Multi-axis, large tilt angle, wafer level micromirror array for large scale beam steering applications
    91.
    发明授权
    Multi-axis, large tilt angle, wafer level micromirror array for large scale beam steering applications 有权
    多轴,大倾角,晶圆级微镜阵列,用于大规模光束转向应用

    公开(公告)号:US08537446B2

    公开(公告)日:2013-09-17

    申请号:US12936956

    申请日:2009-04-08

    Abstract: A system (120) for reflecting or redirecting incident light, microwave or sound energy includes a first substrate (144) configured to support an array of reflective elements (130) that can be angularly displaced through a range of substantially (90) degrees in response to a reflector angle control signal and a controller programmed to generate the reflector angle control signal to achieve desired incident energy, beam or wavefront redirection. The reflective elements (130) preferably comprise MEMS micro-reflector elements hingedly or movably attached to the first substrate (130) and define a reflective surface that is aimed at the source of incident light, microwave or sound energy.

    Abstract translation: 用于反射或重定向入射光,微波或声能的系统(120)包括被配置为支撑反射元件阵列(130)的第一衬底(144),所述反射元件阵列可以在基本上(90)度的范围内成角度地移位 反射器角度控制信号和被编程为产生反射器角度控制信号以实现期望的入射能量,波束或波前重定向的控制器。 反射元件(130)优选地包括铰链地或可移动地附接到第一基板(130)并且限定针对入射光源,微波或声能源的反射表面的MEMS微反射器元件。

    Microstructural body and production method therefor
    93.
    发明授权
    Microstructural body and production method therefor 失效
    微结构体及其制备方法

    公开(公告)号:US08432661B2

    公开(公告)日:2013-04-30

    申请号:US13047644

    申请日:2011-03-14

    Abstract: A microstructural body includes a substrate such as an electrode substrate, a support portion, one post that fixes the support portion to the substrate, a frame-shaped movable portion provided around outer periphery of the support portion, and an elastic support portion that elastically connects the movable portion and the support portion. The elastic support portion supports the frame-shaped movable portion such that the movable portion is movable relative to the support portion. The elastic support portion includes torsion springs and an elastically deformable connecting portion.

    Abstract translation: 微结构体包括诸如电极基板的基板,支撑部分,将支撑部分固定到基板的一个支柱,设置在支撑部分的外周周围的框架形可动部分和弹性连接的弹性支撑部分 可动部和支撑部。 弹性支撑部支撑框状可动部,使得可动部相对于支撑部移动。 弹性支撑部分包括扭转弹簧和可弹性变形的连接部分。

    MECHANICAL LAYER AND METHODS OF MAKING THE SAME
    94.
    发明申请
    MECHANICAL LAYER AND METHODS OF MAKING THE SAME 审中-公开
    机械层及其制造方法

    公开(公告)号:US20130057558A1

    公开(公告)日:2013-03-07

    申请号:US13227263

    申请日:2011-09-07

    Abstract: This disclosure provides systems, methods and apparatus for controlling a mechanical layer. In one aspect, an electromechanical systems device includes a substrate and a mechanical layer positioned over the substrate to define a gap. The mechanical layer is movable in the gap between an actuated position and a relaxed position, and includes a mirror layer, a cap layer, and a dielectric layer disposed between the mirror layer and the cap layer. The mechanical layer is configured to have a curvature in a direction away from the substrate when the mechanical layer is in the relaxed position. In some implementations, the mechanical layer can be formed to have a positive stress gradient directed toward the substrate that can direct the curvature of the mechanical layer upward when the sacrificial layer is removed.

    Abstract translation: 本公开提供了用于控制机械层的系统,方法和装置。 在一个方面,机电系统装置包括基板和位于基板上方以限定间隙的机械层。 机械层可以在致动位置和松弛位置之间的间隙中移动,并且包括镜层,盖层和设置在镜层和盖层之间的电介质层。 当机械层处于松弛位置时,机械层被配置为具有远离基板的方向的曲率。 在一些实施方案中,机械层可以形成为具有朝向衬底的正应力梯度,当去除牺牲层时,可以向上引导机械层的曲率。

    Dielectric etching
    95.
    发明授权
    Dielectric etching 失效
    电介质蚀刻

    公开(公告)号:US08318606B2

    公开(公告)日:2012-11-27

    申请号:US12546855

    申请日:2009-08-25

    Abstract: An etchant for dielectrics, such as silicon dioxide, that leaves monocrystalline silicon surface exposed by the etchant free of etch damage, such as etch pits, when the etch is done in the presence of transition metals, such as copper, tungsten, titanium, gold, etc. The etchant comprises hydrofluoric acid and a source of halide anion, such as hydrochloric acid or a metal-halide. The etchant is useful in microelectromechanical system device fabrication and in deprocessing integrated circuits or the like.

