公开(公告)号：JP2002260279A

公开(公告)日：2002-09-13

申请号：JP2001059855

申请日：2001-03-05

Applicant: TOSOH CORP

Inventor： TANIGUCHI TAKASHI ,  OSHIMA KENSHO ,  NISHIZAWA KEIICHIRO

IPC: B41M5/26 ,  G11B7/24 ,  G11B7/254 ,  G11B7/257

Abstract: PROBLEM TO BE SOLVED: To provide an optical recording medium that can use a low flying head without head crash and has optical characteristics not damaged by laser radiation. SOLUTION: In an optical recording medium on which at least a reflection layer, an optical recording layer, a lubricant base, and a lubricant layer are formed in this order, the lubricant layer is made of polyalkylene glycol, polyalkylene glycol derivative, polyolefin having no unsaturated structure, or a mixture of two or more of them.

公开(公告)号：JP2000268405A

公开(公告)日：2000-09-29

申请号：JP7037099

申请日：1999-03-16

Applicant: TOSOH CORP

Inventor： TANIGUCHI TAKASHI ,  OKAMOTO MICHIO ,  NISHIZAWA KEIICHIRO

IPC: G11B7/254 ,  C23C14/06 ,  C23C14/14 ,  C23C14/34 ,  G11B7/24 ,  G11B7/257

Abstract: PROBLEM TO BE SOLVED: To suppress head crash and to prevent the deterioration of optical characteristics by forming a layer comprising a perfluoro-polyether derivative having -CH2OH or -COOH at the molecular ends in a specified thickness. SOLUTION: When an optical recording layer and a lubricative underlayer are formed to obtain an optical recording medium, a layer comprising a perfluoro-polyether derivative having -CH2OH or -COOH at the molecular ends is formed as a lubricative layer on the surface of the lubricative underlayer in 0.3-4.0 nm thickness. The perfluoro-polyether derivative preferably has a straight chain structure from the viewpoint of lubricity and the weight average molecular weight is 1,000-10,000. Since the decrease of the weight of the derivative by thermal decomposition begins from a lower temperature in the case of a lower molecular weight, the derivative having a higher molecular weight is more excellent in long-term stability. A diamond-like carbon layer or an SiO2 layer is formed as the lubricative underlayer.

公开(公告)号：JPH08180472A

公开(公告)日：1996-07-12

申请号：JP31673794

申请日：1994-12-20

Applicant: TOSOH CORP

Inventor： ITO KENICHI ,  KISHIMOTO HIROAKI ,  TANIGUCHI TAKASHI

IPC: G11B7/26

Abstract: PURPOSE: To obtain a stamper and a surface processing method therefor in which substrates are stably formed with a prolonged service life by applying ultrasonic waves to the surface of the stamper in liquid or in vapor. CONSTITUTION: In the stamper surface processing device, a stamper 2, on which a performed pattern is formed, is set on an arm 1 and a motor 3 for rotation and the medium is immersed in a processing tub 4, in which liquid is being circulated, so that the entire surface of the medium contacts the liquid by the rotation. Then, ultrasonic waves are applied to the medium from an ultrasonic wave generator 6 which is set at the bottom of the tub 4. After the ultrasonic wave process, the medium is washed with an ultrapure water, spin dried and is made as a final product. The obtained stamper in rugged shapes are observed with an AFM and analyzed by a ruggedness dimensional analysis picture processing based on the values computed by a computer. As the result, the generation of stamper defects is prevented, the number of durable disks formed by the stamper is increased and the moldability in injection molding is improved.

