公开(公告)号：DE112008000047T5

公开(公告)日：2009-09-10

申请号：DE112008000047

申请日：2008-10-29

Applicant: ULVAC INC

Inventor： UEDA MASAHISA ,  KURIMOTO TAKASHI ,  NAKAMURA KYUZO ,  SUU KOUKOU ,  YOGO TOSHIYA ,  KOMATSU KAZUSHIGE ,  TACHIBANA NOBUSUKE

IPC: H01L21/3065

Abstract: An ashing device that prevents the ashing rate from changing over time. The ashing device ashes organic material on a substrate including an exposed metal in a processing chamber. The ashing device includes a path, which is formed in the processing chamber and through which active species supplied to the processing chamber pass. The path is defined by a surface on which the metal scattered from the substrate by the active species is collectible, with the surface being formed so as to expose a metal that is of the same kind.