公开(公告)号：US20210275002A1

公开(公告)日：2021-09-09

申请号：US16326147

申请日：2017-10-13

Applicant: HOYA CORPORATION

Inventor： Yoshitsugu HOSOGOE ,  Keiichi SAITO

IPC: A61B1/00

Abstract: An example elevator attachable to and detachable from an endoscope including a lever pivotally provided at a distal end of an insertion part of the endoscope and a pivot part causing the lever to pivot, includes: a first elevating part having a recess at one surface thereof; a second elevating part protruding from an edge of the first elevating part; and a lever connection part located at an end of the second elevating part and connected to the lever.

公开(公告)号：US20210267439A1

公开(公告)日：2021-09-02

申请号：US17257358

申请日：2019-12-24

Applicant: HOYA CORPORATION

Inventor： Kunihiko ONOBORI ,  Kohei IKETANI

IPC: A61B1/00 ,  A61B1/05 ,  A61B1/07 ,  A61B1/005

Abstract: An endoscope includes an insertion portion that is covered with an exterior tube with an outer diameter of 1 mm or less, an observation optical system that includes a rectangular image sensor fixed to a tip of the insertion portion and having a length of one side of 60% or less of the outer diameter of the insertion portion, an illumination fiber that is arranged between an inner surface of the exterior tube and an edge of the observation optical system and penetrates the exterior tube, a cable bundle that is connected to the image sensor and penetrates the exterior tube, and a connector that is connected to the cable bundle and the illumination fiber.

公开(公告)号：US11098224B2

公开(公告)日：2021-08-24

申请号：US16337310

申请日：2017-11-24

Applicant: HOYA CORPORATION

Inventor： Hiroki Nakagawa ,  Kashio Nakayama

IPC: C09G1/02 ,  B24B1/00 ,  B81C1/00 ,  B24B37/04 ,  C09K3/14 ,  C23C14/02 ,  C23C14/34 ,  G11B5/84

Abstract: A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

公开(公告)号：US20210256999A1

公开(公告)日：2021-08-19

申请号：US17266079

申请日：2019-08-07

Applicant: HOYA CORPORATION

Inventor： Shinji EDA

IPC: G11B5/73

Abstract: A disk-shaped substrate for a magnetic disk has a diameter D of 85 mm or more and a thickness T of 0.6 mm or less, and a material of the substrate has a Young's modulus E of 90 GPa or more.

公开(公告)号：US20210255536A1

公开(公告)日：2021-08-19

申请号：US17227655

申请日：2021-04-12

Applicant: HOYA CORPORATION

Inventor： Yohei IKEBE ,  Tsutomu SHOKI ,  Takahiro ONOUE ,  Hirofumi KOZAKAI

IPC: G03F1/24 ,  G03F1/26

Abstract: Provided are a reflective mask blank, having a phase shift film having little dependence of phase difference and reflectance on film thickness, and a reflective mask. The reflective mask blank is characterized in that the phase shift film is composed of a material comprised of an alloy having two or more types of metal so that reflectance of the surface of the phase shift film is more than 3% to not more than 20% and so as to have a phase difference of 170 degrees to 190 degrees, and when a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k>α*n+β is defined as Group A and a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k

公开(公告)号：US11081133B2

公开(公告)日：2021-08-03

申请号：US16349795

申请日：2017-11-14

Applicant: HOYA CORPORATION

Inventor： Koichi Sato ,  Kazuaki Hashimoto

IPC: G11B5/73 ,  C03C3/087 ,  C03C3/091

Abstract: A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO2 content ranges from 45 to 68%, Al2O3 from 5 to 20%, total content of SiO2 and Al2O3 60 to 80%, B2O3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10−7/° C.

公开(公告)号：USD926314S1

公开(公告)日：2021-07-27

申请号：US29703839

申请日：2019-08-29

Applicant: HOYA CORPORATION

Designer： Eiji Hayamizu

公开(公告)号：US20210208498A1

公开(公告)日：2021-07-08

申请号：US17056713

申请日：2019-05-24

Applicant: HOYA CORPORATION

Inventor： Yohei IKEBE ,  Tsutomu SHOKI

IPC: G03F1/32

Abstract: Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that the phase-shift film has a thin film comprising a metal-containing material that contains: ruthenium (Ru); and at least one element from among chromium (Cr), nickel (Ni), (Co), aluminum (Al), silicon (Si), titanium (Ti), vanadium (V), germanium (Ge), niobium (Nb), molybdenum (Mo), tin (Sn), tellurium (Te), hafnium (Hf), tungsten (W), and rhenium (Re).

公开(公告)号：US20210208497A1

公开(公告)日：2021-07-08

申请号：US17058631

申请日：2019-05-08

Applicant: HOYA CORPORATION

Inventor： Hitoshi MAEDA ,  Hiroaki SHISHIDO ,  Masahiro HASHIMOTO

IPC: G03F1/26 ,  H01L21/033

Abstract: Provided is a mask blank, including a phase shift film. The phase shift film has a structure where a first layer and a second layer are stacked in this order from a side of the transparent substrate. The first layer is provided in contact with a surface of the transparent substrate. Refractive indexes n1 and n2 of the first layer and the second layer, respectively, at a wavelength of an exposure light of an ArF excimer laser satisfy the relation n1

公开(公告)号：US20210161363A1

公开(公告)日：2021-06-03

申请号：US17267686

申请日：2020-03-11

Applicant: HOYA CORPORATION

Inventor： Takao MAKINO

IPC: A61B1/00 ,  G06N3/08

Abstract: An endoscope processor or the like is provided which has a high ability to detect lesions. The endoscope processor includes an image acquisition unit that acquires a captured image taken by an endoscope, a first image processing unit that generates a first processed image based on the captured image acquired by the image acquisition unit, a second image processing unit that generates a second processed image based on the captured image, and an output unit that outputs an acquired disease status using a learning model, which outputs a disease status, when the first processed image generated by the first image processing unit and the second processed image generated by the second image processing unit are input.