公开(公告)号：DE60012605T2

公开(公告)日：2005-08-11

申请号：DE60012605

申请日：2000-04-14

Applicant: UNITED TECHNOLOGIES CORP ,  GEN ELECTRIC ,  NASA

Inventor： EATON JR ,  ALLEN WILLIAM P ,  MILLER ROBERT A ,  JACOBSON NATHAN S ,  SMIALEK JAMES L ,  OPILA ELIZABETH J ,  LEE KANG N ,  NAGARAJ BANGALORE A ,  WANG HONGYU ,  MESCHTER PETER J ,  LUTHRA KRISHAN L

IPC: B05D7/24 ,  B32B9/00 ,  B32B18/00 ,  C04B41/50 ,  C04B41/52 ,  C04B41/85 ,  C04B41/87 ,  C04B41/89 ,  C23C4/02 ,  C23C4/10 ,  C23C4/18 ,  C23C28/04 ,  F01D5/28

Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumina silicate.

公开(公告)号：DE60101868T2

公开(公告)日：2004-10-28

申请号：DE60101868

申请日：2001-05-09

Applicant: UNITED TECHNOLOGIES CORP

Inventor： EATON JR ,  CHIN STEPHEN ,  BRENNAN JOHN J

IPC: C04B41/87 ,  C04B35/18 ,  C04B35/195 ,  C04B41/50 ,  C04B41/85 ,  C23C4/10 ,  C23C18/12 ,  C23C22/68 ,  C23C26/00 ,  C23C30/00 ,  F01D5/28 ,  F02K1/82

Abstract: A barrier layer for a silicon containing substrate comprises an alkaline earth aluminosilcate and an additive component capable of forming a reaction product with silica.

公开(公告)号：DE60101868D1

公开(公告)日：2004-03-04

申请号：DE60101868

申请日：2001-05-09

Applicant: UNITED TECHNOLOGIES CORP

Inventor： EATON JR ,  CHIN STEPHEN ,  BRENNAN JOHN J

IPC: C04B41/87 ,  C04B35/18 ,  C04B35/195 ,  C04B41/50 ,  C04B41/85 ,  C23C4/10 ,  C23C18/12 ,  C23C22/68 ,  C23C26/00 ,  C23C30/00 ,  F01D5/28 ,  F02K1/82

Abstract: A barrier layer for a silicon containing substrate comprises an alkaline earth aluminosilcate and an additive component capable of forming a reaction product with silica.

公开(公告)号：DE60012605D1

公开(公告)日：2004-09-09

申请号：DE60012605

申请日：2000-04-14

Applicant: UNITED TECHNOLOGIES CORP ,  GEN ELECTRIC ,  NASA

Inventor： EATON JR ,  ALLEN WILLIAM P ,  MILLER ROBERT A ,  JACOBSON NATHAN S ,  SMIALEK JAMES L ,  OPILA ELIZABETH J ,  LEE KANG N ,  NAGARAJ BANGALORE A ,  WANG HONGYU ,  MESCHTER PETER J ,  LUTHRA KRISHAN L

IPC: B05D7/24 ,  B32B9/00 ,  B32B18/00 ,  C04B41/50 ,  C04B41/52 ,  C04B41/85 ,  C04B41/87 ,  C04B41/89 ,  C23C4/02 ,  C23C4/10 ,  C23C4/18 ,  C23C28/04 ,  F01D5/28

Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumina silicate.