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    SELECTIVE CONDUCTIVE COATING FOR MEMS SENSORS
    91.
    发明申请
    SELECTIVE CONDUCTIVE COATING FOR MEMS SENSORS 审中-公开

    公开(公告)号：US20170369304A1

    公开(公告)日：2017-12-28

    申请号：US15635846

    申请日：2017-06-28

    Applicant: Analog Devices, Inc.

    Inventor： Bradley C. Kaanta

    IPC: B81B3/00 ,  B81C1/00 ,  G01P15/125

    CPC classification number: B81B3/0086 ,  B81B2201/0221 ,  B81C1/00698 ,  G01P15/125

    Abstract: A capacitive microelectromechanical systems (MEMS) sensor is provided, having conductive coatings on opposing surfaces of capacitive structures. The capacitive structures may be formed of silicon, and the conductive coating is formed of tungsten in some embodiments. The structure is formed in some embodiments by first releasing the silicon structures and then selectively coating them in the conductive material. In some embodiments, the coating may result in encapsulating the capacitive structures.

    VARIABLE CAPACITANCE DEVICE
    93.
    发明申请
    VARIABLE CAPACITANCE DEVICE 有权
    可变电容器件

    公开(公告)号：US20160351556A1

    公开(公告)日：2016-12-01

    申请号：US15239196

    申请日：2016-08-17

    Applicant: Murata Manufacturing Co., Ltd.

    Inventor： TOSHIYUKI NAKAISO ,  Nobuo Sakai

    IPC: H01L27/02 ,  B81B7/00 ,  H01L29/93

    CPC classification number: H01L27/0248 ,  B81B7/0022 ,  B81B2201/0221 ,  H01G4/33 ,  H01G7/06 ,  H01L27/0805 ,  H01L28/55 ,  H01L29/93

    Abstract: A variable capacitance device that includes a semiconductor substrate, a redistribution layer disposed on a surface of the semiconductor substrate, and a plurality of terminal electrodes including first and second input/output terminals, a ground terminal and a control voltage application terminal. Moreover, a variable capacitance element section is formed in the redistribution layer from a pair of capacitor electrodes connected to the first and second input/output terminals, respectively, and a ferroelectric thin film disposed between the capacitor electrodes. Further, an ESD protection element is connected between the one of the input/output terminals and the ground terminal is formed on the surface of the semiconductor substrate.

    Abstract translation: 一种可变电容装置，包括半导体衬底，设置在半导体衬底的表面上的再分配层，以及包括第一和第二输入/输出端子的多个端子电极，接地端子和控制电压施加端子。 此外，在再分配层中分别从连接到第一和第二输入/输出端子的一对电容器电极和设置在电容器电极之间的铁电薄膜形成可变电容元件部分。 此外，ESD保护元件连接在一个输入/输出端子之间，并且接地端子形成在半导体衬底的表面上。

    Reducing MEMS stiction by introduction of a carbon barrier
    95.
    发明授权
    Reducing MEMS stiction by introduction of a carbon barrier 有权
    通过引入碳屏障来减少MEMS静电

    公开(公告)号：US09463973B2

    公开(公告)日：2016-10-11

    申请号：US14529824

    申请日：2014-10-31

    Applicant: Ruben B. Montez ,  Robert F. Steimle

    Inventor： Ruben B. Montez ,  Robert F. Steimle

    IPC: B81B3/00 ,  B81C1/00 ,  G01P15/08

    CPC classification number: B81B3/0005 ,  B81B2201/0221 ,  B81B2201/0235 ,  B81B2203/0181 ,  B81B2203/06 ,  B81C1/0038 ,  B81C1/00952 ,  B81C2201/0169 ,  B81C2201/112 ,  G01P15/0802 ,  G01P2015/0871 ,  G01P2015/0874

    Abstract: A mechanism for reducing stiction in a MEMS device by decreasing an amount of carbon from TEOS-based silicon oxide films that can accumulate on polysilicon surfaces during fabrication is provided. A carbon barrier material film is deposited between one or more polysilicon layer in a MEMS device and the TEOS-based silicon oxide layer. This barrier material blocks diffusion of carbon into the polysilicon, thereby reducing accumulation of carbon on the polysilicon surfaces. By reducing the accumulation of carbon, the opportunity for stiction due to the presence of the carbon is similarly reduced.

