Melt system including a melt unit with a side-loading hopper

    公开(公告)号:US11938505B2

    公开(公告)日:2024-03-26

    申请号:US17809389

    申请日:2022-06-28

    CPC classification number: B05C11/1042 D06N3/0011

    Abstract: A melt system that includes a melt unit. The melt unit includes a reservoir and a melter. The melter is configured to expose solid adhesive to a temperature sufficient to form a molten adhesive, which is deposited into the reservoir. The melt unit includes a hopper disposed above the melter and for holding a supply of the solid adhesive. The hopper has an access door disposed on a wall of the hopper that is movable between a closed position where the hopper is closed and an open position where an internal chamber of the hopper is accessible to receive the solid adhesive. The hopper and the solid adhesive in the hopper are thermally isolated from the reservoir.

    PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND PROCESSING LIQUID SUPPLY METHOD

    公开(公告)号:US20230286013A1

    公开(公告)日:2023-09-14

    申请号:US18119401

    申请日:2023-03-09

    CPC classification number: B05C11/1007 B05C11/1036 B05C11/1042 B05C11/1047

    Abstract: According to one embodiment, a processing liquid supply device includes a plurality of tanks, a supply path that supplies a processing liquid to a processing device, a heating unit that heats the processing liquid, a dilution unit that dilutes the processing liquid, a new-liquid supply unit that supplies a new liquid, a common flow path through which the processing liquid of the plurality of tanks passes, a switching unit that switches between the plurality of tanks so that at least a tank is selected from which the processing liquid passes to the common flow path, a densitometer provided in the common flow path, and a control device that controls at least one of the heating unit, the dilution unit, and the new-liquid supply unit so that the concentration reaches a target value set in advance.

    LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

    公开(公告)号:US20230234091A1

    公开(公告)日:2023-07-27

    申请号:US18129150

    申请日:2023-03-31

    Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

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