公开(公告)号：US06884361B2

公开(公告)日：2005-04-26

申请号：US09964876

申请日：2001-09-26

Applicant: Michael Goldstein

Inventor： Michael Goldstein

IPC: C03C17/27 ,  C03C17/36 ,  G03F7/20 ,  G21K1/06 ,  C23F1/00

CPC classification number: C03C17/3636 ,  C03C17/27 ,  C03C17/36 ,  C03C17/3663 ,  C03C2217/213 ,  C03C2218/31 ,  C03C2218/322 ,  C03C2218/33 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/067

Abstract: A method for making a substrate for a mirror used in photolithography is described. That method comprises forming a crystalline layer on a first layer, which has a low coefficient of thermal expansion. Part of the crystalline layer is then removed to form on the first layer a second layer that has a high quality surface finish.

Abstract translation: 描述了制造用于光刻中的反射镜用基板的方法。 该方法包括在具有低热膨胀系数的第一层上形成晶体层。 然后去除部分晶体层以在第一层上形成具有高质量表面光洁度的第二层。

公开(公告)号：US20050026046A1

公开(公告)日：2005-02-03

申请号：US10631171

申请日：2003-07-31

Applicant: Pei-Yang Yan

Inventor： Pei-Yang Yan

IPC: G03F1/14 ,  B32B17/06 ,  B32B9/00 ,  B32B15/00 ,  G03F9/00 ,  G21K5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K2201/067

Abstract: An extreme ultraviolet lithography mask may be formed of a multilayered stack covered by a spacer layer, such as silicon or boron carbide, in turn covered by a thin layer to prevent inter-diffusion, and finally covered by a capping layer of ruthenium. By optimizing the spacer layer thickness based on the capping layer, the optical properties may be improved.

Abstract translation: 极紫外光刻掩模可以由覆盖有间隔层（例如硅或碳化硼）的多层叠层形成，然后由薄层覆盖以防止相互扩散，并最终被钌覆盖层覆盖。 通过基于覆盖层优化间隔层厚度，可以提高光学性质。

公开(公告)号：US20040253426A1

公开(公告)日：2004-12-16

申请号：US10491764

申请日：2004-04-02

Inventor： Andrey Yakshin ,  Eric Louis

IPC: B05D005/06 ,  G03F009/00 ,  B32B007/02

CPC classification number: B82Y10/00 ,  G02B5/08 ,  G02B5/0816 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10T428/24942 ,  Y10T428/2495

Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.

Abstract translation: 为了减少在基板上包含多层体系的光学元件的污染，提出了选择多层体系的至少一层的层材料和/或层厚度，使得形成的驻波 在照射的工作波长的反射期间，在多层系统的自由界面的区域中形成电场强度（节点条件）的节点。 此外，还描述了一种用于确定多层系统的设计的方法，以及制造工艺和光刻设备。

公开(公告)号：US06821682B1

公开(公告)日：2004-11-23

申请号：US09669390

申请日：2000-09-26

Applicant: Daniel G. Stearns ,  Donald W. Sweeney ,  Paul B. Mirkarimi

Inventor： Daniel G. Stearns ,  Donald W. Sweeney ,  Paul B. Mirkarimi

IPC: G03F900

CPC classification number: G02B5/285 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0891 ,  G02B27/32 ,  G03F1/24 ,  G03F1/72 ,  G21K1/062 ,  G21K2201/067

Abstract: A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

Abstract translation: 提供了一种用于修复分层到用于极紫外光刻（EUVL）系统的掩模版坯料上的多层涂层中的缺陷的方法。 使用高横向空间分辨率，能量沉积在缺陷附近的多层涂层中。 这可以使用聚焦电子束，聚焦离子束或聚焦电磁辐射来实现。 吸收的能量将导致膜的结构改性，产生膜厚度的局部变化。 通过调节能量剂量可以以亚纳米精度控制膜厚的变化。 厚度变化的横向空间分辨率由能量沉积的定位来控制。 局部调整膜厚以校正反射场的扰动。 例如，当结构改性是局部薄膜收缩时，缺陷的修复包括使平坦化的墩或扩展凹陷的侧面。

公开(公告)号：US20040107731A1

公开(公告)日：2004-06-10

申请号：US10636717

申请日：2003-08-07

Inventor： Thorsten Doehring ,  Ralf Jedamzik ,  Hauke Esemann ,  Eva Hoelzel

IPC: C03B023/035 ,  C03C010/12

CPC classification number: C03B23/0357 ,  C03B19/02 ,  C03B23/025 ,  C03B23/0252 ,  C03B32/02 ,  C03B40/00 ,  C03C10/0027 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/067

Abstract: A process for forming glass or glass ceramics is disclosed, wherein a glass ceramics form (12) is made from a starting glass by molding, which is transformed by a heat treatment into a keatite glass ceramic comprising predominantly keatite mixed crystals. With such a keatite glass ceramics form (12) formed bodies can be prepared from blank parts by sagging under gravity force at a temperature above the glass transition temperature of the blank part (14).

