Pattern formation device and manufacturing method of masking plate
    1.
    发明专利
    Pattern formation device and manufacturing method of masking plate 审中-公开
    掩模板形成装置及制造方法

    公开(公告)号:JP2008243611A

    公开(公告)日:2008-10-09

    申请号:JP2007082670

    申请日:2007-03-27

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern formation device capable of simplifying a device configuration, of reducing the number of processes for pattern formation, and of rapidly and inexpensively forming a high-positional-accuracy and high-definition pattern comparable to that of a photolithographic technique; and a manufacturing method of a masking plate.
    SOLUTION: This pattern formation device has a masking plate arranged oppositely to a surface of a glass plate. The masking plate has a substrate 24 having multiple pattern-like through holes 22, and is formed by coating, with annular insulation layers 26a, the inside surfaces of the multiple through holes 22, the back surface 24b of the substrate 24, and the peripheral parts of the through hole 22 within the front surface 24a of the substrate 24.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种能够简化器件结构的图案形成装置,减少图案形成的处理次数,并且快速且低成本地形成与位置精度和高清晰度图案相当的高位置精度和高清晰度图案 光刻技术; 以及掩模板的制造方法。 该图案形成装置具有与玻璃板的表面相对配置的掩模板。 掩模板具有具有多个图案状通孔22的基板24,并且通过涂覆环状绝缘层26a,多个通孔22的内表面,基板24的后表面24b以及周边 通孔22的部分在基板24的前表面24a内。版权所有(C)2009,JPO&INPIT

    HARD MASK FOR SHADOW MASK AND ITS PRODUCTION

    公开(公告)号:JP2001042500A

    公开(公告)日:2001-02-16

    申请号:JP21534999

    申请日:1999-07-29

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To improve the yield and productivity by forming a metal layer by photoreduction of a photoreducing metal compound on a supporting substrate and patterning the metal layer. SOLUTION: A blue sheet glass 10 is sufficiently washed (a) by using a process water, pure water or if necessary, a chemical liquid, heated by a hot plate, and coated with one of zinc nitrate, zinc chloride and zinc acetate by a spraying method on one surface to form a zinc oxide layer 11 (b). Then the sheet is dipped in an aqueous solution of palladium chloride to form a Pd2+ adsorption layer 12a on the surface of the zinc oxide layer 11 (c). A photomask 13 is tightly applied on the surface of the adsorption layer 12a and irradiated with UV rays to selectively reduce Pd2+ by the light in the exposed part to form Pd(0) pattern 12b (d, e). The part of the adsorption layer 12a is removed by using EDA to form a Pd0 pattern 12c (f). Then the glass is dipped in an electroless plating liquid containing nickel chloride and hypophosphorous acid for a specified time to form a Ni-P layer 14 on the surface of the Pd pattern 12c (g).

    HARD MASK FOR SHADOW MASK
    3.
    发明专利

    公开(公告)号:JP2000208043A

    公开(公告)日:2000-07-28

    申请号:JP1020299

    申请日:1999-01-19

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a hard mask for a shadow mask, having a sufficient film strength, capable of eliminating vacuum contact failure at the time of exposure, and resultantly capable of improving the production yield and productivity of a shadow mask. SOLUTION: This hard mask for a shadow mask is so constructed that a pattern is formed on an ultraviolet-transmissive blue plate glass 11 so as to project in portions corresponding to opening parts of a shadow mask, that the projecting pattern is a light-screening Ni-P layer, and that a gelatin layer 14b containing silicone particles 14a having a grain size of 3 to 5 μm is provided thereon. When the fine-particle containing gelatin layer is formed, its film thickness after drying is made smaller than the grain size of the fine particles, and therefore the fine silicone particles project from an outer surface of the gelatin layer.

