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公开(公告)号：JP2001348564A
公开(公告)日：2001-12-18
申请号：JP2000169008
申请日：2000-06-06
Applicant: TORAY INDUSTRIES
Inventor： GOTO SHOICHIRO , EDOGAWA KATSUYA , TSURUMI TORU
IPC: B24B37/00 , C09K3/14 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To provide a polishing material for an insulation film layer of a semiconductor capable of improving a polishing speed in the abrasion of an insulation film layer of a semiconductor by CMP method, at the same time, capable of reducing scratch and dust, and having excellent quality. SOLUTION: A slurry liquid prepared by dispersing a compound oxide particles of cerium and zirconium in an aqueous solution.
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公开(公告)号：JPS6456108A
公开(公告)日：1989-03-03
申请号：JP21370887
申请日：1987-08-27
Applicant: TORAY INDUSTRIES
Inventor： EDOGAWA KATSUYA , UEMURA TADAHIRO
Abstract: PURPOSE:To produce a composite semipermeable membrane having high desalting capacity and high water permeability by the interfacial polycondensation reaction of a polyfunctional amine with a polyfunctional acid halide wherein 4-chloroformyl phthalic anhydride is contained in the reactants. CONSTITUTION:A fine porous base film such as fiber-reinforced polysulfone base film is dipped in an aq. soln. of polyfunctional aromatic amine having >=2 amino groups in a molecule such as 1,3,5-triaminobenzene, etc. After removing the excess aq. amine soln. by draining the dipped film, a soln. of polyfunctional acid halide such as 1,3,5-benzene tricarboxylic acid chloride and 4-chloroformyl phthalic anhydride and an acylating catalyst such as dimethyl formamide in trichlorotrifluoroethane is applied on the film. Thus, a superthin layer of crosslinked polyamide is formed on the base film by the interfacial polycondensation of a polyfunctional aromatic amine with a polyfunctional acid halide.
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公开(公告)号：JPS63287507A
公开(公告)日：1988-11-24
申请号：JP12133287
申请日：1987-05-20
Applicant: TORAY INDUSTRIES
Inventor： IZUMI AKIRA , EDOGAWA KATSUYA , UEMURA TADAHIRO
Abstract: PURPOSE:To improve the performance of the title membrane by coating the hyperthin membrane of the cross-linked aromatic polyamide obtained by the interfacial polycondensation of the raw material consisting of specified aromatic amine and an aromatic acid chloride on a microporous supporting membrane, and heating the membrane with hot water. CONSTITUTION:An aromatic amine such as m-phenylenediamine and 1,3,5- triaminobenzene having an amino group of >=2.05 mesh functionality and an aromatic acid chloride such as trimesic acid chloride and tetraphthalic acid chloride are used as the raw material. The raw material is interfacially polycondensed, and the obtained cross-linked polyamide is coated on a microporous supporting membrane of fiber-reinforced polysulfone, etc., to form a hyperthin membrane thereon. The obtained composite membrane is treated with the hot water at pH5.5-8.5 and at 50-100 deg.C. When the obtained semipermeable membrane is used, the amt. of generated water does not decrease with time.
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公开(公告)号：JPS63100906A
公开(公告)日：1988-05-06
申请号：JP24592986
申请日：1986-10-16
Applicant: TORAY INDUSTRIES
Inventor： EDOGAWA KATSUYA , UEMURA TADAHIRO , KURIHARA MASARU
Abstract: PURPOSE:To prepare a semipermeable composite membrane with reduced charged-volume and small dependence on salt concentration, while maintaining a high water permeability by applying a super-thin film comprising specific crosslinked aromatic polyamide as a main component on a hot-water treated microporous substrate membrane. CONSTITUTION:A microporous substrate membrane constituted of polysulfone and the like is immersed in the hot water in the temperature range of 50 deg.C-100 deg.C and treated. On said substrate membrane, a super-thin film with a thickness in the range of 10nm-1,000nm comprising as major component crosslinked aromatic polyamide prepared by the interfacial condensation reaction of an aqueous solution containing aromatic amine having two amino radicals constituted with compounds of the formula I and the like, and a reaction material constituted with a water-immiscrible organic solvent solution comprising trichlorotrifluoroethane and the like containing aromatic chloride with average functionality of 2.25-2.75 constituted with the compounds of the formula II and the like. As a result, a semipermeable composite membrane with a high water permeability maintained and also with reduced charged-volume and small dependence on salt concentration is prepared.
