公开(公告)号：US20100208868A1

公开(公告)日：2010-08-19

申请号：US12733361

申请日：2008-08-28

Applicant: Hiroshi Okuda ,  Kazuo Nakajima ,  Kozo Fujiwara

Inventor： Hiroshi Okuda ,  Kazuo Nakajima ,  Kozo Fujiwara

IPC: G01N23/20 ,  G02B3/02

CPC classification number: G21K1/06 ,  C30B29/06 ,  C30B29/08 ,  C30B29/607 ,  C30B33/02 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: In one embodiment of the present invention, a curvature distribution crystal lens of the present invention is obtained via press-molding. In the case of a Ge single crystal plate, a temperature for the press-molding is in a range 1° C. to 120° C. lower than a melting point. In the case of a Si single crystal plate, a temperature for the press-molding is in a range 1° C. to 200° C. lower than a melting point. The curvature distribution crystal lens has a crystal lattice plane forming a 1D cylindrically curved surface or a 1D logarithmically curved surface whose valley is in a direction perpendicular to a direction having a maximum curvature, the direction having the maximum curvature being within 30° from a [001] or [1-10] direction in a (110) plane. As a result, it is possible to make an integrated reflection intensity uniform and to make a half-value width uniform in a wide range. Consequently, it is possible to achieve a curvature distribution crystal lens having a wide incident angle range and a high light focusing accuracy.

Abstract translation: 在本发明的一个实施例中，本发明的曲率分布晶体透镜是通过压制成型获得的。 在Ge单晶板的情况下，加压成型的温度比熔点低1℃〜120℃。 在Si单晶板的情况下，加压成型的温度在比熔点低1℃〜200℃的范围内。 曲率分布晶体透镜具有形成1D圆柱形曲面的晶格面或1D对数曲面，其谷在与具有最大曲率的方向垂直的方向上，具有最大曲率的方向与[ 001]或[1-10]方向。 结果，可以使整体反射强度均匀，并使宽度范围内的半值宽度均匀。 因此，可以实现具有宽入射角范围和高聚焦精度的曲率分布晶体透镜。

公开(公告)号：US07741616B2

公开(公告)日：2010-06-22

申请号：US11629535

申请日：2005-06-22

Applicant: Katsuhiko Murakami

Inventor： Katsuhiko Murakami

IPC: H01J27/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G21K2201/064 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A liquid in which fine solid Sn particles are dispersed in a resin is accommodated inside the heated tank 4. The resin pressurized by a pressurizing pump is conducted to a nozzle 1, so that a liquid-form resin is caused to jet from the tip end of the nozzle 1 that is disposed inside a vacuum chamber 7. The liquid-form resin which is caused to jet from the nozzle 1 assumes a spherical shape as a result of surface tension, and is solidified by being cooled in a vacuum, so that a solid-form target 2 is formed. A laser introduction window 10 used for the introduction of laser light is formed in the vacuum chamber 7, and laser light generated from a laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and conducted into the vacuum chamber 7, so that the target is converted into a plasma, thus generating EUV light.

Abstract translation: 将细固体Sn颗粒分散在树脂中的液体容纳在加热槽4内。由加压泵加压的树脂被传导到喷嘴1，使得液态树脂从顶端喷射 设置在真空室7内的喷嘴1.由喷嘴1喷出的液状树脂由于表面张力而呈球形，通过在真空中冷却使其固化，使得 形成固体靶2。 在真空室7中形成用于引入激光的激光引入窗口10，并且由设置在真空室7的外部的激光光源8产生的激光由透镜9聚焦并传导到真空中 室7，使得目标被转换成等离子体，从而产生EUV光。

公开(公告)号：US07738630B2

公开(公告)日：2010-06-15

申请号：US12397504

申请日：2009-03-04

Applicant: John H. Burdett, Jr. ,  Adam Bailey ,  Zewu Chen ,  R. Scott Semken ,  Kai Xin

Inventor： John H. Burdett, Jr. ,  Adam Bailey ,  Zewu Chen ,  R. Scott Semken ,  Kai Xin

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced, the source spot requiring alignment along a transmission axis passing through the sample spot. A first housing section is provided, to which the x-ray tube is attached, including mounting features for adjustably mounting the x-ray tube therein such that the source spot coincides with the transmission axis. A second housing section includes a second axis coinciding with the transmission axis; and at least one x-ray optic attached to the second housing section for receiving the diverging x-ray beam and directing the beam toward the sample spot. Complimentary mating surfaces may be provided to align the first and second sections, and the optics, to the transmission axis. A third housing section may also be provided, including an aperture through which the x-ray beam passes, and to which a detector may be attached.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供了具有产生发散X射线束的源极点的X射线管，源点需要沿着穿过样品斑点的透射轴对准。 提供了第一容纳部分，X射线管被附接到该第一壳体部分，包括用于可调节地将x射线管安装在其中的安装特征，使得源点与透射轴一致。 第二壳体部分包括与传动轴线重合的第二轴线; 以及附接到第二壳体部分的至少一个x射线光学器件，用于接收发散的X射线束并将光束引向样品斑点。 可以提供免费配合表面以将第一和第二部分以及光学元件对准到透射轴线。 还可以设置第三壳体部分，其包括x射线束通过的孔，并且可以附接检测器。

公开(公告)号：US07720197B2

公开(公告)日：2010-05-18

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US20090267003A1

公开(公告)日：2009-10-29

申请号：US12469176

申请日：2009-05-20

Applicant: Masato MORIYA ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE

IPC: G21K5/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

Abstract translation: 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射以不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US07583789B1

公开(公告)日：2009-09-01

申请号：US11496561

申请日：2006-07-31

Applicant: Carolyn A. MacDonald ,  Noor Mail ,  Zewu Chen

Inventor： Carolyn A. MacDonald ,  Noor Mail ,  Zewu Chen

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K7/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray imaging system includes an optical device having at least one point-focusing, curved monochromating optic for directing x-rays from an x-ray source towards a focal point. The at least one point-focusing, curved monochromating optic provides a focused monochromatic x-ray beam directed towards the focal point, and a detector is aligned with the focused monochromatic x-ray beam. The optical device facilitates x-ray imaging of an object when the object is located between the optical device and the detector within the focused monochromatic x-ray beam. In various embodiments: each point-focusing, curved monochromatic optic has an optical surface that is doubly-curved; the optical device facilitates passive image demagnification or magnification depending upon placement of the object and detector relative to the focal point; and at least one second point-focusing, curved monochromatic optic can be employed to facilitate refractive index or polarized beam imaging of the object.

