公开(公告)号：US20040234898A1

公开(公告)日：2004-11-25

申请号：US10869557

申请日：2004-06-16

Inventor： Charles R. Batishko ,  Glen C. Dunham ,  Lawrence E. Bowman

IPC: G03F007/00

CPC classification number: B81C99/0095 ,  B81C2201/0109 ,  B81C2201/0159

Abstract: One embodiment of the present invention includes a flowcell with an inlet and an outlet in fluid communication with a cavity that is effective to receive a fluid flow from the inlet and to discharge at least a portion of that fluid flow through the outlet. The flowcell further includes a structure extending across the cavity to divide the fluid flow, which includes a magnetic material to capture magnetically attractable material in the fluid flow. The system further includes a sensor arranged to detect an optical property of the magnetically attractable material while captured in the cavity.

Abstract translation: 本发明的一个实施例包括具有入口和与空腔流体连通的出口的流动池，其有效地接收来自入口的流体流并排出流过该出口的流体流的至少一部分。 流通池还包括延伸穿过空腔的结构，以分流流体流，流体流包括磁性材料以在流体流中捕获可磁吸引的材料。 该系统还包括传感器，该传感器布置成在捕获在空腔中时检测可磁吸引材料的光学特性。

公开(公告)号：US06653244B2

公开(公告)日：2003-11-25

申请号：US09955123

申请日：2001-09-19

Applicant: Alex Behfar ,  Alfred T. Schremer ,  Cristian B. Stagarescu

Inventor： Alex Behfar ,  Alfred T. Schremer ,  Cristian B. Stagarescu

IPC: H01L21469

CPC classification number: G02B6/12002 ,  B81B2201/047 ,  B81C99/008 ,  B81C2201/0159 ,  G02B6/13 ,  G02B6/4204 ,  G02B6/4249 ,  G03F7/0037 ,  Y10S438/948 ,  Y10S438/949 ,  Y10S438/95

Abstract: Three-dimensional structures of arbitrary shape are fabricated on the surface of a substrate through a series of processing steps wherein a monolithic structure is fabricated in successive layers. A first layer of photoresist material is spun onto a substrate surface and is exposed in a desired pattern corresponding to the shape of a final structure, at a corresponding cross-sectional level in the structure. The layer is not developed after exposure; instead, a second layer of photoresist material is deposited and is also exposed in a desired pattern. Subsequent layers are spun onto the top surface of prior layers and exposed, and upon completion of the succession of layers each defining corresponding levels of the desired structure, the layers are all developed at the same time leaving the three-dimensional structure.

公开(公告)号：US20030148222A1

公开(公告)日：2003-08-07

申请号：US10072360

申请日：2002-02-06

Inventor： Lawrence E. Bowman ,  Glen C. Dunham

IPC: G03F007/26

CPC classification number: B81C99/0095 ,  B33Y10/00 ,  B33Y70/00 ,  B81C2201/0109 ,  B81C2201/0159

Abstract: A method of forming complex three-dimensional microstructures wherein an external stimulus is applied to a first layer of a photosensitive material, thereby creating voids in the first layer, and any material present in those voids is removed. A sacrificial material is then provided within at least a portion of the voids. This sacrificial layer fills the voids, either in whole or in part, and enables a second layer of photosensitive material to be stacked upon the first, while still preserving the pattern formed in the first layer. Once the sacrificial layer has been applied, a second layer of photosensitive material may then be stacked onto the first. Successive layers of photosensitive material and sacrificial material may be added until a final, complex three-dimensional structure is created. The sacrificial material may then be removed with a solvent such as carbon dioxide.

Abstract translation: 形成复合三维微结构的方法，其中将外部刺激施加到感光材料的第一层，从而在第一层中产生空隙，并且去除存在于那些空隙中的任何材料。 然后在空隙的至少一部分内提供牺牲材料。 该牺牲层全部或部分地填充空隙，并且使第二层感光材料首先堆叠在一起，同时仍然保留形成在第一层中的图案。 一旦施加了牺牲层，则可以将第二层感光材料层叠在第一层上。 可以加入感光材料和牺牲材料的连续层，直到产生最终的复杂三维结构。 然后可以用诸如二氧化碳的溶剂除去牺牲材料。