Abstract:
There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.
Abstract:
A cleaning apparatus for a radiation source assembly (220) in a fluid treatment system is described. The cleaning apparatus comprises: a carriage (245) movable with respect to an exterior of the radiation source assembly (220); at least one cleaning sleeve (248, 249) in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (200) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.
Abstract:
There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.
Abstract:
There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.
Abstract:
It is often desirable to operate ultraviolet (UV) water treatment systems at high fluid velocities; such as, when low UV doses are required, the UV transmittance of the water being treated is high, or when a high intensity radiation source is used. The operation of an open channel UV fluid treatment system at high fluid velocity causes a disproportionate amount of water to pass through the relatively low intensity region above the top lamp. This results in non-uniform UV dose delivery and poor reactor performance. In one embodiment of the invention, by elevating the inlet to the irradiation zone of the fluid treatment system with respect to the outlet, the amount of water that passes above the top lamp can be minimized, improving overall system performance. The means of elevation can consist of a step or slope in the channel, or a combination of both. Depending on the magnitude of elevation, an increase in maximum velocity of approximately two times can be obtained. In practice, a means must be provided to prevent damage to the radiation sources of the elevated banks that become exposed during periods of low flow. This can consist of either a mechanism for switching off the affected lamp when low water level or high temperature is detected, or a means of lamp cooling.
Abstract:
A cleaning apparatus for a radiation source assembly (220) in a fluid treatment system is described. The cleaning apparatus comprises: a carriage (245) movable with respect to an exterior of the radiation source assembly (220); at least one cleaning sleeve (248, 249) in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (200) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.
Abstract:
In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
Abstract:
In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
Abstract:
There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be 'parked' when not in use. In the so- called 'parked' position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.