Abstract translation: 公开了一种用于形成玻璃或玻璃陶瓷的方法，其中玻璃陶瓷形式（12）由起始玻璃通过模塑制成，其通过热处理转变成主要包含酮钛矿混晶的酮铁玻璃陶瓷。 通过这样的酮铁玻璃陶瓷形式（12），可以通过在高于坯料部分（14）的玻璃化转变温度的温度下在重力作用下垂而由坯件制备成形体。

公开(公告)号：US06678348B1

公开(公告)日：2004-01-13

申请号：US09868189

申请日：2001-06-15

Applicant: Muradin Abubekirovich Kumakhov

Inventor： Muradin Abubekirovich Kumakhov

IPC: G21K106

CPC classification number: C03B23/047 ,  A61N5/10 ,  A61N2005/1091 ,  A61N2005/1095 ,  B82Y10/00 ,  C03B23/0473 ,  G03F7/70166 ,  G03F7/70216 ,  G21K1/06 ,  G21K2201/067 ,  Y02P40/57

Abstract: The invention makes possible to increase the degree of radiation focusing by the lens, to use particles of higher energies, and to increase the coefficients, depending on these factors, of the devices, the lens is used in. Thus the sublens 18 of the least degree of integration represents a package of the channels 5, which is growing out of joint drawing and forming the capillaries, which are laid in a bundle. The sublens of each higher degree of integration represents a package of sublenses of the previous degree of integration, which is growing out of their joint drawing and forming. The sublenses are growing out of performing the said operations at the pressure of the gaseous medium inside the channels being higher than the pressure in the space between the sublenses of the previous degree of integration and at the temperature of their material softening and splicing the walls. To produce the lenses a bundle of stocks (capillaries) in a tubular envelope is fed to the furnace (at the first stage) or stocks, produced on the previous degree, and the bundle is drawing from the furnace at the speed, exceeding the speed of feeding. The product is cut off on stocks for the next stage, and at the final stage the product is formed by varying the drawing speed, after what the parts with formed barrel-shaped thickenings are cut of.

Abstract translation: 本发明可以增加透镜聚焦的程度，使用更高能量的颗粒，并且根据这些因素增加系数，使用透镜。因此，最少的透镜18 一体化程度代表一个通道5的包装，该通道5从联合拉伸生长出来并形成毛细管，它们被放置成一束。 每个更高的整合度的底片代表了先前的一体化程度的一个包子，它们从它们的联合绘图和成形中发展出来。 在通道内的气体介质的压力下，超过在先前的整合度的子透镜之间的空间中的压力和它们的材料的软化和接合壁的温度之间，所述子透镜不能执行所述操作。 为了制造镜片，将管状外壳中的一束原料（毛细管）送入炉中（在第一阶段）或以先前程度产生的料仓，并且束以超过速度的速度从炉中抽出 的喂养。 产品在下一个阶段的库存中被切断，最后阶段，通过改变成形的桶形加厚件的部件之后，通过改变拉丝速度来形成产品。

公开(公告)号：US20030228413A1

公开(公告)日：2003-12-11

申请号：US10456836

申请日：2003-06-09

Applicant: KONICA CORPORATION

Inventor： Tatsuo Ohta ,  Satoshi Nakano ,  Hiroshi Hirayama

IPC: B05D005/06 ,  H05H001/24

CPC classification number: G02B1/10 ,  C23C16/452 ,  C23C16/45576 ,  C23C16/45595 ,  G02B1/11 ,  G21K2201/067 ,  H01J37/32082 ,  H05H1/24 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2431 ,  H05H2001/2443

Abstract: A surface treating method of forming a coating layer on a base material, comprising conducting a plasma processing under an atmospheric pressure for the base material so as to form a coating layer on the base material having at least one of a curved surface and an uneven surface.