    Abstract translation: 当在诸如铜,钨,钛,金等的过渡金属存在下进行蚀刻时,使诸如二氧化硅的电介质的蚀刻剂使得由蚀刻剂暴露的单晶硅表面没有蚀刻损伤,例如蚀刻凹坑 等等。蚀刻剂包括氢氟酸和卤素阴离子源,例如盐酸或金属卤化物。 蚀刻剂在微机电系统器件制造和集成电路等的去处理中是有用的。

    MICROELECTROMECHANICAL SYSTEM WITH A CENTER OF MASS BALANCED BY A MIRROR SUBSTRATE
    96.
    发明申请
    MICROELECTROMECHANICAL SYSTEM WITH A CENTER OF MASS BALANCED BY A MIRROR SUBSTRATE 有权
    具有由MIRROR基板平衡的质心中心的微电子机电系统

    公开(公告)号:US20120287492A1

    公开(公告)日:2012-11-15

    申请号:US13106709

    申请日:2011-05-12

    CPC classification number: G02B26/0841 B81B3/0078 B81B2201/042 B81B2203/0109

    Abstract: MEMS and fabrication techniques for positioning the center of mass of released structures in MEMS are provided. In an embodiment, a minor substrate is affixed to a member partially released from a first substrate and a through hole formed in the second substrate is accessed to complete release of the member.

    Abstract translation: 提供了用于在MEMS中定位释放结构的质心的MEMS和制造技术。 在一个实施例中,次要基板固定到从第一基板部分地释放的构件,并且访问形成在第二基板中的通孔以完全释放构件。

    Method for forming a mirror mems device
    97.
    发明申请
    Method for forming a mirror mems device 有权
    形成反射镜装置的方法

    公开(公告)号:US20120285925A1

    公开(公告)日:2012-11-15

    申请号:US13323466

    申请日:2011-12-12

    Inventor: Brett A. Mangrum

    Abstract: An apparatus for use with a digital micromirror device includes a hinge layer that is disposed outwardly from a substrate. The hinge layer including a hinge that is capable of at least partially supporting a micromirror that is disposed outwardly from the hinge. In one particular embodiment, the hinge and the substrate are separated by a first air gap. The device also including a first hinge support that is disposed outwardly from the substrate and inwardly from at least a portion of the hinge layer. The first hinge support being capable of transmitting a voltage to the hinge. At least a portion of the hinge support coupled to at least the portion of the hinge layer. In one particular embodiment, the first hinge support is formed in a process step that is different than a process step that forms the hinge layer.

    Abstract translation: 一种与数字微反射镜装置一起使用的装置包括从衬底向外设置的铰链层。 铰链层包括能够至少部分地支撑从铰链向外设置的微反射镜的铰链。 在一个具体实施例中,铰链和基板被第一气隙分开。 该装置还包括第一铰链支撑件,其从基板向外设置并且从铰链层的至少一部分向内设置。 第一铰链支撑件能够向铰链传递电压。 铰链支撑件的至少一部分联接到铰链层的至少一部分。 在一个具体实施例中,第一铰链支撑件在与形成铰链层的工艺步骤不同的工艺步骤中形成。

    Process for eliminating delamination between amorphous silicon layers
    98.
    发明授权
    Process for eliminating delamination between amorphous silicon layers 有权
    消除非晶硅层之间的分层的方法

    公开(公告)号:US08309441B2

    公开(公告)日:2012-11-13

    申请号:US13176548

    申请日:2011-07-05

    Abstract: One embodiment is a method of forming a circuit structure. The method comprises forming a first amorphous layer over a substrate; forming a first glue layer over and adjoining the first amorphous layer; forming a second amorphous layer over and adjoining the first glue layer; and forming a plurality of posts separated from each other by removing a first portion of the first amorphous layer and a first portion of the second amorphous layer. At least some of the plurality of posts each comprises a second portion of the first amorphous layer, a first portion of the first glue layer, and a second portion of the second amorphous layer.

