Electron beam irradiation method and scanning electronic microscope
    10.
    发明授权
    Electron beam irradiation method and scanning electronic microscope 有权
    电子束照射法和扫描电子显微镜

    公开(公告)号:US09257259B2

    公开(公告)日:2016-02-09

    申请号:US13807577

    申请日:2011-06-08

    Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.

    Abstract translation: 提供了一种电子束扫描方法,用于形成用于将从图案发射的电子适当地引导到图案的外部的电场,并且还提供了扫描电子显微镜。 当用于形成电荷的电子束照射到样品时,第一电子束被照射到第一位置(1)和第二位置(2),其具有在样品上形成的图案的中心(104)作为对称点 然后另外照射到第一和第二照射位置之间的两个中心位置(3,4),两个中心位置(3,4)处于与第一和第二位置对称的点对中的相同的半径上。 此外,在此之后,重复将第一电子束照射到半径上的现有扫描位置之间的中心位置。

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