公开(公告)号：US09570884B2

公开(公告)日：2017-02-14

申请号：US13817817

申请日：2012-01-25

Applicant: Krzysztof Nowak ,  Osamu Wakabayashi

Inventor： Krzysztof Nowak ,  Osamu Wakabayashi

IPC: H01S5/06 ,  B82Y20/00 ,  G03F7/20 ,  H01S3/23 ,  H01S5/062 ,  H01S3/13 ,  H01S3/223 ,  H01S5/065 ,  H01S5/14 ,  H01S5/34 ,  H01S5/40 ,  H05G2/00

CPC classification number: H01S5/06 ,  B82Y20/00 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/1305 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/0612 ,  H01S5/06216 ,  H01S5/0622 ,  H01S5/0653 ,  H01S5/0654 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4025 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.

Abstract translation: 激光装置可以包括：主振荡器，其被配置为以重复频率输出脉冲激光束，所述主振荡器包括至少一个半导体激光装置; 至少一个放大器被配置为放大来自所述主振荡器的所述脉冲激光束，所述至少一个放大器被配置为包括至少一个增益带宽; 以及控制器，用于控制影响来自主振荡器的脉冲激光束的输出波长的参数，使得来自主振荡器的脉冲激光束的波长啁啾范围与至少一个增益带宽的至少一部分重叠。

公开(公告)号：US09113540B2

公开(公告)日：2015-08-18

申请号：US13492067

申请日：2012-06-08

Applicant: Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: B82Y10/00 ,  H05G2/00 ,  H01S3/10 ,  H01S3/131 ,  H01S3/23

CPC classification number: H05G2/008 ,  H01S3/02 ,  H01S3/094026 ,  H01S3/10061 ,  H01S3/1106 ,  H01S3/131 ,  H01S3/1636 ,  H01S3/1643 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20150188274A1

公开(公告)日：2015-07-02

申请号：US14579698

申请日：2014-12-22

Applicant: Osamu Wakabayashi ,  Hiroaki Tsushima ,  Kouji Kakizaki

Inventor： Osamu Wakabayashi ,  Hiroaki Tsushima ,  Kouji Kakizaki

IPC: H01S3/00 ,  H01S3/10 ,  H01S3/034 ,  H01S3/134 ,  H01S3/225 ,  H01S3/036

CPC classification number: H01S3/0014 ,  H01S3/034 ,  H01S3/036 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

Abstract: A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.

Abstract translation: 控制激光装置的方法可以包括：在配置成通过激励增益介质输出激光束的腔室中交换增益介质; 在交换之后，首先测量在特定气体压力和特定充电电压下在腔室中振荡的激光束的脉冲能量; 计算表示激光束的脉冲能量与腔室中的气体压力与充电电压之间的关系的近似表达式，或表示脉冲能量，气体压力和充电电压之间的相关性的表格， 压力，第一次测量中的具体充电电压和脉冲能量; 存储近似表达式或表格; 在第一次测量之后，第二次测量激光束的脉冲能量Er在腔室中振荡; 基于近似表达式或表格，计算在气体压力下的交换和第二测量中的充电电压之间直接获得的脉冲能量Eec; 使用＆Dgr; Ed = Eec-Er计算基于脉冲能量Eec和脉冲能量Er的脉冲能量的减少量＆Dgr; Ed; 并且基于脉冲能量的减少量＆Dgr; Ed计算腔室中部分气体交换的部分气体交换量Q。

公开(公告)号：US08901522B2

公开(公告)日：2014-12-02

申请号：US13196311

申请日：2011-08-02

Applicant: Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

Inventor： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G21K5/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

Abstract translation: 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US20140307244A1

公开(公告)日：2014-10-16

申请号：US14316904

申请日：2014-06-27

Applicant: Osamu WAKABAYASHI ,  Takahito KUMAZAKI ,  Toru SUZUKI ,  Masashi SHINBORI ,  Masaya YOSHINO

Inventor： Osamu WAKABAYASHI ,  Takahito KUMAZAKI ,  Toru SUZUKI ,  Masashi SHINBORI ,  Masaya YOSHINO

IPC: G03F7/20

CPC classification number: G03F7/2006 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

Abstract: An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.

Abstract translation: 对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。 当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。 调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。 本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量 曝光工具可以稳定。

公开(公告)号：US08804778B2

公开(公告)日：2014-08-12

申请号：US12580523

申请日：2009-10-16

Applicant: Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

Inventor： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

IPC: H01S3/10

CPC classification number: H01S3/2316 ,  B82Y20/00 ,  G03F7/70033 ,  H01S3/0007 ,  H01S3/107 ,  H01S3/2232 ,  H01S3/235 ,  H01S5/02284 ,  H01S5/0654 ,  H01S5/06837 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4062 ,  H01S5/4087

Abstract: An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

Abstract translation: 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包​​含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

公开(公告)号：US08759804B2

公开(公告)日：2014-06-24

申请号：US13122354

申请日：2011-03-11

Applicant: Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

Inventor： Toshihiro Nishisaka ,  Yukio Watanabe ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC: A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC classification number: H05G2/008 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/003

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract translation: 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

公开(公告)号：US08742379B2

公开(公告)日：2014-06-03

申请号：US13636038

申请日：2011-07-05

Applicant: Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

Inventor： Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

IPC: H01S3/04

CPC classification number: H01S3/0401 ,  G02B7/008 ,  H01S3/005 ,  H01S3/2316 ,  H05G2/008 ,  Y10T137/6851

Abstract: A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.

Abstract translation: 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。

公开(公告)号：US08710474B2

公开(公告)日：2014-04-29

申请号：US13532365

申请日：2012-06-25

Applicant: Takeshi Kodama ,  Osamu Wakabayashi

Inventor： Takeshi Kodama ,  Osamu Wakabayashi

IPC: G21K5/00 ,  G01K5/00 ,  B41C3/02

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector.

Abstract translation: 与用于产生极紫外光的外部激光装置一起使用的装置包括用于存储目标材料的目标存储单元，具有与被输送目标材料的存储单元的内部连通的通孔的喷嘴单元， 电极，其具有面向喷嘴单元的通孔，以及目标检测器，用于检测由目标材料形成的目标并输出检测信号。 直流电压调节器施加并调节目标材料和电极之间的直流电流，压力调节器通过气体施加和调节对目标材料的压力，并且控制器控制至少一个直流电压调节器和压力 基于来自目标检测器的检测信号的调节器。

公开(公告)号：US08698113B2

公开(公告)日：2014-04-15

申请号：US13696517

申请日：2011-12-13

Applicant: Masato Moriya ,  Osamu Wakabayashi

Inventor： Masato Moriya ,  Osamu Wakabayashi

IPC: H05G2/00

CPC classification number: G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

Abstract: A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

Abstract translation: 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。