    Abstract translation: 一个实施例是形成电路结构的方法。 该方法包括在衬底上形成第一非晶层; 在所述第一非晶层上方形成第一胶合层; 在所述第一胶层上形成第二非晶层; 以及通过去除所述第一非晶层的第一部分和所述第二非晶层的第一部分来形成彼此分离的多个柱。 所述多个柱中的至少一些各自包括所述第一非晶层的第二部分,所述第一胶合层的第一部分和所述第二非晶层的第二部分。

    VIBRATING ELEMENT, OPTICAL SCANNING DEVICE, ACTUATOR DEVICE, VIDEO PROJECTION APPARATUS, AND IMAGE FORMING APPARATUS
    99.
    发明申请
    VIBRATING ELEMENT, OPTICAL SCANNING DEVICE, ACTUATOR DEVICE, VIDEO PROJECTION APPARATUS, AND IMAGE FORMING APPARATUS 有权
    振动元件,光学扫描装置,执行器装置,视频投影装置和图像形成装置

    公开(公告)号:US20120249804A1

    公开(公告)日:2012-10-04

    申请号:US13493313

    申请日:2012-06-11

    CPC classification number: B81C1/00658 B81B2201/042 G02B26/085

    Abstract: A work hardening treatment which decreases the Young's modulus, and an age hardening treatment which recovers or increases the Young's modulus decreased by the work hardening treatment are performed to form a vibrating portion, thereby attaining a vibrating element (30) advantageous in downsizing while ensuring desired fatigue characteristics and vibration characteristics. This downsizes, for example, an actuator device (1), an optical scanning device, a video projection apparatus, and an image forming apparatus.

    Abstract translation: 进行降低杨氏模量的加工硬化处理和通过加工硬化处理而回复或增加杨氏模量的时效硬化处理,以形成振动部,从而获得有利于小型化的振动元件(30),同时确保期望 疲劳特性和振动特性。 例如,致动器装置(1),光学扫描装置,视频投影装置和图像形成装置的尺寸缩小。

    METHOD AND APPARATUS FOR SENSING, MEASUREMENT OR CHARACTERIZATION OF DISPLAY ELEMENTS INTEGRATED WITH THE DISPLAY DRIVE SCHEME, AND SYSTEM AND APPLICATIONS USING THE SAME
    100.
    发明申请
    METHOD AND APPARATUS FOR SENSING, MEASUREMENT OR CHARACTERIZATION OF DISPLAY ELEMENTS INTEGRATED WITH THE DISPLAY DRIVE SCHEME, AND SYSTEM AND APPLICATIONS USING THE SAME 审中-公开
    用于与显示器驱动方案集成的显示元件的感测,测量或表征的方法和装置,以及使用其的系统和应用

    公开(公告)号:US20120212468A1

    公开(公告)日:2012-08-23

    申请号:US13459642

    申请日:2012-04-30

    Applicant: Alok Govil

    Inventor: Alok Govil

    Abstract: Methods and systems for electrical sensing, measurement and characterization of display elements are described. An embodiment includes integrating the electrical sensing, measurement and characterization with the display drive scheme. This embodiment allows for measurement of DC or operational hysteresis voltages and/or response times of interferometric modulator MEMS devices, for example, to be fully integrated with the display driver IC and/or the display drive scheme. Another embodiment allows these measurements to be performed and used without resulting in display artifacts visible to a human user. Another embodiment allows the measurement circuitry to be integrated with the display driver IC and/or the display drive scheme re-using several existing circuitry components and features, thus allowing for integration of the measurement method and its use relatively easily.

    Abstract translation: 描述了用于显示元件的电感测,测量和表征的方法和系统。 一个实施例包括将电感测,测量和表征与显示驱动方案集成。 该实施例允许测量干涉式调制器MEMS器件的DC或操作滞后电压和/或响应时间,例如与显示器驱动器IC和/或显示器驱动方案完全集成。 另一个实施例允许执行和使用这些测量,而不会导致人类用户可见的显示伪影。 另一个实施例允许测量电路与显示驱动器IC和/或显示驱动方案集成,重新使用几个现有的电路部件和特征,从而允许相对容易地集成测量方法及其使用。

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