FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    1.
    发明授权
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 有权
    清洗装置,以投资于流体的处理

    公开(公告)号:EP1210296B1

    公开(公告)日:2005-04-06

    申请号:EP00952819.1

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND PROCESS
    2.
    发明公开
    FLUID TREATMENT SYSTEM AND PROCESS 失效
    DEVICE AND METHOD FOR用液体治疗

    公开(公告)号:EP0687201A1

    公开(公告)日:1995-12-20

    申请号:EP94908240.0

    申请日:1994-03-04

    Abstract: A fluid treatment system includes one or more radiation sources arranged in an irradiation zone within a treatment zone through which fluid to be treated passes and is irradiated. The irradiation zone has a closed cross section to maintain the fluid within a predefined maximum distance from the radiation source. Preferably, the irradiation zone comprises a reduced cross-sectional area perpendicular to the direction of fluid flow and thus the fluid flow velocity is increased through the irradiation zone. This allows the fluid to enter the treatment zone at relatively low speed, traverse the irradiation zone at high speed and exit the treatment zone again at relatively low speed to minimize the loss of hydraulic head throughout the system. Fluid entering the treatment zone passes through an inlet transition region wherein the cross-sectional area is reduced prior to entering the irradiation zone and fluid exiting the irradiation zone passes through an outlet transition region wherein the cross-sectional area is increased. Each transition region is designed to reduce hydraulic head losses as the fluid flow velocity is increased and decreased. In the irradiation zone, radiation sources are mounted on radiation modules which are arranged to provide improved accessibility for maintenance. The radiation modules may also be provided with cleaning assemblies which are operable to remove materials fouling the radiation sources in situ while the radiation sources are in the irradiation zone.

    UV FLUID TREATMENT DEVICE AND METHOD
    3.
    发明授权
    UV FLUID TREATMENT DEVICE AND METHOD 失效
    紫外线流体处理装置和方法

    公开(公告)号:EP0788462B1

    公开(公告)日:1999-02-03

    申请号:EP95934012.6

    申请日:1995-10-17

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    Abstract translation: 1。一种流体处理装置,包括用于接收流体流的壳体,所述壳体包括流体入口,流体出口,布置在所述流体入口和所述流体出口之间的流体处理区以及布置在所述流体中的至少一个辐射源模块 所述至少一个辐射源模块包括可密封地连接到腿部的辐射源,所述腿部可密封地安装到所述外壳,所述辐射源设置为基本平行于所述流体流。 还描述了处理壳体中的流体的方法,该壳体包括流体入口,流体出口,设置在流体入口和流体出口之间的流体处理区域,流体处理区域具有设置在其中的至少一个辐射源。 该方法包括以下步骤:(i)提供流体到流体入口的流动; (ii)以基本平行于所述至少一个辐射源的方式将流体流从所述流体入口供给到所述流体处理区; (iii)照射流体处理区中的流体流; 和(iv)将流体流供给到流体出口。 在该方法期间,流体通过流体入口,流体出口和流体处理区域的流动基本上共线。 流体处理装置和方法非常适合(但不限于)灭活存在于水中的微生物。

    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING
    4.
    发明公开
    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING 失效
    辐射模块,及其在全自动自清洗用途和方法

    公开(公告)号:EP0788463A1

    公开(公告)日:1997-08-13

    申请号:EP95934013.0

    申请日:1995-10-17

    CPC classification number: C02F1/325 C02F1/36 C02F2201/3223 C02F2201/324

    Abstract: A method of cleaning fouling materials from a radiation module, the method comprising the steps of: (i) immersing at least a portion of the radiation module in a fluid; and (ii) subjecting the radiation module to vibration at a frequency sufficient to substantially inhibit fouling materials adhering to the at least one radiation source. A radiation module for use in a fluid treatment system comprising: a support member for mounting the module in the fluid treatment system; at least one radiation assembly extending from the support member; and vibration generation means associated with the at least one radiation assembly. The radiation module is self-cleaning and can take the form of a radiation module or a radiation sensor module. Incorporation of the radiation source module in a fluid treatment system is also described.

