公开(公告)号：US20170280544A1

公开(公告)日：2017-09-28

申请号：US15613789

申请日：2017-06-05

Applicant: GIGAPHOTON INC.

Inventor： Yoshifumi UENO ,  Takashi SUGANUMA ,  Yoshiaki KUROSAWA

IPC: H05G2/00 ,  G01J1/04 ,  G01J1/02 ,  G02B26/08 ,  G01J1/42

CPC classification number: H05G2/008 ,  G01J1/0238 ,  G01J1/0403 ,  G01J1/0411 ,  G01J1/0448 ,  G01J1/4257 ,  G02B17/0892 ,  G02B17/0896 ,  G02B19/0095 ,  G02B26/0816 ,  H01S3/005

Abstract: A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.

公开(公告)号：US20170280543A1

公开(公告)日：2017-09-28

申请号：US15616167

申请日：2017-06-07

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Yutaka SHIRAISHI ,  Shinya IKESAKA ,  Takanobu ISHIHARA ,  Toshiro UMEKI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

公开(公告)号：US09722385B2

公开(公告)日：2017-08-01

申请号：US15198433

申请日：2016-06-30

Applicant: Gigaphoton Inc.

Inventor： Hiroyuki Ikeda ,  Kouji Kakizaki ,  Hiroaki Tsushima ,  Hisakazu Katsuumi

IPC: H01S3/038 ,  H01S3/097 ,  H01S3/225 ,  H01S3/036 ,  H01S3/03 ,  H01S3/134

CPC classification number: H01S3/038 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/09702 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2258

Abstract: A laser chamber for a discharge excited gas laser apparatus may include: a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; a fan configured to flow laser gas between the first discharge electrode and the second discharge electrode; a first insulating member disposed upstream and downstream of a laser gas flow from the first discharge electrode; a metallic damper member disposed upstream of the laser gas flow from the second discharge electrode; and a second insulating member disposed downstream of the laser gas flow from the second discharge electrode.

公开(公告)号：US20170205713A1

公开(公告)日：2017-07-20

申请号：US15480190

申请日：2017-04-05

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU

IPC: G03F7/20

CPC classification number: G03F7/7055 ,  G03F7/70025 ,  G03F7/70033 ,  H01L21/027 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.

公开(公告)号：US09601893B2

公开(公告)日：2017-03-21

申请号：US15060148

申请日：2016-03-03

Applicant: GIGAPHOTON INC.

Inventor： Kouji Kakizaki ,  Takeshi Asayama ,  Osamu Wakabayashi

IPC: H01S3/038 ,  H01S3/134 ,  H01S3/225 ,  H01S3/08

CPC classification number: H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/225

Abstract: There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.

公开(公告)号：US20170063020A1

公开(公告)日：2017-03-02

申请号：US15352543

申请日：2016-11-15

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H01S3/10 ,  H05G2/00

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

公开(公告)号：US20170055336A1

公开(公告)日：2017-02-23

申请号：US15347716

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在蚀刻气体通过的室的蚀刻气体引入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20170033527A1

公开(公告)日：2017-02-02

申请号：US15290518

申请日：2016-10-11

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO ,  Hiroshi UMEDA ,  Hisakazu KATSUUMI

IPC: H01S3/097 ,  H01S3/041 ,  H01G4/258 ,  H01G4/14 ,  H01G4/30

CPC classification number: H01S3/09702 ,  H01G4/14 ,  H01G4/18 ,  H01G4/258 ,  H01G4/30 ,  H01S3/0305 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/097 ,  H01S3/2251 ,  H01S3/2256

Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.

Abstract translation: 气体激光装置可以包括：包含激光气体的激光室; 设置在激光室中的第一放电电极; 第二放电电极，设置成与激光室中的第一放电电极相对; 以及包括聚酰亚胺电介质并且被配置为向第一放电电极和第二放电电极之间供电的电容器。

公开(公告)号：US20160365694A1

公开(公告)日：2016-12-15

申请号：US14455719

申请日：2014-08-08

Applicant: GIGAPHOTON INC.

Inventor： Yasufumi KAWASUJI ,  Hideo HOSHINO

IPC: H01S3/02 ,  G03F7/20 ,  F16B7/18 ,  F16B41/00 ,  H05G2/00 ,  F16B5/02

CPC classification number: H01S3/02 ,  F16B5/02 ,  F16B7/18 ,  F16B41/002 ,  G03F7/70008 ,  G03F7/70025 ,  G03F7/70833 ,  G03F7/70975 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser apparatus may include, a first frame and a second frame, a sleeve through-hole provided in the second frame, a sleeve insertion hole provided in the first frame, a bolt, a positioning sleeve that is formed in an approximately cylindrical shape into which the bolt can be inserted and that positions the first frame and the second frame by passing through the sleeve through-hole and being inserted into the sleeve insertion hole, a nut that is provided in the first frame and into which the bolt is screwed, and a fall prevention unit that is provided in the second frame and that prevents the bolt and the positioning sleeve from falling.

Abstract translation: 激光装置可以包括第一框架和第二框架，设置在第二框架中的套筒通孔，设置在第一框架中的套筒插入孔，螺栓，形成为大致圆筒形的定位套筒 螺栓可以插入，并且通过穿过套筒通孔定位第一框架和第二框架并插入到套筒插入孔中，设置在第一框架中并且螺栓被拧入的螺母， 以及设置在第二框架中并防止螺栓和定位套筒掉落的防跌落单元。

公开(公告)号：US09510434B2

公开(公告)日：2016-11-29

申请号：US14824270

申请日：2015-08-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru Mizoguchi ,  Yasufumi Kawasuji ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G21K1/06 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/067 ,  H05G2/003 ,  H05G2/005

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract translation: 提供一种极紫外光发生装置，其可以包括：容纳一种或多种气体的室; 光浓缩光学系统，其设置在从激光单元输出的脉冲激光的光路中，并且将脉冲激光聚焦成浓缩光束; 以及摄像部，其设置在所述脉冲激光的光路外的位置处，并且被配置为拾取作为所述室中的等离子体发射的图像的等离子体发射图像。 等离子体发射是通过将浓缩的束施加到腔室中的一种或多种气体而引起的。