COMPOSITION
    1.
    发明专利
    CURABLE RESIN COMPOSITION 失效

    公开(公告)号：JPS5889613A

    公开(公告)日：1983-05-28

    申请号：JP18688681

    申请日：1981-11-24

    Applicant: TORAY INDUSTRIES

    Inventor： EGUCHI HIROAKI ,  SAKAI ATSUSHI ,  NAKADA MINORU

    IPC: C08L77/00 ,  C08G59/00 ,  C08G59/44 ,  C08L63/00 ,  C08L77/02

    Abstract: PURPOSE:To obtain titled composition with curing and cure-accelerating potential in itself, useful for a wide range of applications such as various formed products, adhesives, coatings, etc., comprising a polyamide having a specific segment and an epoxy compound. CONSTITUTION:The objective composition can be obtained by blending (A) a polyamide having a segment of formula (R and R' are each methyl or ethyl) (e.g., a homogeneous polymer comprising poly-alpha-dimethylamino-epsilon-caprolactam) and (B) an epoxy compound (e.g., propylene glycol diglycidyl ether, bisphenol diglycidyl ether) in a weight ratio A/B of 100/5-100/100, and further, if required, (C) a curing agent, accelerator, reinforcing agent, filler, etc. USE:For color coatings.

    COPOLYAMIDE
    2.
    发明专利
    COPOLYAMIDE 失效

    公开(公告)号：JPS5592735A

    公开(公告)日：1980-07-14

    申请号：JP85779

    申请日：1979-01-05

    Applicant: TORAY INDUSTRIES

    Inventor： NAKADA MINORU ,  SATOU HARUYO ,  IMAMURA SHINZOU

    IPC: C08G69/00 ,  C08G69/14

    Abstract: PURPOSE:A copolyamide usable for adhesives, sizes, coating materials, paper strength improvers, and resins for printing plates capable of controlling the solubility in water or organic solvents, consisting of specific plural types of lactam structural units. CONSTITUTION:A copolyamide consisting of (A) 10mol% or more of structural units of formula I and (B) 90mol% or less of structural units of formula II: (n is 5-11), having a relative viscosity of 1.5 or higher, preferably 2-5. For example, the copolyamide is obtained by polymerizing alpha-(N,N-dimethylamino)-epsilon-caprolactam and lactam in the presence of anionic polymerization catalyst, e.g. metallic sodium, and a co-catalyst, e.g. N-acetyl-epsilon-caprolactam, at 130-250 deg.C.

    PHOTOSENSITIVE POLYAMIDE RESIN COMPOSITION
    4.
    发明专利
    PHOTOSENSITIVE POLYAMIDE RESIN COMPOSITION 失效

    公开(公告)号：JPS5667846A

    公开(公告)日：1981-06-08

    申请号：JP14485679

    申请日：1979-11-08

    Applicant: TORAY INDUSTRIES

    Inventor： NAKADA MINORU ,  EGAWA KEIICHI ,  EGUCHI HIROAKI ,  IMAMURA SHINZOU

    IPC: G03F7/038 ,  C08F2/00 ,  C08F2/48 ,  G03F7/032 ,  G03F7/037

    Abstract: PURPOSE:To provide a photosensitive composition giving a soluble flexible printing plate with superior endurance and consisting of polyamide having alpha-(N,N-dialkylamino)-epsilon-caprolactam and cyclic amide as structural units and a photopolymerizing unsatd. compound. CONSTITUTION:This composition consists of copolyamide contg. 10-90mol% structural units represented by formula I (where R is lower alkyl and n is 5-11) and 90-10mol% structural units represented by formula II and of a photopolymerizing unsatd. compound. alpha-(N,N-dialkylamino)-epsilon-caprolactam (the structural unit of formula I) used includes alpha-(N,N-dimethylamino)-epsilon-caprolactam, and epsilon-caprolactam may be used as 6-12C cyclic amide having no substituent (the structural unit of formula II). The above-mentioned copolyamide is obtd. by polymerizing monomers forming structural units I, II in the presence of basic catalyst.

    PREPARATION OF BASIC POLYAMIDE
    5.
    发明专利
    PREPARATION OF BASIC POLYAMIDE 失效

    公开(公告)号：JPS5592736A

    公开(公告)日：1980-07-14

    申请号：JP85879

    申请日：1979-01-05

    Applicant: TORAY INDUSTRIES

    Inventor： NAKADA MINORU ,  SATOU HARUYO ,  IMAMURA SHINZOU

    IPC: C08G69/00 ,  C08G69/14

    Abstract: PURPOSE:To obtain a basic polyamide soluble in organic solvents, e.g. methanol, and water, by polymerizing an alpha-(N,N-dialkylamino)-epsilon-caprolactam in the presence of a basic catalyst. CONSTITUTION:(A) An alpha-(N,N-dialkylamino)-epsilon-caprolactam or in combination with (B) a cyclic amid, e.g. epsilon-caprolactam, of the formula (n is 3-11) is polymerized in the presence of (C) a basic catalyst, preferably metallic lithium, sodium, or potassium, triethylaluminum, or diethylzinc, if necessary (D) a co-catalyst, e.g. N-acetyl-epsilon-caprolactam. The molar ratio of (A) to (A+B) is >=0.1, and that of (C+D) to (A+B) is 1:20-500. USE:Sizes, paper strength improvers, adehesives, and coating materials.

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