公开(公告)号：US20100290590A1

公开(公告)日：2010-11-18

申请号：US12842937

申请日：2010-07-23

Applicant: Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

Inventor： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC: G01N23/04

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：USRE41747E1

公开(公告)日：2010-09-21

申请号：US11877631

申请日：2007-10-23

Applicant: Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

Inventor： Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

IPC: B32B15/04 ,  B32B15/20 ,  B32B33/00 ,  G03B21/28 ,  F21V7/00

CPC classification number: C23C14/081 ,  C23C14/0021 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/083 ,  C23C14/10 ,  C23C14/14 ,  C23C14/32 ,  C30B23/02 ,  C30B29/02 ,  G02B5/0858 ,  G21K1/06 ,  G21K2201/06 ,  Y10T428/12174 ,  Y10T428/12736 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/31678

Abstract: The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.

Abstract translation: 本发明的金属膜是具有非常低的表面粗糙度和非常好的晶体取向的单晶的致密膜，因为表面的算术平均粗糙度不大于2nm，并且（111）的X-射线衍射峰强度， X射线衍射不小于所有其他峰的总和的20倍。 另外，本发明的金属氧化物膜是由于非氧化金属的含量不高于构成金属氧化物的金属成分的1摩尔％而含有氧缺陷少，几乎无空隙的致密膜， 填充密度为0.98以上。

公开(公告)号：US20100061508A1

公开(公告)日：2010-03-11

申请号：US12585283

申请日：2009-09-10

Applicant: Kenji Takahashi

Inventor： Kenji Takahashi

IPC: G01T1/36

CPC classification number: A61B6/4014 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4233 ,  A61B6/466 ,  A61B6/484 ,  G03B42/026 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2207/005

Abstract: A radiation phase image radiographing apparatus, including a radiation emission unit having multiple radiation sources for emitting radiation onto a subject, the radiation sources being distributed such that radiation emitted from each of the radiation sources and transmitted through the subject forms a part of a projected image of the subject, a first diffraction grating configured to be exposed to the radiation emitted from the multiple radiation sources of the radiation emission unit and to produce a Talbot effect by the exposure, a second diffraction grating for diffracting the radiation diffracted by the first diffraction grating, and a radiation image detector for detecting the radiation diffracted by the second diffraction grating.

Abstract translation: 一种辐射相位图像摄影装置，包括具有用于向对象发射辐射的多个辐射源的辐射发射单元，辐射源被分布成使得从每个辐射源发射并透射通过对象的辐射形成投影图像的一部分 被配置为暴露于从辐射发射单元的多个辐射源发射的辐射并且通过曝光产生Talbot效应的第一衍射光栅，用于衍射由第一衍射光栅衍射的辐射的第二衍射光栅 以及用于检测由第二衍射光栅衍射的辐射的放射线图像检测器。

公开(公告)号：US20090154640A1

公开(公告)日：2009-06-18

申请号：US12159486

申请日：2006-12-06

Applicant: Joachim Baumann ,  Christian David ,  Martin Engelhardt ,  Jorg Freudenberger ,  Eckhard Hempel ,  Martin Hoheisel ,  Thomas Mertelmeier ,  Franz Pfeiffer ,  Stefan Popescu ,  Manfred Schuster

Inventor： Joachim Baumann ,  Christian David ,  Martin Engelhardt ,  Jorg Freudenberger ,  Eckhard Hempel ,  Martin Hoheisel ,  Thomas Mertelmeier ,  Franz Pfeiffer ,  Stefan Popescu ,  Manfred Schuster

IPC: H05G1/60

CPC classification number: A61B6/00 ,  A61B6/032 ,  A61B6/4028 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G21K2201/06 ,  G21K2207/005 ,  H01J2235/086

Abstract: In a focus detector arrangement and method for an x-ray apparatus for generating projection or tomographic phase-contrast images of an examination subject, a beam of coherent x-rays is generated by an anode that has areas of different radiation emission characteristics arranged in bands thereon, that proceed parallel to grid lines of a phase grid that is used to generate the phase-contrast images.