Abstract translation: X射线成像系统包括具有至少一个点聚焦的光学装置，用于将x射线从x射线源朝向焦点引导的弯曲单色光学器件。 至少一个点聚焦，弯曲单色光学器件提供指向焦点的聚焦单色x射线束，并且检测器与聚焦的单色x射线束对准。 当物体位于聚焦的单色x射线束内的光学装置和检测器之间时，该光学装置便于对象的X射线成像。 在各种实施例中：每个点聚焦，弯曲单色光学器件具有双曲弯曲的光学表面; 光学装置根据对象和检测器相对于焦点的放置而促进被动图像缩小或放大; 并且可以使用至少一个第二点聚焦弯曲单色光学器件来促进物体的折射率或偏振光束成像。

公开(公告)号：US07508911B1

公开(公告)日：2009-03-24

申请号：US11857857

申请日：2007-09-19

Applicant: Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic

Inventor： Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B6/03694 ,  G02B6/262 ,  G02B6/4298 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: An X-ray imaging system is provided that includes a target for emitting X-rays and having at least one target focal spot, and an array of multilayer optic devices for transmitting X-rays through total internal reflection. The array of multilayer optics devices are in optical communication with the at least one target focal spot. Further, a method for imaging an object with an X-ray imaging machine is provided. Also, a method for forming a stack of multilayer optic devices is provided.

Abstract translation: 提供一种X射线成像系统，其包括用于发射X射线并具有至少一个目标焦斑的靶，以及用于通过全内反射来透射X射线的多层光学器件阵列。 多层光学器件阵列与至少一个目标焦斑光学通信。 此外，提供了一种利用X射线成像机对物体进行成像的方法。 另外，提供了一种用于形成多层光学器件堆叠的方法。

公开(公告)号：US20090074146A1

公开(公告)日：2009-03-19

申请号：US11857857

申请日：2007-09-19

Applicant: Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic

Inventor： Susanne Madeline Lee ,  Forrest Frank Hopkins ,  Peter Michael Edic

IPC: H01J35/02 ,  G02B6/036

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B6/03694 ,  G02B6/262 ,  G02B6/4298 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: An X-ray imaging system is provided that includes a target for emitting X-rays and having at least one target focal spot, and an array of multilayer optic devices for transmitting X-rays through total internal reflection. The array of multilayer optics devices are in optical communication with the at least one target focal spot. Further, a method for imaging an object with an X-ray imaging machine is provided. Also, a method for forming a stack of multilayer optic devices is provided.

Abstract translation: 提供一种X射线成像系统，其包括用于发射X射线并具有至少一个目标焦斑的靶，以及用于通过全内反射来透射X射线的多层光学器件阵列。 多层光学器件阵列与至少一个目标焦斑光学通信。 此外，提供了一种利用X射线成像机对物体进行成像的方法。 另外，提供了一种用于形成多层光学器件堆叠的方法。

公开(公告)号：US20090009858A1

公开(公告)日：2009-01-08

申请号：US12188603

申请日：2008-08-08

Applicant: Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

Inventor： Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.

Abstract translation: 多层反射镜包括布置在基板和多个层对上的层序列。 每个层对包括由第一材料构成的第一层和由第二材料构成的第二层。 第一层和第二层各自具有大于2nm的厚度，并且第一材料或第二材料是硅化硼或氮化钼。

公开(公告)号：US20080159472A1

公开(公告)日：2008-07-03

申请号：US11928676

申请日：2007-10-30

Applicant: Albrecht Frey ,  Norbert Pailer ,  Jess Koehler

Inventor： Albrecht Frey ,  Norbert Pailer ,  Jess Koehler

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: The present invention describes a device for improving the resolution capability of an x-ray optical apparatus for an x-ray (24) incident from a direction of incidence, which device comprises a mirror element (52, 54) with a mirror edge (52), the mirror edge (52) being formed around an edge axis (58) by a cylindrical shell section, the mirror element (52, 54) being arranged spaced apart in a radial direction (42) with respect to a focal axis (25) parallel to the direction of incidence by a focal point of the x-ray optical apparatus, and the mirror element (52, 54) being furthermore arranged rotated about an axis extending in the radial direction (42) with respect to the direction of incidence such that the edge axis (58) is tilted with respect to the direction of incidence.

Abstract translation: 本发明描述了一种用于提高从入射方向入射的x射线（24）的X射线光学装置的分辨能力的装置，该装置包括具有镜面（52）的镜子元件（52,54） ），镜边缘（52）通过圆柱形壳体部分围绕边缘轴线（58）形成，所述镜子元件（52,54）相对于焦点轴线（25）沿径向方向（42）间隔开设置 ），并且所述镜元件（52,54）进一步相对于所述径向方向（42）沿着所述径向方向（42）延伸的轴线旋转地布置，所述反射镜元件（52,54）平行于所述X射线光学设备的焦点的入射方向 使得边缘轴线（58）相对于入射方向倾斜。