FLUID LEVEL CONTROL SYSTEM
    1.
    发明申请
    FLUID LEVEL CONTROL SYSTEM 审中-公开
    流体液位控制系统

    公开(公告)号:WO2003012209A1

    公开(公告)日:2003-02-13

    申请号:PCT/CA2002/001157

    申请日:2002-07-26

    CPC classification number: E02B7/40 E02B7/205 G05D7/0173 Y10T137/7287

    Abstract: There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.

    Abstract translation: 描述了一种新颖的液位控制系统,特别适用于控制在开放通道中流动的水位。 液位控制系统包括具有互连到杆部分(5)的翼片部分(3)的门。 翼片部分可围绕第一枢转点(8)旋转并且包括第一重物。 该系统还包括相对于翼片部分固定的框架(1)。 连杆(11,12,13)将翼片部分和杆部分互连,并且在与第一枢转点(8)不同的第二枢转点(10)处连接到框架。 在通道中的流动条件变化下,本系统通过杠杆部分和翼片部分的绝对运动,以及(ii)杠杆部分和翼片部分之间的相对运动。 还描述了包括液位控制系统的流体处理系统和用于控制流动流体的水平的方法。

    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR
    2.
    发明授权
    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR 有权
    辐射源模块,和清洁设备THEREFOR

    公开(公告)号:EP1159225B1

    公开(公告)日:2003-07-30

    申请号:EP00906106.0

    申请日:2000-02-25

    CPC classification number: C02F1/325 C02F2201/3227 C02F2201/324

    Abstract: A cleaning apparatus for a radiation source assembly (220) in a fluid treatment system is described. The cleaning apparatus comprises: a carriage (245) movable with respect to an exterior of the radiation source assembly (220); at least one cleaning sleeve (248, 249) in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (200) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.

    FLUID LEVEL CONTROL SYSTEM
    3.
    发明授权
    FLUID LEVEL CONTROL SYSTEM 有权
    操作系统进行控制液体镜

    公开(公告)号:EP1415051B1

    公开(公告)日:2007-09-12

    申请号:EP02750727.6

    申请日:2002-07-26

    CPC classification number: E02B7/40 E02B7/205 G05D7/0173 Y10T137/7287

    Abstract: There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.

    FLUID LEVEL CONTROL SYSTEM
    4.
    发明公开
    FLUID LEVEL CONTROL SYSTEM 有权
    操作系统进行控制液体镜

    公开(公告)号:EP1415051A1

    公开(公告)日:2004-05-06

    申请号:EP02750727.6

    申请日:2002-07-26

    CPC classification number: E02B7/40 E02B7/205 G05D7/0173 Y10T137/7287

    Abstract: There is described a novel fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system comprises a gate having a flap portion (3) interconnected to a lever portion (5). The flap portion is rotatable about a first pivot point (8) and comprises a first weight. The system further comprises a frame (1) which is fixed with respect to the flap portion. A linkage (11, 12, 13) interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point (10) different than the first pivot point (8). Under changing flow conditions in the channel, the present system operates by both : absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system comprising the fluid level control system and a method for controlling the level of a flowing fluid are also described.

    SYSTEM AND METHOD FOR TREATING A FLUID BY RADIATION
    5.
    发明公开
    SYSTEM AND METHOD FOR TREATING A FLUID BY RADIATION 审中-公开
    DEVICE AND METHOD FOR辐射液体的处理

    公开(公告)号:EP1292540A2

    公开(公告)日:2003-03-19

    申请号:EP01913434.5

    申请日:2001-03-12

    Abstract: It is often desirable to operate ultraviolet (UV) water treatment systems at high fluid velocities; such as, when low UV doses are required, the UV transmittance of the water being treated is high, or when a high intensity radiation source is used. The operation of an open channel UV fluid treatment system at high fluid velocity causes a disproportionate amount of water to pass through the relatively low intensity region above the top lamp. This results in non-uniform UV dose delivery and poor reactor performance. In one embodiment of the invention, by elevating the inlet to the irradiation zone of the fluid treatment system with respect to the outlet, the amount of water that passes above the top lamp can be minimized, improving overall system performance. The means of elevation can consist of a step or slope in the channel, or a combination of both. Depending on the magnitude of elevation, an increase in maximum velocity of approximately two times can be obtained. In practice, a means must be provided to prevent damage to the radiation sources of the elevated banks that become exposed during periods of low flow. This can consist of either a mechanism for switching off the affected lamp when low water level or high temperature is detected, or a means of lamp cooling.

    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR
    6.
    发明公开
    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR 有权
    辐射源模块,和清洁设备THEREFOR

    公开(公告)号:EP1159225A1

    公开(公告)日:2001-12-05

    申请号:EP00906106.0

    申请日:2000-02-25

    CPC classification number: C02F1/325 C02F2201/3227 C02F2201/324

    Abstract: A cleaning apparatus for a radiation source assembly (220) in a fluid treatment system is described. The cleaning apparatus comprises: a carriage (245) movable with respect to an exterior of the radiation source assembly (220); at least one cleaning sleeve (248, 249) in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (200) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.

    FLUID TREATMENT SYSTEM
    8.
    发明授权
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号:EP2097352B1

    公开(公告)日:2012-06-13

    申请号:EP07816138.7

    申请日:2007-11-06

    Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.

    FLUID TREATMENT SYSTEM
    9.
    发明公开
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号:EP2097352A1

    公开(公告)日:2009-09-09

    申请号:EP07816138.7

    申请日:2007-11-06

    Abstract: In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.

    Abstract translation: 在其一个方面中,本发明涉及一种流体处理系统,其包括:入口; 一个出口; 布置在入口和出口之间的流体处理区。 流体处理区:(i)包括第一壁表面和与第一壁表面相对的第二壁表面,以及(ii)在其中设置至少一排辐射源组件阵列。 每个辐射源组件具有横向于通过流体处理区域的流体流动方向的纵向轴线,并且第一壁表面和第二壁表面中的每一个均包括第一流体偏转元件和第二流体偏转元件。 第一流体偏转元件比第二流体偏转元件更大程度地伸入流体处理区域。

    FLUID TREATMENT SYSTEM
    10.
    发明公开
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号:EP2054346A1

    公开(公告)日:2009-05-06

    申请号:EP07785059.2

    申请日:2007-08-17

    Abstract: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be 'parked' when not in use. In the so- called 'parked' position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

    Abstract translation: 描述了流体处理系统。 该流体处理系统包括:用于接收流体流和流体处理区的开放通道。 所述流体处理区域包括多个细长的辐射源组件,所述多个细长的辐射源组件定向成使得:(i)每个辐射源组件的纵向轴线横向于流体流过所述流体处理区域的方向,并且(ii)每个辐射的末端 源组件设置在开放通道中流体流动的预定最大高度之上。 第一挡板设置在流体处理区的上游。 第一挡板定位成使得其远端低于开放通道中流体流动的预定最大高度。 在优选实施例中,本流体处理系统提供了一个区域,其中用于辐射源组件的清洁系统可以在不使用时“停放”。 在所谓的“停放”位置中,清洁系统可以容易地进入维护等,而不影响通过流体处理区域和流体处理系统的流体流动。 这是流体处理系统的显着优势。

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