    Abstract translation: 提供了一种用于通过减少在制造期间可能积聚在多晶硅表面上的基于TEOS的氧化硅膜的碳来减少MEMS器件中的静电的机制。 在MEMS器件中的一个或多个多晶硅层和基于TEOS的氧化硅层之间沉积碳阻挡材料膜。 该阻挡材料阻止碳扩散到多晶硅中，从而减少碳在多晶硅表面上的积累。 通过减少碳的积累，由于碳的存在而导致的静电机会同样地减少。

    MEMS sensor with dynamically variable reference capacitance
    96.
    发明授权
    MEMS sensor with dynamically variable reference capacitance 有权
    具有动态可变参考电容的MEMS传感器

    公开(公告)号：US09410981B2

    公开(公告)日：2016-08-09

    申请号：US13910755

    申请日：2013-06-05

    Applicant: Analog Devices, Inc.

    Inventor： Xin Zhang ,  Michael W. Judy

    IPC: G01P15/125 ,  B81B3/00 ,  G01P15/08

    CPC classification number: G01P15/125 ,  B81B3/0086 ,  B81B3/0094 ,  B81B2201/0221 ,  B81B2201/0235 ,  B81B2203/0118 ,  B81B2203/0307 ,  B81B2203/04 ,  G01P2015/0837

    Abstract: An MEMS device has a dynamically variable reference capacitor that provides a reference to a sense capacitance. In some embodiments, a 3-axis accelerometer includes a proof mass suspended above a substrate from an anchor, and a cantilevered Z-axis reference capacitor arm suspended above the substrate from the same anchor. In some embodiments, the proof mass is suspended from a plurality of anchors, and each anchor also supports one or more cantilevered arms, the cantilevered arms forming a dynamically variable reference capacitance.

    Abstract translation: MEMS器件具有动态可变参考电容器，其提供对感测电容的参考。 在一些实施例中，3轴加速度计包括悬挂在来自锚固件的基板上方的检验质量块，以及从相同锚点悬挂在基板上方的悬臂Z轴参考电容臂。 在一些实施例中，证明物质从多个锚固体悬挂，并且每个锚固件还支撑一个或多个悬臂，悬臂构成动态可变参考电容。

    REDUCING MEMS STICTION BY DEPOSITION OF NANOCLUSTERS
    97.
    发明申请
    REDUCING MEMS STICTION BY DEPOSITION OF NANOCLUSTERS 有权
    通过沉积纳米微粒的方法减少MEMS

    公开(公告)号：US20160167944A1

    公开(公告)日：2016-06-16

    申请号：US15051264

    申请日：2016-02-23

    Applicant: Freescale Semiconductor, Inc.

    Inventor： Robert F. Steimle ,  Ruben B. Montez

    IPC: B81B3/00 ,  B81C1/00

    CPC classification number: B81B3/001 ,  B81B3/0005 ,  B81B2201/0221 ,  B81B2201/0235 ,  B81B2203/0181 ,  B81B2203/06 ,  B81C1/0096 ,  B81C2201/115 ,  G01P15/0802 ,  G01P2015/0871 ,  G01P2015/0874

    Abstract: A mechanism for reducing stiction in a MEMS device by decreasing surface area between two surfaces that can come into close contact is provided. Reduction in contact surface area is achieved by increasing surface roughness of one or both of the surfaces. The increased roughness is provided by forming a micro-masking layer on a sacrificial layer used in formation of the MEMS device, and then etching the surface of the sacrificial layer. The micro-masking layer can be formed using nanoclusters. When a next portion of the MEMS device is formed on the sacrificial layer, this portion will take on the roughness characteristics imparted on the sacrificial layer by the etch process. The rougher surface decreases the surface area available for contact in the MEMS device and, in turn, decreases the area through which stiction can be imparted.

    Abstract translation: 提供了一种用于通过减小可以紧密接触的两个表面之间的表面积来减小MEMS器件中的静摩擦的机构。 通过增加一个或两个表面的表面粗糙度来实现接触表面积的减小。 通过在用于形成MEMS器件的牺牲层上形成微掩模层，然后蚀刻牺牲层的表面来提供增加的粗糙度。 微掩模层可以使用纳米团簇形成。 当MEMS器件的下一部分形成在牺牲层上时，该部分将通过蚀刻工艺承受赋予牺牲层的粗糙度特性。 较粗糙的表面减小了可用于MEMS器件中的接触的表面积，并且进而降低了可赋予粘性的面积。