公开(公告)号：JPH04369650A

公开(公告)日：1992-12-22

申请号：JP17333591

申请日：1991-06-19

Applicant: TOSOH CORP

Inventor： SEKIMOTO KENICHI ,  YAMAMOTO TAKASHI ,  TANIGUCHI TAKASHI ,  KIYOTA TORU

IPC: G03F1/62

Abstract: PURPOSE:To obtain a high quality pellicle film without generating scratch or stretch by allowing a solvent to remain in a thin film when peeling off the thin film from a substrate. CONSTITUTION:After a frame body is stuck on a fluororesin thin film formed on a substrate, the thin film remaining a solvent is peeled off from the substrate. In this case, the residual amount of solvent in the thin film is 5-30wt.%. An order to use fluororesin as the pellicle film, it is preferable to transmit >=90% of >=240nm ultraviolet ray in 10mum film thickness. Since the fluororesin thin film is formed by applying fluororesin dissolved in the solvent on a smooth substrate such as glass, silicone wafer, the fluororesin used for this is necessary to dissolve in the solvent. A copolymer containing vinylidene fluoride or the like is used as the fluororesin. In the result, the high quality fluororesin pellicle film without generating scratch or stretch when peeling off from the substrate is obtained.

公开(公告)号：JPH03233455A

公开(公告)日：1991-10-17

申请号：JP2856590

申请日：1990-02-09

Applicant: TOSOH CORP

Inventor： TODOKO MASAAKI ,  TANIGUCHI TAKASHI ,  SATO SHINJI ,  SHIBATA KATSUYA ,  KIYOTA TORU

IPC: G03F7/008 ,  G03F7/038 ,  H01L21/027

Abstract: PURPOSE:To make improvement in transparency to UV light and far UV light and definition by incorporating an alkali-soluble resin contg. an arom. group, and ammonia salt having the reactive group and a compd. having a photoreactive group or reactive group as essential components into the above compsn. CONSTITUTION:An alkyl compd. of 5 to 30C contg. >=1 azide groups or an alkyl compd. of 5 to 30C contg. >=1 epoxy group or double bonds and the alkali-soluble resin contg. the arom. group are incorporated as the essential components into this compsn. The dissolution inhibiting ability of the ammonium salt depends on the structure of this salt; the dissolution inhibiting ability is high as the chain length of the alkyl group is longer, i.e. as the number of the carbon atoms is larger. The dissolution inhibiting ability is higher as the number of the long chain alkyl groups is larger. Further, exposed parts are made insoluble in an alkaline developing soln. by convering the short chain alkyl ammonium salt to a long-chain alkyl ammonium salt by exposing in the case of the short chain of the alkyl group of the alkyl ammonium salt. Unexposed parts are not changed in the solubility and patterning is possible. The improvement in the transparency to the UV light and far UV light and the definition is made in this way.

公开(公告)号：JP2010107613A

公开(公告)日：2010-05-13

申请号：JP2008277733

申请日：2008-10-29

Applicant: Tosoh Corp ,  東ソー株式会社

Inventor： ASANO MUTSUMI ,  TANIGUCHI TAKASHI ,  KIKUCHI RYO

IPC: B24B9/00 ,  B24B9/10 ,  G03F1/60

Abstract: PROBLEM TO BE SOLVED: To solve such a problem that in a substrate for a large photomask, an outside end face of the substrate is subjected to a mirror treatment, so as to prevent generation of particles, however, the heavy substrate sometimes slips from hands and can not be firmly held upon handling. SOLUTION: A grinding tool 10 that rotates and has an outer shape fitting to the outer shape of a wavy part 6 is used to form a wavy part 6 over the whole length of a side, the wavy part 6 having a plurality of concaves and convexes 4, 5 continuing along the thickness direction with respect to the four sides of a glass substrate 1 made of a synthetic quartz glass and formed into a rectangle. Thereby, the wavy part 6 can be hooked by palms or fingers of a worker upon handling. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题为了解决在大型光掩模用基板中对基板的外侧端面进行镜面处理的问题，为了防止颗粒的产生，但是重要的基板有时 从手中滑落，处理不能牢牢固定。 解决方案：使用旋转并具有与波浪形部分6的外形相适配的外形的研磨工具10，以在一侧的整个长度上形成波浪形部分6，波浪部分6具有多个 相对于由合成石英玻璃制成的玻璃基板1的四边沿厚度方向连续地形成为矩形的凹凸4,5。 由此，在处理时，波纹部6可以被工人的手掌或手指钩住。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2004309138A