    UV FLUID TREATMENT DEVICE AND METHOD
    5.
    发明公开
    UV FLUID TREATMENT DEVICE AND METHOD 失效
    DEVICE AND METHOD FOR UV流体处理

    公开(公告)号:EP0788462A1

    公开(公告)日:1997-08-13

    申请号:EP95934012.0

    申请日:1995-10-17

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    6.
    发明公开
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 有权
    清洗装置,以投资于流体的处理

    公开(公告)号:EP1210296A1

    公开(公告)日:2002-06-05

    申请号:EP00952819.1

    申请日:2000-08-11

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING
    7.
    发明授权
    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING 失效
    辐射模块,及其在全自动自清洗用途和方法

    公开(公告)号:EP0788463B1

    公开(公告)日:2000-01-12

    申请号:EP95934013.4

    申请日:1995-10-17

    CPC classification number: C02F1/325 C02F1/36 C02F2201/3223 C02F2201/324

    Abstract: A method of cleaning fouling materials from a radiation module, the method comprising the steps of: (i) immersing at least a portion of the radiation module in a fluid; and (ii) subjecting the radiation module to vibration at a frequency sufficient to substantially inhibit fouling materials adhering to the at least one radiation source. A radiation module for use in a fluid treatment system comprising: a support member for mounting the module in the fluid treatment system; at least one radiation assembly extending from the support member; and vibration generation means associated with the at least one radiation assembly. The radiation module is self-cleaning and can take the form of a radiation module or a radiation sensor module. Incorporation of the radiation source module in a fluid treatment system is also described.

    FLUID TREATMENT SYSTEM AND PROCESS
    8.
    发明授权
    FLUID TREATMENT SYSTEM AND PROCESS 失效
    流体处理系统和过程

    公开(公告)号:EP0687201B1

    公开(公告)日:1998-02-04

    申请号:EP94908240.8

    申请日:1994-03-04

    Abstract: A fluid treatment system includes one or more radiation sources arranged in an irradiation zone within a treatment zone through which fluid to be treated passes and is irradiated. The irradiation zone has a closed cross section to maintain the fluid within a predefined maximum distance from the radiation source. Preferably, the irradiation zone comprises a reduced cross-sectional area perpendicular to the direction of fluid flow and thus the fluid flow velocity is increased through the irradiation zone. This allows the fluid to enter the treatment zone at relatively low speed, traverse the irradiation zone at high speed and exit the treatment zone again at relatively low speed to minimize the loss of hydraulic head throughout the system. Fluid entering the treatment zone passes through an inlet transition region wherein the cross-sectional area is reduced prior to entering the irradiation zone and fluid exiting the irradiation zone passes through an outlet transition region wherein the cross-sectional area is increased. Each transition region is designed to reduce hydraulic head losses as the fluid flow velocity is increased and decreased. In the irradiation zone, radiation sources are mounted on radiation modules which are arranged to provide improved accessibility for maintenance. The radiation modules may also be provided with cleaning assemblies which are operable to remove materials fouling the radiation sources in situ while the radiation sources are in the irradiation zone.

    Abstract translation: 流体处理系统包括布置在处理区内的照射区中的一个或多个辐射源,待处理流体穿过该处理区并被辐照。 照射区具有封闭的横截面以将流体保持在距辐射源的预定最大距离内。 优选地,照射区域包括垂直于流体流动方向的减小的横截面积,并且因此流体流动速度通过照射区域增加。 这允许流体以相对低的速度进入处理区域,以高速穿过照射区域并且以相对低的速度再次离开处理区域,以最小化整个系统中的液压头的损失。 进入处理区的流体通过入口过渡区,其中在进入照射区之前横截面积减小,并且离开照射区的流体通过出口过渡区,其中横截面积增大。 每个过渡区都设计成随着流体流速的增加和减小而减少水头损失。 在辐照区域中,辐射源安装在辐射模块上,辐射模块被设置为提供更好的维护可及性。 辐射模块还可以设置有清洁组件,所述清洁组件可操作以在辐射源处于照射区域的同时原位清除辐射源污染的材料。

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