-
公开(公告)号：AT546823T
公开(公告)日：2012-03-15
申请号：AT08828039
申请日：2008-07-02
Applicant: XENOCS
Inventor： HOGHOJ PETER , BOULEE PASCAL , NTOVA PARASKEVI , RODRIGUES SERGIO
Abstract: The invention relates to X-ray analytical instruments (RX), more precisely a device for providing a high energy X-ray beam, typically above 4 keV, for X-ray analysis applications. The device comprises an X-ray tube with a turning anode and an X-ray lens for shaping the beam.
-
公开(公告)号：DE60308645T2
公开(公告)日：2007-10-18
申请号：DE60308645
申请日：2003-06-19
Applicant: XENOCS
Inventor： HOGHOJ PETER , DARIEL AURELIEN , RODRIGUES SERGIO
Abstract: Multilayer reflective optical unit has a lateral gradient, the reflective surface of which serves to reflect X-rays which are incident at an acute angle of incidence and produce a 2-dimensional optical effect. Said reflective surface has a single surface that is shaped along two curves in two different directions. The invention also relates to a corresponding method for manufacturing such an optical unit in which a substrate that is already curved is coated along a different direction and a device for processing X-rays for use in RX angle dispersive reflectometry that serves to condition a beam incident on a sample such that it contains rays with different incidence angles.
-
公开(公告)号：FR2850171B1
公开(公告)日：2005-04-08
申请号：FR0300623
申请日：2003-01-21
Applicant: XENOCS
Inventor： HOGHOJ PETER , DARIEL AURELIEN , RODRIGUES SERGIO
-
公开(公告)号：AU2003260613A1
公开(公告)日：2004-01-06
申请号：AU2003260613
申请日：2003-06-19
Applicant: XENOCS
Inventor： HOGHOJ PETER , DARIEL AURELIEN , RODRIGUES SERGIO
Abstract: Multilayer reflective optical unit has a lateral gradient, the reflective surface of which serves to reflect X-rays which are incident at an acute angle of incidence and produce a 2-dimensional optical effect. Said reflective surface has a single surface that is shaped along two curves in two different directions. The invention also relates to a corresponding method for manufacturing such an optical unit in which a substrate that is already curved is coated along a different direction and a device for processing X-rays for use in RX angle dispersive reflectometry that serves to condition a beam incident on a sample such that it contains rays with different incidence angles.
-
公开(公告)号：FR2955391A1
公开(公告)日：2011-07-22
申请号：FR1050301
申请日：2010-01-18
Applicant: XENOCS
Inventor： PANINE PIERRE , HOGHOJ PETER
IPC: G01N23/201
Abstract: L'invention concerne un dispositif de délivrance d'un faisceau de rayons-X pour l'analyse d'un échantillon (50), comprenant : - un bloc source (100) comprenant des moyens d'émission de rayons-X ; - un bloc optique (200) placé en aval du bloc source (100), ledit bloc optique (200) comprenant un composant optique monochromateur (210) ayant une surface réfléchissante (212) prévue pour conditionner des rayons-X émis par le bloc source (100) selon un effet optique monodimensionnel ou bidimensionnel ; et des moyens de définition (300) des rayons-X comprenant : o un organe (310) anti-diffusant de délimitation spatiale des rayons-X conditionnés par le composant optique monochromateur (210), placé en aval du composant optique monochromateur (210) et comprenant une ou plusieurs plaques (311) ayant des portions (313) agencées pour former un orifice de délimitation (312), lesdites portions (313) étant revêtues d'un matériau monocristallin limitant la diffusion de rayons-X ; o un organe (320) de coupure des rayons-X émis par le bloc source (100), comprenant des moyens d'absorption de rayons-X agencés dans le dispositif de délivrance pour couper les faisceaux directs de rayons-X susceptibles d'atteindre l'organe (310) anti-diffusant de délimitation spatiale sans conditionnement par le composant optique monochromateur (210).
-
Patent Agency Ranking
公开(公告)号：AT421152T
公开(公告)日：2009-01-15
申请号：AT03760747
申请日：2003-06-19
Applicant: XENOCS
Inventor： HOGHOJ PETER , DARIEL AURELIEN , RODRIGUES SERGIO
Abstract: Multilayer reflective optical unit has a lateral gradient, the reflective surface of which serves to reflect X-rays which are incident at an acute angle of incidence and produce a 2-dimensional optical effect. Said reflective surface has a single surface that is shaped along two curves in two different directions. The invention also relates to a corresponding method for manufacturing such an optical unit in which a substrate that is already curved is coated along a different direction and a device for processing X-rays for use in RX angle dispersive reflectometry that serves to condition a beam incident on a sample such that it contains rays with different incidence angles.
