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    RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME
    1.
    发明申请
    RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME 审中-公开
    辐射源盒和包含它的模块

    公开(公告)号：WO2010069072A1

    公开(公告)日：2010-06-24

    申请号：PCT/CA2009/001856

    申请日：2009-12-16

    Applicant: TROJAN TECHNOLOGIES INC. ,  PENHALE, Douglas ,  ELKU, Joseph ,  HALLETT, Bradley

    Inventor： PENHALE, Douglas ,  ELKU, Joseph ,  HALLETT, Bradley

    IPC: H01J61/30 ,  C02F1/32 ,  A61L2/10

    CPC classification number: C02F1/325 ,  A61L9/20 ,  A61L2209/12 ,  C02F2201/006 ,  C02F2201/007 ,  C02F2201/3225 ,  C02F2201/3227

    Abstract: There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing coupled to the proximal portion of the elongate radiation source assembly, and (iii) a power supply disposed within the housing, the power supply in electrical communication with the elongate radiation source assembly (in certain embodiments the power supply is optional). The elongate radiation source assembly and the housing are in substantial alignment with respect to a longitudinal axis of the elongate radiation source cartridge.

    Abstract translation: 公开了一种细长的辐射源盒。 盒包括：（i）具有近端部分和远端部分的细长辐射源组件，细长辐射源组件的远端部分未被支撑，（ii）耦合到细长辐射源组件的近侧部分的壳体，以及 （iii）设置在壳体内的电源，与细长辐射源组件电连通的电源（在某些实施例中，电源是可选的）。 细长辐射源组件和壳体相对于细长辐射源盒的纵向轴线基本对准。

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    3.
    发明授权
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 有权
    清洗装置，以投资于流体的处理

    公开(公告)号：EP1210296B1

    公开(公告)日：2005-04-06

    申请号：EP00952819.1

    申请日：2000-08-11

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： FANG, Gang ,  LAWRYSHYN, Yuri ,  MAARSCHALKERWEERD, Jan, M. ,  PENHALE, Douglas

    IPC: C02F1/32 ,  B08B9/02 ,  A61L2/10

    CPC classification number: B08B9/023 ,  B08B1/008 ,  C02F1/325 ,  C02F2201/3223 ,  C02F2201/324 ,  Y10S422/906

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR
    5.
    发明公开
    FLUID TREATMENT SYSTEM AND CLEANING APPARATUS THEREFOR 有权
    清洗装置，以投资于流体的处理

    公开(公告)号：EP1210296A1

    公开(公告)日：2002-06-05

    申请号：EP00952819.1

    申请日：2000-08-11

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： FANG, Gang ,  LAWRYSHYN, Yuri ,  MAARSCHALKERWEERD, Jan, M. ,  PENHALE, Douglas

    IPC: C02F1/32 ,  B08B9/02 ,  A61L2/10

    CPC classification number: B08B9/023 ,  B08B1/008 ,  C02F1/325 ,  C02F2201/3223 ,  C02F2201/324 ,  Y10S422/906

    Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.

    FLUID TREATMENT SYSTEM
    7.
    发明授权
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：EP2097352B1

    公开(公告)日：2012-06-13

    申请号：EP07816138.7

    申请日：2007-11-06

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： MA, Li, Zheng ,  TRAUBENBERG, George ,  PENHALE, Douglas

    IPC: C02F1/32 ,  A61L2/08 ,  A61L2/10 ,  C02F1/30

    CPC classification number: C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/328

    Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.

    FLUID TREATMENT SYSTEM
    9.
    发明公开
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：EP2097352A1

    公开(公告)日：2009-09-09

    申请号：EP07816138.7

    申请日：2007-11-06

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： MA, Li, Zheng ,  TRAUBENBERG, George ,  PENHALE, Douglas

    IPC: C02F1/32 ,  A61L2/08 ,  A61L2/10 ,  C02F1/30

    CPC classification number: C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/328

    Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.

    Abstract translation: 在其一个方面中，本发明涉及一种流体处理系统，其包括：入口; 一个出口; 布置在入口和出口之间的流体处理区。 流体处理区：（i）包括第一壁表面和与第一壁表面相对的第二壁表面，以及（ii）在其中设置至少一排辐射源组件阵列。 每个辐射源组件具有横向于通过流体处理区域的流体流动方向的纵向轴线，并且第一壁表面和第二壁表面中的每一个均包括第一流体偏转元件和第二流体偏转元件。 第一流体偏转元件比第二流体偏转元件更大程度地伸入流体处理区域。

    FLUID TREATMENT SYSTEM
    10.
    发明公开
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：EP2054346A1

    公开(公告)日：2009-05-06

    申请号：EP07785059.2

    申请日：2007-08-17

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： TRAUBENBERG, George ,  PENHALE, Douglas ,  MA, Li-Zheng

    IPC: C02F1/32 ,  A61L2/10 ,  B01J19/12

    CPC classification number: C02F1/325 ,  C02F1/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328 ,  C02F2209/42

    Abstract: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be 'parked' when not in use. In the so- called 'parked' position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

    Abstract translation: 描述了流体处理系统。 该流体处理系统包括：用于接收流体流和流体处理区的开放通道。 所述流体处理区域包括多个细长的辐射源组件，所述多个细长的辐射源组件定向成使得：（i）每个辐射源组件的纵向轴线横向于流体流过所述流体处理区域的方向，并且（ii）每个辐射的末端 源组件设置在开放通道中流体流动的预定最大高度之上。 第一挡板设置在流体处理区的上游。 第一挡板定位成使得其远端低于开放通道中流体流动的预定最大高度。 在优选实施例中，本流体处理系统提供了一个区域，其中用于辐射源组件的清洁系统可以在不使用时“停放”。 在所谓的“停放”位置中，清洁系统可以容易地进入维护等，而不影响通过流体处理区域和流体处理系统的流体流动。 这是流体处理系统的显着优势。

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