公开(公告)号：US20210189550A1

公开(公告)日：2021-06-24

申请号：US17055885

申请日：2019-03-15

Applicant: ENTEGRIS, INC.

Inventor： Oleg BYL ,  Ying TANG ,  Joseph R. DESPRES ,  Joseph SWEENEY ,  Sharad N. YEDAVE

IPC: C23C14/48 ,  H01J37/317 ,  C23C14/56 ,  H01J37/08

Abstract: The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) N of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during an ion implantation procedure.

公开(公告)号：US20220128196A1

公开(公告)日：2022-04-28

申请号：US17505735

申请日：2021-10-20

Applicant: ENTEGRIS, INC.

Inventor： Joseph R. DESPRES ,  Joseph SWEENEY ,  Edward A. STURM

IPC: F17C11/00 ,  B01D53/02 ,  B01J20/30 ,  B01J20/20

Abstract: Described are storage and dispensing systems and related methods, for the storage and selective dispensing germane a reagent gas from a vessel in which the reagent gas is held in sorptive relationship to a solid adsorbent medium at an interior of a storage vessel and wherein the methods and dispensing systems provide dispensing of the reagent gas from the storage vessel with a reduced level of atmospheric impurities contained in the dispensed reagent gas.