    MANUFACTURE OF SHADOW MASK, AND EXPOSURE DEVICE

    公开(公告)号:JPH10125222A

    公开(公告)日:1998-05-15

    申请号:JP28058896

    申请日:1996-10-23

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To manufacture shadow masks with a high yield by reducing the occurrence of defects caused by the attachment of foreign matters. SOLUTION: In this method for manufacturing shadow masks, a pair of original plates 12a and 12b forming a pattern corresponding to an opening hole on both sides of an electron beam passage hole of the shadow mask are exposed to carry out printing of the pattern of the original plate in a state in close contact with a resist formed on both sides of a shadow mask material 10. Then, protecting films 26a and 26b are disposed between the shadow mask material 10 and the original arts 12a and 12b, and the original arts 12a and 12b are exposed in such a state as closely contacted to the resist through the protecting films. After exposure is completed, an exposed portion of a band-like metal plate is forwarded to the outside of arrangement of a vacuum close contact printing frame, and a portion in close contact with an exposed portion of the protecting film is also forwarded to the outside thereof.

    Pattern forming apparatus and pattern forming method
    5.
    发明专利
    Pattern forming apparatus and pattern forming method 审中-公开
    图案形成装置和图案形成方法

    公开(公告)号:JP2009133881A

    公开(公告)日:2009-06-18

    申请号:JP2006086265

    申请日:2006-03-27

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming apparatus and a pattern forming method by which a pattern using charged particles is highly precisely formed onto a body to be transferred at a high resolution while suppressing transfer electric field.
    SOLUTION: The pattern forming apparatus 10 includes a drum-like original 1 which carries out a rolling motion along a glass plate 5 retained on a stage 6. After charging a high resistance surface of the original 1 by a charger 2, the pattern is formed by toner particles by supplying liquid developer for each color through developing units 3r, 3g and 3b to the original 1. Then, the charged toner particles are transferred to the glass plate 5 by forming the electric field between the glass 5 by having the original 1 carry out the rolling motion along the glass plate 5 and at the same time having a magnetic field made to act on the toner particles which are in between two permanent magnets 62 and 64 in a transfer region.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种图案形成装置和图案形成方法,通过该图案形成装置和图案形成方法,在抑制转印电场的同时以高分辨率高度精确地形成要被转印的主体上的带电粒子的图案。 解决方案:图案形成装置10包括滚筒状原稿1,其沿着保持在平台6上的玻璃板5进行滚动运动。在通过充电器2对原稿1的高电阻表面充电之后, 通过将显色单元3r,3g和3b的每种颜色的液体显影剂供应到原稿1,由调色剂颗粒形成图案。然后,通过在玻璃5之间形成电场而将带电调色剂颗粒转移到玻璃板5, 原稿1沿着玻璃板5执行滚动运动,同时具有作用在转印区域中位于两个永磁体62和64之间的调色剂颗粒上的磁场。 版权所有(C)2009,JPO&INPIT

    Pattern forming method
    6.
    发明专利
    Pattern forming method 审中-公开
    图案形成方法

    公开(公告)号:JP2009131957A

    公开(公告)日:2009-06-18

    申请号:JP2006265649

    申请日:2006-09-28

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method where a high precision pattern can be surely and stably transferred to the medium to be transferred, and a satisfactory pattern free from pulling out can be formed.
    SOLUTION: At the time of transferring a pattern of toner particles 55 from a recess 14a of an original plate 1 to a glass plate 5, the thickness of the toner particles 55 to be applied in the recess 14a in a development process is controlled so as to excellently remove the toner particles 55 from the recess 14a and transfer them on the glass plate 5. As a thickness t2 of the toner particle layer to be applied in the recess 14a, a value up to that slightly larger than a distance T from the bottom of the recess 14a to the glass plate 5 is allowed.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 解决的问题:提供一种图形形成方法,其中高精度图案可以可靠和稳定地转印到要转印的介质中,并且可以形成没有拉出的令人满意的图案。 解决方案:在将调色剂颗粒55的图案从原版1的凹部14a转印到玻璃板5时,在显影过程中要施加到凹部14a中的调色剂颗粒55的厚度为 被控制以便从凹部14a优良地除去调色剂颗粒55并将它们转移到玻璃板5上。作为施加在凹部14a中的调色剂颗粒层的厚度t2,直到稍大于距离 T可以从凹部14a的底部到玻璃板5。 版权所有(C)2009,JPO&INPIT