-
公开(公告)号：FR2901628A1
公开(公告)日：2007-11-30
申请号：FR0604666
申请日：2006-05-24
Applicant: XENOCS SOC PAR ACTIONS SIMPLIF
Inventor： HOGHOJ PETER , RODRIGUES SERGIO
Abstract: L'invention concerne un ensemble optique comprenant un empilement d'une pluralité de coques réflectives (10;20), chaque coque réflective comprenant un substrat (11) ayant une face arrière (111) comprenant une pluralité de nervures (111) formant entretoise et une face avant (112), et un revêtement réflecteur (12) pour rayons X déposé sur la face avant (112) du substrat (11), caractérisé en ce que chaque coque réflective (10) comprend en outre une couche d'adhésion (13) déposée sur le revêtement réflecteur (12), la couche d'adhésion (13) étant une couche mince formée dans un matériau inorganique permettant une adhésion moléculaire avec la face arrière du substrat (21) de la coque réflective adjacente (20).L'invention concerne également un procédé de fabrication d'un tel ensemble optique.
-
公开(公告)号：FR2825473A1
公开(公告)日：2002-12-06
申请号：FR0107228
申请日：2001-06-01
Applicant: XENOCS
Inventor： HOGHOJ PETER
Abstract: Alteration of the reflective properties of desired regions of a multilayer structure (30) intended for exposure to and desired modification of radiation of a given wavelength involves exposure to a beam (20) of energetic particles. Control of exposure is performed in such a way that the reflectivity peak of each region is shifted in a desired manner within the wavelength spectrum. The multilayer structure (30) represents a reflective mask for lithography, and is intended for exposure to extreme ultraviolet (EUV) radiation. Preferably, the multilayer structure (30) comprises a diffractive pattern. Control of exposure of the structure (30) to the energy beam (20) is performed by adjusting the time of exposure of each individual region of the structure (30) to the beam (20), or by temporary and controlled modification of the energy beam (20). Alteration of the reflective properties of the region is achieved by modification of the period of the region, and constitutes treatment of the desired region to render it non-reflective or reflective. Independent claims are given for: (a) a reflective mask for lithography produced by the above process; (b) a mirror produced by the above process; and (c) use of the above process to adjust the optical properties of a multilayer structure comprising a mirror for EUV lithography. Preferred Use: The process is used for adjusting the optical properties of a multilayer structure.
-
公开(公告)号：WO2010004122A3
公开(公告)日：2010-03-04
申请号：PCT/FR2009000794
申请日：2009-06-26
Applicant: XENOCS SA , HOGHOJ PETER
Inventor： HOGHOJ PETER
IPC: G01N23/20 , G01N23/223
CPC classification number: G01N23/2076
Abstract: The invention relates to an energy-dispersive X-ray reflectometry system for analyzing a specimen, comprising: a source (1) for emitting an X-ray beam, said source (1) being coupled to an optical collection device (2) comprising means for focusing the beam emitted by the source (1) with a spot size measured in two directions of less than 100 µm and at a given angle of incidence to the specimen; a detection device (3) for measuring the intensity of the X-ray beam reflected by the specimen as a function of the energy of the X-rays over a predetermined measurement energy range, characterized in that the source (1) includes means for emitting an X-ray beam with a polychromatic spectrum of energies below 3 keV and in that the optical collection device (2) is placed relative to the specimen so as to focus the beam at a fixed angle of incidence in order for the projection of the spot on the specimen to have an elongation factor of less than 10.
Abstract translation: 本发明涉及用于分析样本的能量色散X射线反射测量系统，包括：用于发射X射线束的源（1），所述源（1）耦合到光学收集装置（2） 用于将由源（1）发射的光束聚焦成在小于100μm的两个方向上测量的光斑尺寸并且以给定的入射角对样本进行测量; 检测装置（3），用于根据在预定测量能量范围内的X射线的能量来测量由样本反射的X射线束的强度，其特征在于，源（1）包括用于发射 具有低于3keV能量的多色谱的X射线束，并且所述光学收集装置（2）相对于所述样本放置，以便以固定入射角聚焦所述束以便投射所述点 在样品上具有小于10的延伸系数。
-
公开(公告)号：WO2008012419A2
公开(公告)日：2008-01-31
申请号：PCT/FR2007001252
申请日：2007-07-20
Applicant: XENOCS , BOULEE PASCAL , CENDA DAN MIHAI , HOGHOJ PETER
Inventor： BOULEE PASCAL , CENDA DAN MIHAI , HOGHOJ PETER
Abstract: The invention relates to a system (1) for delivering an X-ray beam, comprising a source block (100) that emits a source X-ray beam and conditioning means (500) for conditioning the source beam sent towards a specimen. The system (1) includes stabilization means (800) designed to thermally stabilize a region of the system (1) lying downstream of the source block (100), in order to limit heat transfer towards the conditioning means for the purpose of preventing thermal perturbations in the conditioning means (500).
Abstract translation: 本发明涉及一种用于传送X射线束的系统（1），其包括发射源X射线束的源块（100）和用于调节朝向样本发送的源束的调节装置（500）。 系统（1）包括稳定装置（800），其被设计成热稳定位于源块（100）下游的系统（1）的区域，以限制向调节装置传热，以防止热扰动 在调节装置（500）中。
-
-
-
-
-
-
-
-
-
Search Results
39
records
(took 0.02 seconds)
