公开(公告)号：WO2022240595A1

公开(公告)日：2022-11-17

申请号：PCT/US2022/026852

申请日：2022-04-29

Applicant: KLA CORPORATION

Inventor： JIANG, Xinrong

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/12 ,  H01J2237/0453 ,  H01J2237/0473 ,  H01J37/073 ,  H01J37/14

Abstract: Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

公开(公告)号：WO2021122863A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/086595

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  GONG, Zizhou ,  HU, Xuerang ,  LIU, Xuedong ,  CHEN, Zhong-wei

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/153 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/049 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/1532 ,  H01J2237/20207 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/292 ,  H01J37/3177

Abstract: Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.

公开(公告)号：WO2021190976A1

公开(公告)日：2021-09-30

申请号：PCT/EP2021/056519

申请日：2021-03-15

Applicant: ASML NETHERLANDS B.V.

Inventor： STORM, Arjen, Benjamin ,  VAN GURP, Johan, Frederik, Cornelis ,  DE LANGEN, Johannes, Cornelis, Jacobus ,  AYAL, Aaron, Yang-Fay ,  BRUININK, Michiel, Matthieu ,  VAN DEN BERG, Christiaan, Ruben ,  OTTEN, Christiaan ,  DINU GURTLER, Laura ,  SMITS, Marc

IPC: H01J37/09 ,  G01N23/2251 ,  H01J37/317 ,  B41J2/14 ,  H01J9/02 ,  H01J29/80 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/31774 ,  H01J37/3177

Abstract: Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

公开(公告)号：WO2021140035A1

公开(公告)日：2021-07-15

申请号：PCT/EP2020/087777

申请日：2020-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： WIELAND, Marco, Jan-Jaco

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/04 ,  H01J37/317 ,  H01J2237/0453 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/0635 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2441 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2811 ,  H01J2237/2817 ,  H01J2237/31744 ,  H01J2237/31774 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/265 ,  H01J37/3177

Abstract: A charged particle assessment tool comprising: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having an sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.