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公开(公告)号：AU2022293912B2
公开(公告)日：2024-09-26
申请号：AU2022293912
申请日：2022-05-30
Applicant: SIEMENS MOBILITY GMBH
Inventor： DE STEFANO ERNESTO , FORTUNATI DANIEL , NAYAK BHABANI
Abstract: The invention relates to a method, as well as a device and a computer program, for monitoring a first time base of a first communication device and a second time base of a second communication device with the aid of a computer. In a first sequence, Christian's algorithm is used in measurement steps (n) to calculate time offset intervals of a time offset between the time bases. In a second sequence, the maximally possible drift (Ωo) of the time offset is ascertained multiple times for two measurement steps (n, n+x) while taking into consideration the lower limit of the time offset interval for the previous measurement step and the upper limit of the time offset interval for the subsequent measurement step, and a minimally possible drift (Ωu) is ascertained while taking into consideration the upper limit of the time offset interval for the previous measurement step and the lower limit of the time offset interval for the subsequent measurement step. The upper limit of a drift interval (CDW) is calculated while taking into consideration the maximally possible drift, and the lower limit of the drift interval is calculated while taking into consideration the minimally possible drift. In a third sequence, the lowest upper limit is defined as the upper limit of a resulting drift interval (RCDW) for the relative drift from multiple drift intervals (CDW), and the highest lower limit is defined as the lower limit of the resulting drift interval (RCDW) with advantageously narrow limits for the relative drift.
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公开(公告)号：JPS5863246A
公开(公告)日：1983-04-15
申请号：JP16302781
申请日：1981-10-13
Applicant: NIPPON ELECTRIC CO
Inventor： SUGAWARA HIROYUKI , ROKUGOU YOSHINORI , ASANO HIROSHI
Abstract: PURPOSE:To ensure a common use to both a subframe synchronizing circuit and a multiframe synchronizing circuit for a synchronism protecting circuit which is provided with several stages of counters and a latching circuit, by adding a selecting circuit including a logic element. CONSTITUTION:When a subframe synchronism is secured, the output of a subframe marker detecting circuit 101 is fed to the input terminals 7 and 8 of a coincidence circuit 402 and a discordance circuit 403 respectively via a selecting circuit 401. The subframe counter stopping signal is fed to a frame counter 201 from an output terminal 14 of a latching circuit 404 via the circuit 401. During this process, the subframe synchronism is secured. The multiframe synchronism is secured by switching the circuit 401.
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公开(公告)号：JPS5438761A
公开(公告)日：1979-03-23
申请号：JP10550877
申请日：1977-09-01
Applicant: MITSUBISHI ELECTRIC CORP
Inventor： NAKANISHI TOSHIO
Abstract: PURPOSE:To cope with the thermal stress of the electrode in the electronic gun assembly, by preventing the warp toward the radiation direction of the electronic beam via the renoforcement projection bank and then limiting the thermal expansion caused by the cathode heat radiation to the area around the aperture.
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Patent Agency Ranking
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公开(公告)号：US3197715A
公开(公告)日：1965-07-27
申请号：US14256361
申请日：1961-10-03
Applicant: BELL TELEPHONE LABOR INC
Inventor： ARTHUR ASHKIN
CPC classification number: H01J3/06 , H01S3/0602 , H01S3/0612
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公开(公告)号：GB2408143B
公开(公告)日：2006-11-15
申请号：GB0423152
申请日：2004-10-18
Applicant: IMS NANOFABRICATION GMBH
Inventor： STENGL GERHARD , PLATZGUMMER ELMAR , LOSCHNER HANS
IPC: G03F7/20 , H01J37/317 , H01J3/06 , H01J37/08 , H01L21/027
Abstract: A charged-particle multi-beam exposure apparatus ( 1 ) for exposure of a target ( 41 ) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target ( 41 ). For each particle beam an illumination system ( 10 ), a pattern definition means ( 20 ) and a projection optics system ( 30 ) are provided. The illuminating system ( 10 ) and/or the projection optics system ( 30 ) comprise particle-optical lenses having lens elements (L 1 , L 2 , L 3 , L 4 , L 5 ) common to more than one particle beam. The pattern definition means ( 20 ) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target ( 41 ), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
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公开(公告)号：GB2408143A
公开(公告)日：2005-05-18
申请号：GB0423152
申请日：2004-10-18
Applicant: IMS NANOFABRICATION GMBH
Inventor： STENGL GERHARD , PLATZGUMMER ELMAR , LOSCHNER HANS
IPC: G03F7/20 , H01J37/317 , H01L21/027 , H01J3/06 , H01J37/08
Abstract: A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
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公开(公告)号：DE1286558B
公开(公告)日：1969-01-09
申请号：DEI0032583
申请日：1966-12-22
Applicant: IBM
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