    INFORMATION PROCESSING APPARATUS
    7.
    发明专利

    公开(公告)号:JP2002108504A

    公开(公告)日:2002-04-12

    申请号:JP2000302667

    申请日:2000-10-02

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To provide an information processor which can be easily made compact and thin, with which the contents of a card or the like can be easily confirmed, and in which even a card whose surface is provided with an additional function can be used. SOLUTION: A display part 2 to be also used as a cover is openably formed at the case body of a note-sized personal computer. The display part 2 is provided with a display panel 5, and an SD card slot 6a is arranged at the right side. In this case, the SD card slot 6a is arranged so that the longitudinal direction is the vertical direction. The SD card slot 6a is provided with an opening 7 in a size corresponding to the SD card on the front face, a spring 8 is arranged at the lower side, and a contact 9 is arranged at the upper part. For mounting the SD card, the bottom part of the SD card is brought into contact with the spring 8, and the SD card is mounted on the SD card slot 6a while being pushed down to the lower direction. The SD card mounted on the SD card slot 6a is pushed up by the spring 8, and an SD card connector at the upper edge part is fit and brought into contact with the contact 9.

    COLOR CATHODE-RAY TUBE AND ITS MANUFACTURING METHOD AND DEPOSITION COMPOUND MATERIAL

    公开(公告)号:JP2002075239A

    公开(公告)日:2002-03-15

    申请号:JP2000256063

    申请日:2000-08-25

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a color cathode-ray tube which has a metal back membrane that is stable in deposition property and low cost, and has a high heat absorption. SOLUTION: This color cathode-ray tube comprises a metal back membrane that contains a joint deposition layer of a metal such as aluminum and a metal oxide having a high heat absorption. As a metal oxide having a high heat absorption, Fe3O4, NiO, NiFe2O3, Cr2O3, MnO are provided. And this metal back membrane can be formed by vacuum deposition of an deposition compound material comprising a bar-shape core material made of a mixture of a metal powder such as aluminum and a metal oxide powder having a high heat absorption, and an outer package material made of a metal such as aluminum and provided closely contacting this core material and covering it.

    COLOR PICTURE RECEIVING TUBE AND ITS MANUFACTURING METHOD

    公开(公告)号:JP2002075238A

    公开(公告)日:2002-03-15

    申请号:JP2000256061

    申请日:2000-08-25

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To obtain a color picture receiving tube in which the thermal expansion of shadow mask by the irradiation of electron beams is prevented, and the picture contrast and purity drift property are improved. SOLUTION: The color picture receiving tube comprises on the surface of the shadow mask a black color membrane in which minute particles of a heavy metal and-/ or a heavy metal compound selected from Ba, Pb, Ta,, Bi, Ce, and W are dispersed and contained in the membrane of an alloy selected from Ni-Zn, Co-Zn, Ni-Zn-Co, Ni-Sn, Ni-Sn-Cu, Sn-Co, Cr-Cr oxide, and Ni-P. It is possible to form a chromate membrane on the surface of the black color membrane.

    ELECTRONIC APPARATUS AND CONTROL METHOD THEREOF

    公开(公告)号:JP2003161792A

    公开(公告)日:2003-06-06

    申请号:JP2001362751

    申请日:2001-11-28

    Applicant: TOSHIBA CORP

    Abstract: PROBLEM TO BE SOLVED: To provide an alarm clock capable of efficiently performing schedule management based on a local time corresponding to a destination district. SOLUTION: A system controller 7 judges whether an alarm clock 101 has moved into a district where a standard time different from the standard time for a specific district which a clock module 8 currently uses as a standard time must be used, by acquiring a position information from a GPS unit 10. If movement into a district of different standard time is detected, the system controller recognizes the standard time of the district corresponding to a current position, which is destination, based on the position information acquired from the GPS unit 10. It compares the standard time of specific district which is currently used with the reference time, for estimating a time difference for correction. Based on the time difference, the current date time value indicated by the clock module 8 is corrected, and the date time information of a schedule data is corrected as well. COPYRIGHT: (C)2003,JPO

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