公开(公告)号：US10306743B1

公开(公告)日：2019-05-28

申请号：US16221699

申请日：2018-12-17

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/23 ,  H01S3/00 ,  H01S3/09 ,  H01S3/16 ,  H01S3/11 ,  H01S3/223 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20190159327A1

公开(公告)日：2019-05-23

申请号：US16239746

申请日：2019-01-04

Applicant: Gigaphoton Inc.

Inventor： Tatsuya YANAGIDA

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/00 ,  H05G2/008

Abstract: An extreme ultraviolet light generation method according to one aspect of the present disclosure includes outputting a droplet to a first laser light irradiation region that is a region different from a plasma generation region, irradiating the droplet that reaches the first laser light irradiation region with first laser light to generate a deformed liquid target, irradiating the deformed liquid target that reaches a second laser light irradiation region that is a region different from the plasma generation region with second laser light to generate a fragment jet target, and irradiating at least a part of the fragment jet target that reaches the plasma generation region with third laser light that propagates in a direction intersecting a propagation direction of the second laser light.

公开(公告)号：US20190150264A1

公开(公告)日：2019-05-16

申请号：US16244624

申请日：2019-01-10

Applicant: Gigaphoton Inc.

Inventor： Kazukiyo Kamikanna

IPC: H05G2/00

Abstract: A droplet collection device may include a collecting container arranged on an outer wall surface side of a wall of a chamber and configured to communicate with the inside of the chamber through an opening provided at the wall of the chamber, a collision plate arranged in the collecting container and configured such that a droplet supplied from the opening to the collecting container is to collide with the collision plate, a shielding plate arranged on an opening side with respect to the collision plate and provided with a through-hole through which the droplet supplied to the collecting container passes and a wire rod bundle arranged in the through-hole of the shielding plate in a state that multiple wire rods are bundled.

公开(公告)号：US20190116655A1

公开(公告)日：2019-04-18

申请号：US16214435

申请日：2018-12-10

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Shinji OKAZAKI

IPC: H05G2/00 ,  G21K1/14 ,  G21K1/06

Abstract: An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.

公开(公告)号：US20190113765A1

公开(公告)日：2019-04-18

申请号：US16209631

申请日：2018-12-04

Applicant: GIGAPHOTON INC.

Inventor： Kenshiro NAGAHAMA ,  Yukio WATANABE

IPC: G02B27/14 ,  H05G2/00 ,  G02B7/182 ,  G03F7/20

Abstract: An optical element angle adjustment device includes a first hinge that is an elastic hinge configured to connect a first plate and a second plate with each other, an optical element holding part attached to at least one of the first plate and the second plate, and a first adjusting screw configured to apply force in a direction of closing the first hinge to adjust a tilt angle of at least one of the first plate and the second plate. An end in an axis direction of the first adjusting screw is provided with a first press member configured to slidably abut on one of the first plate and the second plate. At least one of a first press member side abutting portion and a first hinge side abutting portion on which the first press member abuts has a curved surface in a curved surface shape.

公开(公告)号：US20190074655A1

公开(公告)日：2019-03-07

申请号：US16178382

申请日：2018-11-01

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20190033133A1

公开(公告)日：2019-01-31

申请号：US16150298

申请日：2018-10-03

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA

IPC: G01J3/26 ,  G03F7/20 ,  H01S3/139

Abstract: A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.

公开(公告)号：US20190021159A1

公开(公告)日：2019-01-17

申请号：US16121340

申请日：2018-09-04

Applicant: GIGAPHOTON INC.

Inventor： Hisashi NARA ,  Hiroshi SOMEYA ,  Takuya ISHII

IPC: H05G2/00 ,  G21K1/06 ,  G02B5/20

Abstract: An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.

公开(公告)号：US10164396B2

公开(公告)日：2018-12-25

申请号：US15720122

申请日：2017-09-29

Applicant: GIGAPHOTON INC.

Inventor： Akihiko Kurosu ,  Takashi Matsunaga ,  Hiroyuki Masuda ,  Osamu Wakabayashi ,  Hiroaki Tsushima ,  Masanori Yashiro ,  Takeshi Ohta

IPC: H01S3/036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/04 ,  H01S3/03 ,  H01S3/08 ,  H01S3/134 ,  H01S3/13 ,  H01S3/225 ,  H01S3/041

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US20180352641A1

公开(公告)日：2018-12-06

申请号：US16055274

申请日：2018-08-06

Applicant: GIGAPHOTON INC.

Inventor： Yuichi NISHIMURA ,  Takayuki YABU

IPC: H05G2/00 ,  G03F7/20 ,  G01J1/42

CPC classification number: H05G2/008 ,  G01J1/4209 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/006

Abstract: An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.