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Patent Agency Ranking
公开(公告)号：JP2007169720A
公开(公告)日：2007-07-05
申请号：JP2005369420
申请日：2005-12-22
Applicant: Toppan Printing Co Ltd , 凸版印刷株式会社
Inventor： MASUMOTO TAKESHI , KASHIWA MASASHI
IPC: C23F1/00
Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing etching components which do not cause rust on the surface of a metallic material from a coating application process to a drying process even when a photoresist layer is formed by applying a photoresist using casein to a ferrous metallic material.
SOLUTION: In the method for manufacturing the etching components for working the metallic material, such as a ferrous metallic sheet by using a photoetching method, the alkaline photoresist composed of casein, ammonium dichromate and ammonia water is used as the photoresist to be used in the photoresist method. Alkalinity of the photoresist is pH 7.45±0.15.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：即使当通过使用酪蛋白施加光致抗蚀剂形成光致抗蚀剂层时，提供一种用于制造不会由金属材料表面产生锈蚀的方法从涂布施加过程到干燥过程 到有色金属材料。 解决方案：在通过使用光刻法制造用于加工金属材料的金属材料的蚀刻部件的方法中，使用由酪蛋白，重铬酸铵和氨水组成的碱性光致抗蚀剂作为光致抗蚀剂 用于光刻胶方法。 光致抗蚀剂的碱度为pH 7.45±0.15。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2002373576A
公开(公告)日：2002-12-26
申请号：JP2001178654
申请日：2001-06-13
Applicant: Toppan Printing Co Ltd , 凸版印刷株式会社
Inventor： KASHIWA MASASHI , HARA YUICHIRO , TANAKA SHOJI , FUJITO DAISEI , IMOTO YOSHIHIKO
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a shadow mask wherein variations do not occur in the size of a photo-resist film opening part by making an exposure light entering into the mask for pattern exposure uniform.
SOLUTION: In the manufacturing method of the shadow mask having at least a process to form the photo-resist film on a metal sheet, a process to perform pattern exposure via the mask for pattern exposure nearly adhered to the photo-resist film, a process to develop the photo-resist film, a process to perform etching on the thin metal sheet, and a process to peel off the photo- resist film, the exposure device for the shadow mask used for the pattern exposure is provided with a rectangular light source and a box-state reflecting plate having a face arranged by the rectangular light source as a ceiling face and having a face opposing to the ceiling face as an opening face, and a reflecting film is arranged at the two inner faces of the reflecting plate in nearly parallel with the rectangular light source.
COPYRIGHT: (C)2003,JPOAbstract translation: 要解决的问题：提供一种荫罩的制造方法，其中通过使曝光光进入用于图案曝光的均匀的曝光光而不会在光致抗蚀剂膜开口部的尺寸上发生变化。 解决方案：在至少具有在金属片上形成光刻胶膜的工艺的荫罩的制造方法中，通过几乎附着于光致抗蚀剂膜的图形曝光用掩膜进行图案曝光的工序， 为了显影光致抗蚀剂膜，在薄金属片上进行蚀刻的工艺以及剥离光致抗蚀剂膜的工艺，用于图案曝光的荫罩的曝光装置设置有矩形光源 以及盒状反射板，其具有由矩形光源作为顶面布置的面，并且具有与顶面相对的面作为开口面，反射膜配置在反射板的两个内表面 几乎与矩形光源平行。
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公开(公告)号：JP2006100161A
公开(公告)日：2006-04-13
申请号：JP2004286223
申请日：2004-09-30
Applicant: Toppan Printing Co Ltd , 凸版印刷株式会社
Inventor： KASHIWA MASASHI , KAI TOMOHIRO , FUJITO DAISEI , YUKINO HIROKATSU
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a shadow mask in which fluctuation in resist pattern dimensions after development treatment is suppressed by making uniform the sensitivity in width direction of a resist film formed on both sides of a metal substrate, in the resist coating process for forming the resist film by coating a photoresist on both sides of the long metal substrate and drying in a drying chamber. SOLUTION: When the resist film coated on both sides of a metal substrate is dried in the drying chamber composed of hot air and a far-infrared heater, a shield plate is provided between the far-infrared heater and the metal substrate in the drying chamber and sensitivity in width direction of the resist film is made uniform, and by applying pattern exposure, development, etching, and resist pattern stripping treatment, a shadow mask is obtained. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 解决的问题为了提供一种荫罩的制造方法，其中通过使形成在金属基板的两侧上的抗蚀剂膜的宽度方向上的灵敏度均匀化，可以抑制显影处理后的抗蚀剂图案尺寸的波动， 在通过在长金属基板的两面上涂布光致抗蚀剂并在干燥室中干燥来形成抗蚀剂膜的抗蚀剂涂布工艺中。 解决方案：当在由热空气和远红外线加热器组成的干燥室中干燥涂覆在金属基板两侧的抗蚀剂膜时，在远红外加热器和金属基板之间设置屏蔽板 使干燥室和抗蚀剂膜的宽度方向的灵敏度均匀，通过图案曝光，显影，蚀刻和抗蚀剂图案剥离处理，得到荫罩。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2002042644A
公开(公告)日：2002-02-08
申请号：JP2000223481
申请日：2000-07-25
Applicant: TOPPAN PRINTING CO LTD
Inventor： KASHIWA MASASHI , TANIYAMA KAZUAKI , TAKADA KAZUHIRO , YUKINO HIROKATSU
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method and a device for a shadow mask, capable of preventing generation of unevenness such as a wind ripple on the surface of a photoresist film. SOLUTION: In hot air drying after photoresist coating, a pressure reduced chamber 99 partitioned with two mesh-shaped straightening vanes 95, 97 having different hole diameters are installed inside an air outlet.
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公开(公告)号：JP2001049468A
公开(公告)日：2001-02-20
申请号：JP22448899
申请日：1999-08-06
Applicant: TOPPAN PRINTING CO LTD
Inventor： TANAKA SHOJI , SADA NORIAKI , TANIYAMA KAZUAKI , TAKADA KAZUHIRO , MASUMOTO TAKESHI , SHIBATO HIROSHI , KASHIWA MASASHI
Abstract: PROBLEM TO BE SOLVED: To provide a method for producing etching parts of high quality in which the recessed parts or piercing parts are made into the desired shape. SOLUTION: In the method for producing etching parts at least having a resist film forming stage in which a resist film is formed on the face of a metallic thin sheet, an etching stage in which the metallic thin sheet is subjected to etching and a peeling stage, a means of measuring the internal shape of recessed parts or piercing parts formed in the etching stage in three-dimensions and a means of executing the comparing and deciding between the measured result and the desired internal shape of the recessed parts or piercing parts are provided, after the etching stage, the internal shape of the recessed parts or piercing parts is measured by the measuring means 12, and in the case the fact that the measured internal shape is different from the desired internal shape is confirmed by a comparing and deciding means 13, in such a manner that the internal shape is made into the desired one, the correction of the etching conditions is executed.
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