公开(公告)日：2004-11-04

申请号：JP2003098533

申请日：2003-04-01

Applicant: Tosoh Corp ,  東ソー株式会社

Inventor： TANIGUCHI TAKASHI

IPC: G01N21/958 ,  C03C23/00

CPC classification number: C03C23/0005

Abstract: PROBLEM TO BE SOLVED: To provide a defect inspection method and a defect inspecting apparatus for easily, accurately, and quickly detecting defects contained in a quartz glass material, especially minute defects, such as bubbles, and foreign objects.
SOLUTION: In the method for inspecting defects inside the quartz glass material using a schlieren method, the quartz glass material to be inspected is irradiated with a plurality of parallel light having different irradiation directions, and only abnormal light caused by reflection and/or bending by defects inside the quartz glass material is detected from light applied to the quartz glass material. The defect inspecting apparatus by the method for detecting defects inside the quartz glass material is included.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2003121385A

公开(公告)日：2003-04-23

申请号：JP2001320462

申请日：2001-10-18

Applicant: TOSOH CORP

Inventor： TANIGUCHI TAKASHI ,  MIZUTANI SHUZO

IPC: G01N21/958

Abstract: PROBLEM TO BE SOLVED: To provide a method and device for inspecting inside of vitreous silica material for defect by which minute defects, particularly, bubbles, foreign matter, etc., contained in a vitreous silica material can be detected easily and accurately in a short time. SOLUTION: The method for inspecting inside of vitreous silica for defect uses the schlieren method. In the method, only abnormal light rays caused by defects contained in the vitreous silica material to be inspected are detected out of the light rays transmitted through the material by projecting parallel rays of light upon the material. The device for inspecting inside vitreous silica material for defect uses this method.

公开(公告)号：JP2001256687A

公开(公告)日：2001-09-21

申请号：JP2000068638

申请日：2000-03-08

Applicant: TOSOH CORP

Inventor： TANIGUCHI TAKASHI ,  OSHIMA KENSHO ,  NISHIZAWA KEIICHIRO

IPC: G11B7/254 ,  G11B7/24 ,  G11B7/257 ,  G11B11/105

Abstract: PROBLEM TO BE SOLVED: To provide an optical recording medium less which is liable to cause head crash, free of the deterioration of optical characteristics, etc., even under laser light and suitable for use as a surface optical recording medium and a near-field optical recording medium. SOLUTION: A layer, comprising a fluoropolymer having a fluorine atom in its monomer structure or a layer comprising a mixture of a perfluoro- polyether derivative and a fluoropolymer having a fluorine atom in its monomer structure and compatible with the derivative is formed as a lubricative layer 15 on the surface of an optical recording medium obtained by forming at least a reflecting layer 12 and an optical recording layer 13 in this order on a substrate.

公开(公告)号：JPH08167177A

公开(公告)日：1996-06-25

申请号：JP33136494

申请日：1994-12-12

Applicant: TOSOH CORP

Inventor： KISHIMOTO HIROAKI ,  TANIGUCHI TAKASHI

IPC: G11B7/26 ,  B82B1/00

Abstract: PURPOSE: To easily form a substrate having no distortion of transfer without requiring severe conditions for the stamper when a substrate is formed, by forming a specified recess or projection pattern on the stamper surface except for preformat pits and a groove pattern. CONSTITUTION: The surface of the stamper has a recess or projection pattern on the whole or a part of the front and rear surfaces except at least preformat pits and a groove pattern. The recess or projection pattern gives enough small roughness than the preformat pits so that the pattern does not prevent readout of the preformat pattern signals nor increases noises. For example, it is necessary that the recess or projection has density, and each recess or projection has 5-50nm diameter and 1-10nm height (depth).