公开(公告)号：DE60334175D1

公开(公告)日：2010-10-28

申请号：DE60334175

申请日：2003-04-17

Applicant: XEROX CORP

Inventor： DUNEC JOHN L ,  VOLKEL ARMIN R ,  PEETERS ERIC ,  ROSA MICHEL A ,  DEBRUYKER DIRK ,  HANTSCHEL THOMAS

IPC: B81B3/00 ,  G02B26/08

公开(公告)号：JP2003307483A

公开(公告)日：2003-10-31

申请号：JP2003079950

申请日：2003-03-24

Applicant: Xerox Corp ,  ゼロックス・コーポレーション

Inventor： HANTSCHEL THOMAS ,  CHOW EUGENE M ,  FORK DAVID K

IPC: G01B21/30 ,  B81B3/00 ,  G01Q10/00 ,  G01Q20/02 ,  G01Q30/00 ,  G01Q60/00 ,  G01Q70/02 ,  G01Q70/08 ,  G01Q70/16 ,  G01N13/10

CPC classification number: G01Q70/10 ,  G01Q70/06 ,  G01Q70/16 ,  G01R1/06727 ,  Y10S977/873

Abstract: PROBLEM TO BE SOLVED: To provide a scanning probe system of a scanning probe microscope system or the like having a low-cost probe that can be easily manufactured. SOLUTION: The scanning probe microscope (SPM) system for probing a sample 115 includes a stand 110 having a surface for mounting the sample 115, a probe assembly 120-1, and pieces of measuring apparatus (142, 145). The probe assembly includes a substrate 122, and a spring probe 125. The probe 125 comprises a fixed end 210 mounted to the substrate, a central section 220 that is curved away from the substrate, and a free end 230 having a probe chip 235 that is arranged adjacent to the surface of the stand. The pieces of measuring apparatus measure deformation in the spring probe 125 due to the interaction between the probe chip 235 and the sample 115. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供具有可以容易地制造的低成本探针的扫描探针显微镜系统等的扫描探针系统。 解决方案：用于探测样品115的扫描探针显微镜（SPM）系统包括具有用于安装样品115的表面的支架110，探针组件120-1和测量装置（142,145）。 探针组件包括基底122和弹簧探针125.探针125包括安装到基底的固定端210，远离基底弯曲的中心部分220和具有探针芯片235的自由端230，探针芯片235 被布置成与支架的表面相邻。 测量装置测量由于探针芯片235和样品115之间的相互作用而导致的弹簧探针125中的变形。（C）2004，JPO

公开(公告)号：JP2004106172A

公开(公告)日：2004-04-08

申请号：JP2003286395

申请日：2003-08-05

Applicant: Xerox Corp ,  ゼロックス コーポレイションXerox Corporation

Inventor： HANTSCHEL THOMAS ,  FORK DAVID K ,  CHOW EUGENE M ,  DEBRUYKER DIRK ,  MICHAEL A ROSA

IPC: G01N37/00 ,  B01L3/00 ,  B01L3/02 ,  B41J2/14 ,  B41J2/16 ,  B81B3/00 ,  B81C1/00 ,  B82B3/00 ,  C40B60/14 ,  G01N35/00 ,  G01N35/10

CPC classification number: G01N35/1074 ,  B01J2219/00387 ,  B01L3/0244 ,  B01L3/0255 ,  B01L3/502715 ,  B01L2300/0819 ,  B01L2400/025 ,  B01L2400/0406 ,  B41J2/14314 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1643 ,  C40B60/14 ,  G01N35/1009 ,  G01N2035/00237 ,  G01N2035/1037 ,  G03F7/0002 ,  Y10T436/2575

Abstract: PROBLEM TO BE SOLVED: To provide a fluidic conduit which can be used in microarraying systems, nano-lithography systems of dip pen type, a fluidic circuit and microfluidic systems. SOLUTION: This fluidic conduit comprises a spring beam 460 which has a fixed part 453 attached to a substrate 440, and a cantilever part 454 having a curvature away from the substrate 440. The spring beam 460 defines a first channel 452 extending approximately parallel with the curvature of the cantilever part 454, in order to carry fluid along the cantilever part 454 of the spring beam 460. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供可用于微阵列系统的流体导管，浸笔式纳米光刻系统，流体回路和微流体系统。 解决方案：该流体导管包括弹簧梁460，其具有连接到基底440的固定部分453和具有远离基底440的曲率的悬臂部分454.弹簧梁460限定大致延伸的第一通道452 平行于悬臂部分454的曲率，以沿着弹簧梁460的悬臂部分454承载流体。（C）2004，JPO

公开(公告)号：JP2004001209A

公开(公告)日：2004-01-08

申请号：JP2003119005

申请日：2003-04-23

Applicant: Xerox Corp ,  ゼロックス・コーポレーション

Inventor： DUNEC JOHN L ,  PEETERS ERIC ,  VOLKEL ARMIN R ,  MICHAEL A ROSA ,  DEBRUYKER DIRK ,  HANTSCHEL THOMAS

IPC: B81B3/00 ,  G02B26/08

CPC classification number: B81B3/0008 ,  B81B3/0021 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/058 ,  G02B26/0841 ,  H02N1/002

Abstract: PROBLEM TO BE SOLVED: To provide an improved micro-electro-mechanical system for controlling deflections caused by static electricity of a supporting structure associated with a movable electrode.
SOLUTION: The micro-electro-mechanical system comprises a substrate 108, the movable electrode 114 moving on a track within a moving plane surface 110 approximately vertical to the substrate surface, and at least one fixed electrode 116 for controlling movement of the movable electrode 114. Ninety percent of the electrode surface of the fixed electrode 116 extends over the surface covered with the movable electrode 114 when the electrode 114 moves on the moving plane surface 110 maximizing the contact of the movable electrode 114 with the substrate 108.
COPYRIGHT: (C)2004,JPO