Abstract translation: 在用于产生检查对象的投影或断层相位图像的x射线装置的焦点检测器装置和方法中，由具有布置在带中的不同辐射特性的区域的阳极产生相干X射线束 其平行于用于生成相位对比图像的相位网格的网格线。

公开(公告)号：US20090135486A1

公开(公告)日：2009-05-28

申请号：US11856403

申请日：2007-09-17

Applicant: Ian McNulty

Inventor： Ian McNulty

IPC: G02B27/44 ,  G21K1/06

CPC classification number: G21K1/06 ,  G02B5/189 ,  G02B21/14 ,  G21K2201/06 ,  G21K2201/067 ,  G21K2207/005

Abstract: A method and objective apparatus are provided for implementing an enhanced phase contrast microscope. A focusing vortex lens, defined by a diffractive spiral zone plate (SZP) lens, is used for the objective for the phase contrast microscope. The SZP lens focuses and imparts a helical phase to incident illumination to image the specimen with spiral phase contrast. The spiral phase contrast microscope is sensitive to phase gradients in all sample axes. Replacing the objective of a microscope with the diffractive SZP lens of the invention immediately provides existing instruments with spiral phase contrast capability.

Abstract translation: 提供了一种实现增强型相差显微镜的方法和目标装置。 用于相差显微镜的目标使用由衍射螺旋区域（SZP）透镜限定的聚焦涡透镜。 SZP透镜聚焦并向入射照明施加螺旋相以对具有螺旋相位对比度的样品进行成像。 螺旋相差显微镜对所有样品轴的相位梯度敏感。 用本发明的衍射SZP透镜替代显微镜的目的立即提供现有的具有螺旋相位对比能力的仪器。

公开(公告)号：US20080266650A1

公开(公告)日：2008-10-30

申请号：US12154375

申请日：2008-05-22

Applicant: Jose Sasian

Inventor： Jose Sasian

IPC: G02B17/06

CPC classification number: G03F7/702 ,  G02B17/0605 ,  G02B17/0615 ,  G02B27/0043 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinges upon. The collector also includes a second optical path from the source to another mirror. The other mirror is the first mirror that light emitted from the source and raveling along the second path impinges upon. The mirror and the other mirror are oriented relative to the source such that light from the source traveling along the first optical path travels in a direction opposite to light traveling from the source along the second optical path. A collector having a discharge extreme ultra violet (EUV) light source.

公开(公告)号：US07365351B2

公开(公告)日：2008-04-29

申请号：US11512821

申请日：2006-08-30

Applicant: Norbert Bowering ,  Bjorn A. M. Hansson

Inventor： Norbert Bowering ,  Bjorn A. M. Hansson

IPC: G01J3/10 ,  G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US07247870B2

公开(公告)日：2007-07-24

申请号：US11512822

申请日：2006-08-30

Applicant: Alexander I. Ershov ,  William N. Partlo

Inventor： Alexander I. Ershov ,  William N. Partlo

IPC: G01J3/10

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

公开(公告)号：US20070062557A1

公开(公告)日：2007-03-22

申请号：US11367693

申请日：2006-03-06

Applicant: Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

Inventor： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

IPC: B08B6/00 ,  C25F5/00 ,  C25F3/30 ,  C25F1/00

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

Abstract translation: 用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。 光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

公开(公告)号：US20060192151A1

公开(公告)日：2006-08-31

申请号：US11067099

申请日：2005-02-25

Applicant: Norbert Bowering ,  Bjorn Hansson ,  Alexander Bykanov ,  Oleh Khodykin ,  Alexander Ershov ,  William Partlo

Inventor： Norbert Bowering ,  Bjorn Hansson ,  Alexander Bykanov ,  Oleh Khodykin ,  Alexander Ershov ,  William Partlo

IPC: G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。