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公开(公告)号：JP2002097459A
公开(公告)日：2002-04-02
申请号：JP2000290125
申请日：2000-09-25
Applicant: TORAY INDUSTRIES
Inventor： GOTO SHOICHIRO , EDOGAWA KATSUYA , TSURUMI TORU
IPC: B24B37/00 , C09K3/14 , H01L21/304 , H01L21/306
Abstract: PROBLEM TO BE SOLVED: To obtain a high-performance abrasive agent for an insulation film layer for semiconductors permitting improvement in an abrasion speed and concurrent reduction in scratch and dust on abrading an insulation film layer for semiconductors by the CMP method. SOLUTION: The abrasive agent comprises a slurry comprising an aqueous solution having dispersed therein oxide particles comprising cerium as a constituting atom, where the ζ potential of the oxide particles is -10 mV or less.
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Patent Agency Ranking
公开(公告)号：JP2001351883A
公开(公告)日：2001-12-21
申请号：JP2000169005
申请日：2000-06-06
Applicant: TORAY INDUSTRIES
Inventor： GOTO SHOICHIRO , EDOGAWA KATSUYA , TSURUMI TORU
IPC: B24B37/00 , C09K3/14 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To provide a high-quality abrasive for insulation film of a semiconductor which can increase a polishing speed while at the same time reducing scratches and dust when polishing an insulation film of a semiconductor by CMP method. SOLUTION: The abrasive for an insulation layer of a semiconductor consists of a slurry prepared by dispersing composite oxide particles of cerium and zirconium into an aqueous solution.
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公开(公告)号：JP2001351882A
公开(公告)日：2001-12-21
申请号：JP2000169006
申请日：2000-06-06
Applicant: TORAY INDUSTRIES
Inventor： GOTO SHOICHIRO , EDOGAWA KATSUYA , TSURUMI TORU
IPC: B24B37/00 , C09K3/14 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To provide a high-quality abrasive for insulation film of a semiconductor which can increase a polishing speed while at the same time reducing scratches and dust when polishing an insulation film of a semiconductor by CMP method. SOLUTION: The abrasive consists of a slurry prepared by dispersing composite oxide particles of cerium and zirconium which has a specific surface area 3-100 m2/g, into an aqueous solution.
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公开(公告)号：JPH10218662A
公开(公告)日：1998-08-18
申请号：JP2024997
申请日：1997-02-03
Applicant: TORAY INDUSTRIES
Inventor： OGATA TOMOHIKO , YOSHIDA FUMIO , EDOGAWA KATSUYA
IPC: C04B35/48
Abstract: PROBLEM TO BE SOLVED: To produce a partially stabilized zirconia sintered compact useful as a member for a use requiring high strength, high toughness and abrasion resistance by using a sinter containing zirconia as a raw materials, preparing heat treated zirconia powder and sintering the treated zirconia powder to recycle the sinter containing the zirconia. SOLUTION: A raw material of sinter containing zirconia preferably including 1.5-5mol% yttria as a stabilizer is heat treated, preferably in pure water at 150-500 deg.C for 5-200hr, more preferably at 200-280 deg.C for 10-150hr to peptize the sinter containing the zirconia and to provide zirconia powder (sol), 50% of which is preferably a single crystal, preferably having
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公开(公告)号：JPS5149167A
公开(公告)日：1976-04-28
申请号：JP12353574
申请日：1974-10-26
Applicant: TORAY INDUSTRIES
Inventor： ENTA TSUYOSHI , SAKURAI JUZO , TAKAHASHI AKIO , EDOGAWA KATSUYA , NISHIOKA MASAHIKO , MATSUMURA TERUICHIRO , KATO MYOKO , TAKEYAMA SATORU
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公开(公告)号：JPS637807A
公开(公告)日：1988-01-13
申请号：JP15047386
申请日：1986-06-26
Applicant: TORAY INDUSTRIES
Inventor： EDOGAWA KATSUYA , UEMURA TADAHIRO , KURIHARA MASARU
Abstract: PURPOSE:To obtain a composite membrane which is excellent in high desalting properties and high permeability and suitable for the production of super-pure water by coating the aq. soln. of a multifunctional water-soluble amino compd. on a porous support and crosslinking it by a multifunction crosslinking agent and thereafter treating it by an alkali aq. soln. CONSTITUTION:An aq. soln. incorporating a water-soluble amino compd. having primary or secondary amino groups not less than at least two pieces in a molecule as an essential component is coated on a porous support. The concn. is 0.1-10wt% and furthermore 0.01-2wt% surfactant is preferably added. Then such a soln. that a multifunctional crosslinking agent having groups reacting with amino groups not less than at least two pieces and containing chlorosulfonyl groups not less than one piece is incorporated in a solvent which is immiscible with water and does not dissolve the porous support is coated thereon. The concn. preferably is 0.01-1wt%. The obtained composite membrane is treated by an alkali aq. soln. to hydrolyze nonreacted sulfonyl halide. The concn. is 0.1-10wt% and treatment time preferably is about 0.5-10hr.
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