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    Vacuum processing apparatus and zonal airflow generating unit
    91.
    发明授权
    Vacuum processing apparatus and zonal airflow generating unit 有权
    真空处理设备和区域气流发生单元

    公开(公告)号：US08794896B2

    公开(公告)日：2014-08-05

    申请号：US11513255

    申请日：2006-08-31

    Applicant: Kengo Ashizawa

    Inventor： Kengo Ashizawa

    IPC: H01L21/00

    CPC classification number: H01L21/67201 ,  H01L21/67739 ,  Y10T29/41

    Abstract: A vacuum processing apparatus includes a vacuum processing chamber; a load lock chamber connected to the vacuum processing chamber via a gate valve or via a gate valve and a depressurized space and also connected to an atmospheric space via a door valve, an interior atmosphere of the load lock chamber being changed between a substantially atmospheric state and a depressurized state; an air blowing portion, provided at a vicinity of the door valve in the atmospheric space, for blowing a zonal airflow vertically downward from a position substantially even with or higher than a top end of a passageway of the door valve; and an air suctioning portion for suctioning the airflow or the inert gas from the air blowing portion by a vacuum force at a position substantially even with or lower than a bottom end of the passageway of the door valve.

    Abstract translation: 真空处理装置包括真空处理室; 负载锁定室，其通过闸阀或通过闸阀和减压空间连接到真空处理室，并且还经由门阀连接到大气空间，负载锁定室的内部气氛在基本上大气的状态 和减压状态; 设置在大气空间中的门阀附近的吹风部，用于从基本上均匀地或高于门阀的通道的顶端的位置向下垂直地吹送纬向气流; 以及空气抽吸部分，用于通过真空力在大致均匀地或大于门阀的通道的底端的位置处从空气吹送部分吸入气流或惰性气体。

    Laminating assembly
    93.
    发明授权
    Laminating assembly 有权
    复合组装

    公开(公告)号：US08790951B2

    公开(公告)日：2014-07-29

    申请号：US13262902

    申请日：2010-04-07

    Applicant: Yakov Safir

    Inventor： Yakov Safir

    IPC: H01L21/00

    CPC classification number: H01L21/6838 ,  B32B37/1018 ,  B32B2309/02 ,  B32B2309/04 ,  B32B2309/10 ,  B32B2457/12 ,  B32B2457/14 ,  B65G49/065 ,  B65G2249/02 ,  H01L21/67201 ,  H01L21/67236 ,  H01L31/048 ,  H01L31/1876 ,  Y02E10/50 ,  Y02P70/521 ,  Y10T29/5317 ,  Y10T29/53187 ,  Y10T29/53261

    Abstract: A carrier assembly is provided for solar cell laminates that include an encapsulating layer and that are conveyed through a lamination plant having a conveying surface. The assembly includes a housing of heat conductive material defining an inner volume, the housing having an upper plate for receiving the laminates and a lower plate defining a plurality of apertures, the inner volume including at least one connecting element interconnecting the first and second plates. An air supply system provides a continuous outward air flow through the apertures when the lower plate is received on the conveying surface, wherein the airflow yields an elevated pressure on the lower plate for providing lift to the housing, allowing substantially friction-free movement of the housing relative to the conveying surface. A thermal transfer system provides thermal energy to the upper plate for melting and curing the encapsulating layer.

    Abstract translation: 为太阳能电池层叠体提供载体组件，其包括封装层，并且通过具有输送表面的层压设备输送。 组件包括限定内部体积的导热材料的壳体，该壳体具有用于容纳层叠体的上板和限定多个孔的下板，所述内部容积包括互连第一和第二板的至少一个连接元件。 当下板接收在输送表面上时，空气供应系统提供通过孔的连续向外的空气流，其中气流在下板上产生升高的压力，用于向壳体提供升力，从而允许基本上无摩擦的运动 壳体相对于输送表面。 热传递系统向上板提供热能以熔化和固化封装层。

    SUBSTRATE PROCESSING APPARATUS
    94.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号：US20140126980A1

    公开(公告)日：2014-05-08

    申请号：US14071205

    申请日：2013-11-04

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Yu WAMURA ,  Akira SHIMIZU

    IPC: B65G49/00

    CPC classification number: H01L21/67167 ,  H01L21/67184 ,  H01L21/67201 ,  H01L21/67712

    Abstract: Provided is a substrate processing apparatus which includes: first and second vacuum transfer chambers which are partitioned from each other; processing chambers configured to perform a vacuum processing onto substrates; a load lock chamber installed to be sandwiched between the first and second vacuum transfer chambers, and including partition valves installed between the load lock chamber and a normal pressure atmosphere, and between the load lock chamber and each of the first and second vacuum transfer chambers; and substrate mounting tables inside the load lock chamber and configured to move between an upper position at which the substrates are transferred between the load lock chamber and the normal pressure atmosphere, and a lower position at which the substrates are transferred between the load lock chamber and the first or second vacuum transfer chamber.

    Abstract translation: 提供了一种基板处理装置，其包括：彼此分隔的第一和第二真空传送室; 处理室，被配置为对基板执行真空处理; 安装在第一和第二真空传送室之间的负载锁定室，并且包括安装在负载锁定室和常压气氛之间以及负载锁定室与第一和第二真空传送室中的每一个之间的分隔阀; 以及衬底安装台，其设置在所述负载锁定室内并且构造成在所述衬底在所述负载锁定室和所述常压气氛之间传递的上部位置和所述衬底在所述负载锁定室和所述正常压力气氛之间传送的下部位置之间移动; 第一或第二真空传送室。

    COMPACT SUBSTRATE TRANSPORT SYSTEM
    96.
    发明申请
    COMPACT SUBSTRATE TRANSPORT SYSTEM 有权
    紧凑的基板运输系统

    公开(公告)号：US20140044504A1

    公开(公告)日：2014-02-13

    申请号：US14058436

    申请日：2013-10-21

    Applicant: Brooks Automation, Inc.