Abstract translation: 一种在基材上形成涂层的表面处理方法，包括在大气压下对基材进行等离子体处理，以在基材上形成具有弯曲表面和不平坦表面中的至少一个的涂层 。

公开(公告)号：US06606371B2

公开(公告)日：2003-08-12

申请号：US09745236

申请日：2000-12-19

Applicant: Michael Antonell ,  Erik Cho Houge ,  John Martin McIntosh ,  Larry E. Plew ,  Catherine Vartuli

Inventor： Michael Antonell ,  Erik Cho Houge ,  John Martin McIntosh ,  Larry E. Plew ,  Catherine Vartuli

IPC: G21K106

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A reflective lens with at least one curved surface formed of polycrystalline material. In one embodiment, a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source. A system is also provided for performing an operation with x-rays. In one embodiment, a system includes a source for generating the x-rays, a polycrystalline surface region having crystal spacing suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, and transmitting the reflected x-rays to a reference position. An associated method includes providing x-rays to polycrystalline surface region having crystal spacings suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, transmitting the reflected x-rays to a reference position and positioning a sample between the surface region and the reference position so that the x-rays are transmitted through the sample.

Abstract translation: 具有由多晶材料形成的至少一个曲面的反射透镜。 在一个实施例中，透镜结构包括具有预定曲率的表面的基底和沿着基底的表面形成的膜，多个单独的构件各自具有相对于邻近构件的基底表面的部分的至少一个相似的取向，使得 共同地，这些构件为从公共源产生的x射线的衍射提供可预测的角度。 还提供了一种用于使用X射线进行操作的系统。 在一个实施例中，系统包括用于产生x射线的源，具有适合于沿着该区域以相同的布拉格角反射多个x射线的晶体间距的多晶表面区域，以及将反射的x射线透射到 参考位置。 相关联的方法包括向具有晶体间距的多晶表面区域提供x射线，该晶体间距适于沿着该区域以相同的布拉格角反射多个x射线，将反射的x射线透射到参考位置，并将样品定位在表面 区域和参考位置，使得x射线透射通过样品。

公开(公告)号：US20030081722A1

公开(公告)日：2003-05-01

申请号：US10229638

申请日：2002-08-27

Applicant: Nikon Corporation

Inventor： Noriaki Kandaka ,  Katsuhiko Murakami ,  Hideki Komatsuda ,  Wakana Ishiyama ,  Masayuki Shiraishi ,  Katsumi Sugisaki ,  Masaki Yamamoto

IPC: G01N023/20

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/46 ,  G03F7/70258 ,  G03F7/70316 ,  G03F7/706 ,  G21K1/062 ,  G21K2201/067 ,  H01J37/304 ,  Y10T428/24802

Abstract: Methods are disclosed for correcting the wave aberrations of light reflected from multilayer-film mirrors as used in, e.g., optical systems as used for EUV lithography (EUVL) apparatus. Wave aberrations are corrected by addition and/or removal of one or more layers (typically layer-sets) to and from, respectively, the surface of the multilayer film of the mirror. In certain embodiments, layer-removal is monitored in situ by any of several techniques. In other embodiments, mirror substrates are processed to a prescribed shape precision and surface roughness, followed by formation of the multilayer film and assembly of the mirrors into the intended optical assembly. The wave aberration is measured at operating wavelength. If the measured wave aberration is not within specifications, then the mirrors are corrected individually by selective removal and/or addition of layer-set(s). The corrected mirrors are reassembled and re-tested as an optical assembly. This cycle is repeated as required. In other embodiments, the mirrors are corrected by removing layer-sets in layer-set increments, followed by re-formation, at less than normal layer thickness, of the layer of the material having the most impact on defining the reflection wave-front, until the desired layer thickness is achieved. In yet other embodiments, layer(s) are removed such that the resulting corrected reflection wave-front is smooth.

Abstract translation: 公开了用于校正由例如用于EUV光刻（EUVL）设备的光学系统中使用的多层膜反射镜反射的光的像差的方法。 通过相对于反射镜的多层膜的表面分别加入和/或去除一个或多个层（通常为层组）来校正波像差。 在某些实施方案中，通过几种技术中的任何一种原位监测层去除。 在其他实施例中，镜面基板被加工成规定的形状精度和表面粗糙度，随后形成多层膜并将反射镜组装到预期的光学组件中。 在工作波长下测量波像差。 如果测量的波像差不在规格范围内，则通过选择性去除和/或添加层组来单独校正反射镜。 校正的镜子被重新组装并重新测试为光学组件。 根据需要重复此循环。 在其他实施例中，通过以层设定的增量去除层组来校正反射镜，然后以小于正常层厚度重新形成对定义反射波前影响最大的材料层， 直到达到所需的层厚度。 在其他实施例中，移除层，使得所得到的校正反射波前平滑。

公开(公告)号：US20020080916A1

公开(公告)日：2002-06-27

申请号：US09366028

申请日：1999-08-02

Inventor： LICAI JIANG ,  BORIS VERMAN

IPC: G21K001/00

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

Abstract translation: 具有多层结构的电磁反射器，其中电磁反射器被配置为反射多个电磁频率。