    COMBINED MAGNETOMETER ACCELEROMETER MEMS DEVICES AND METHODS
    98.
    发明申请
    COMBINED MAGNETOMETER ACCELEROMETER MEMS DEVICES AND METHODS 审中-公开
    组合磁力计加速度计MEMS器件及方法

    公开(公告)号：US20160139173A1

    公开(公告)日：2016-05-19

    申请号：US14943498

    申请日：2015-11-17

    Applicant: Mourad El-Gamal ,  Mohannad Elsayed ,  Paul-Vahe Cicek ,  Frederic Nabki

    Inventor： Mourad El-Gamal ,  Mohannad Elsayed ,  Paul-Vahe Cicek ,  Frederic Nabki

    IPC: G01P15/125 ,  B81C1/00 ,  G01R33/028 ,  B81B7/00

    CPC classification number: G01P15/125 ,  B81B3/0021 ,  B81B7/008 ,  B81B2201/0221 ,  B81B2201/0235 ,  B81B2201/0292 ,  B81B2203/0109 ,  B81B2203/0307 ,  B81C1/00015 ,  B81C2203/0735 ,  B81C2203/0771 ,  G01P15/18 ,  G01P2015/084 ,  G01R33/0286

    Abstract: Considerations for selecting capacitive sensors include accuracy, repeatability, long-term stability, ease of calibration, resistance to chemical and physical contaminants, size, packaging, integration options with other sensors and/or electronics, and cost effectiveness. It is beneficial if such sensors are amenable to above-IC integration with associated control/readout circuitry for reduced parasitics and reduced footprint through area sharing. The inventors have established a combined Lorentz force based magnetometer and accelerometer MEMS sensor exploiting a low temperature, above-IC-compatible fabrication process operating without requiring vacuum packaging. By switching an electrical current between two perpendicular directions on the device structure a 2D in-plane magnetic field measurement can be achieved whilst concurrently, the device serves as a 1D accelerometer for out-of-plane acceleration, by switching the current off and by monitoring the structure's capacitive change in response to acceleration. The design can thus separate magnetic and inertial force measurements, utilizing a single compact device.

    Abstract translation: 选择电容式传感器的注意事项包括精度，重复性，长期稳定性，校准容易性，对化学和物理污染物的抵抗力，尺寸，包装，与其他传感器和/或电子设备的集成选项以及成本效益。 如果这样的传感器适合于与相关的控制/读出电路的IC集成以减少寄生效应并且通过区域共享来减少占地面积是有益的。 本发明人已经建立了一种组合的洛仑兹力量磁力计和加速度计MEMS传感器，利用低温，高于IC的兼容制造工艺，而不需要真空包装。 通过在器件结构上切换两个垂直方向之间的电流，可以在同时进行2D平面内磁场测量，同时通过切断电流和监测器件，作为用于超平面加速度的1D加速度计 结构的电容变化响应加速度。 因此，该设计可以利用单个紧凑装置分离磁力和惯性力测量。

    Varactor and varactor system
    99.
    发明授权
    Varactor and varactor system 有权
    变容二极管和变容二极管系统

    公开(公告)号：US09299499B2

    公开(公告)日：2016-03-29

    申请号：US14249989

    申请日：2014-04-10

    Applicant: Rohde & Schwarz GmbH & Co. KG

    Inventor： Gerhard Kahmen

    IPC: H01G5/16 ,  B81B7/00 ,  B81B3/00

    CPC classification number: H01G5/16 ,  B81B3/0078 ,  B81B7/00 ,  B81B2201/0221

    Abstract: The invention relates to a varactor with an actuator, wherein the first actuator surface (2a) of the actuator is embodied on a substrate (1), and a second actuator surface (2b) is embodied on a first movable membrane (3a). In this context, the first movable membrane (3a) is arranged above an upper side (1a) of the substrate (1). A second movable membrane (2b) is arranged below a lower side (1b) of the substrate (1) facing away from the upper side (1a). The invention further relates to a varactor system made from two such varactors.

    Abstract translation: 本发明涉及具有致动器的变容二极管，其中致动器的第一致动器表面（2a）被实施在基板（1）上，并且第二致动器表面（2b）被实施在第一可移动膜（3a）上。 在本文中，第一可移动膜（3a）布置在基板（1）的上侧（1a）的上方。 第二可移动膜（2b）布置在基板（1）的背离上侧（1a）的下侧（1b）的下方。 本发明还涉及由两个这种变容二极管制成的变容二极管系统。

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