    Inventor： Christopher Hofmeister ,  Alexander Krupyshev ,  Ulysses Gilchrist

    IPC: H01L21/677

    CPC classification number: H01L21/677 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/67775

    Abstract: A substrate processing system including a load port module configured to hold at least one substrate container for storing and transporting substrates, a substrate processing chamber, an isolatable transfer chamber capable of holding an isolated atmosphere therein configured to couple the substrate processing chamber and the load port module, and a substrate transport mounted at least partially within the transfer chamber having a drive section fixed to the transfer chamber and having a SCARA arm configured to support at least one substrate, the SCARA arm being configured to transport the at least one substrate between the at least one substrate container and the processing chamber with but one touch of the at least one substrate, wherein the SCARA arm comprises a first arm link, a second arm link, and at least one end effector serially pivotally coupled to each other, where the first and second arm links have unequal lengths.

    Abstract translation: 一种基板处理系统，包括负载端口模块，该负载端口模块被配置为保持用于存储和传送基板的至少一个基板容器，基板处理室，能够保持隔离气体的可隔离转移室，配置成将基板处理室和负载端口 模块和至少部分地安装在所述传送室内的衬底传送器，其具有固定到所述传送室的驱动部分并且具有被配置为支撑至少一个衬底的SCARA臂，所述SCARA臂被配置为将所述至少一个衬底 至少一个衬底容器和所述处理室，所述处理室具有所述至少一个衬底的一个触点，其中所述SCARA臂包括第一臂连杆，第二臂连杆和至少一个末端执行器，所述至少一个末端执行器彼此串联地枢转地联接，其中 第一和第二臂连杆具有不相等的长度。

    SUBSTRATE TREATING APPARATUS WITH INTER-UNIT BUFFERS
    97.
    发明申请
    SUBSTRATE TREATING APPARATUS WITH INTER-UNIT BUFFERS 有权
    基板处理装置与单元缓冲器

    公开(公告)号：US20140000514A1

    公开(公告)日：2014-01-02

    申请号：US14011993

    申请日：2013-08-28

    Applicant: Sokudo Co., Ltd.

    Inventor： Hiroyuki Ogura ,  Kenya Morinishi ,  Tsuyoshi Mitsuhashi ,  Yasuo Kawamatsu ,  Yoshiteru Fukutomi ,  Hiromichi Nagashima

    IPC: B05C13/00

    CPC classification number: B05C13/00 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225

    Abstract: The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.

    Abstract translation: 本发明提供涂覆单元，热处理单元和用于将基底输送到这些处理单元中的每一个的第一主输送机构。 基板通过接收器从第一主输送机构传送到第二主输送机构。 当基板不能放置在接收器上时，将该基板放置在缓冲器上。 因此，第一主输送机构可以继续输送其它基板。 处理单元中的其它基材在处理单元之间没有延迟地输送，以接收包括涂覆处理和热处理的一系列处理。 这防止了在基板上形成膜的处理质量的降低。

    LOCKING GATE DEVICE
    99.
    发明申请
    LOCKING GATE DEVICE 有权
    锁门装置

    公开(公告)号：US20130243560A1

    公开(公告)日：2013-09-19

    申请号：US13799861

    申请日：2013-03-13

    Applicant: MICROWAVE MATERIALS TECHNOLOGIES, INC.

    Inventor： Harold Dail Kimrey, Jr. ,  Gregory Eugene Cunningham

    IPC: H01L21/67

    CPC classification number: H05B6/78 ,  A23L3/01 ,  A23L3/02 ,  A23V2002/00 ,  A61B90/70 ,  A61L2/04 ,  A61L2/12 ,  A61L2202/21 ,  A61L2202/24 ,  A61L2202/26 ,  B65B55/06 ,  H01L21/67201 ,  H05B6/68 ,  H05B6/70 ,  H05B6/782 ,  H05B6/80

    Abstract: A locking gate device suitable for selectively blocking the flow of fluid and/or articles through a pair of openings defined by two spaced-apart members is provided. The spaced-apart members may be opposing walls or flanges of two adjacent processing chambers or vessels in a pressurized heating system. The locking gate device includes a gate assembly that is movable within a gate-receiving space defined between opposed sealing surfaces of the spaced-apart members. The gate assembly comprises a pair of sealing plates and a drive member shiftable relative to the sealing plates. As the drive member is shifted between a retracted position and an extended position, a pair of bearings disposed between the sealing plates and the drive member forces the sealing plates outwardly to contact the sealing surfaces of the spaced-apart members. This substantially blocks the flow-through openings defined by one or both sealing surfaces and restricts flow therethrough.

    Abstract translation: 提供一种适于通过由两个间隔开的构件限定的一对开口选择性地阻塞流体和/或制品流动的锁定门装置。 间隔开的构件可以是加压加热系统中两个相邻处理室或容器的相对壁或凸缘。 锁定门装置包括门组件，该门组件可在限定在间隔开的构件的相对的密封表面之间的门容纳空间内移动。 门组件包括一对密封板和可相对于密封板移动的驱动构件。 当驱动构件在缩回位置和延伸位置之间移动时，设置在密封板和驱动构件之间的一对轴承迫使密封板向外以与间隔开的构件的密封表面接触。 这基本上阻挡由一个或两个密封表面限定的流通开口并限制流过其中的流动。

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