公开(公告)号：US2688094A

公开(公告)日：1954-08-31

申请号：US28694752

申请日：1952-05-09

Applicant: CALIFORNIA INST RES FOUND

Inventor： DUMOND JESSE W M

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

公开(公告)号：US2679474A

公开(公告)日：1954-05-25

申请号：US13620449

申请日：1949-12-31

Applicant: SZMUL PAJES WOLF

Inventor： SZMUL PAJES WOLF

IPC: G02B5/18 ,  G21K1/06 ,  G21K7/00

CPC classification number: G02B5/1876 ,  G21K1/06 ,  G21K7/00 ,  G21K2201/067

公开(公告)号：US2474240A

公开(公告)日：1949-06-28

申请号：US60969545

申请日：1945-08-08

Applicant: HERBERT FRIEDMAN

Inventor： HERBERT FRIEDMAN

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

公开(公告)号：US20240062928A1

公开(公告)日：2024-02-22

申请号：US17892020

申请日：2022-08-19

Applicant: UChicago Argonne, LLC

Inventor： Ayman H. Said ,  Thomas Gog ,  Jung Ho Kim ,  Emily K. Aran

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: The invention provides a method for fabricating analyzers, the method comprising providing a radiation manipulating material on a first surface of a flexible support; contacting a second surface of the flexible support to a permeable mold, wherein the mold has a first flexible support contact surface and a second surface; and applying negative pressure to the second side of the flexible support to cause the flexible support to conform to the first flexible support contact surface of the mold. Also provided is a system for fabricating crystal analyzers, the system comprising crystal structures reversibly attached to a flexible support; a porous mold reversibly contacting the flexible support, wherein the mold defines a topography; and a negative pressure applied to the flexible support to cause the crystal structures to conform to the topography.

公开(公告)号：US20180329308A1

公开(公告)日：2018-11-15

申请号：US16042453

申请日：2018-07-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Christoph Nottbohm

IPC: G03F7/20 ,  G03F1/24 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/70316 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70216 ,  G03F7/70966 ,  G21K1/062 ,  G21K2201/067

Abstract: A reflective optical element for the extreme ultraviolet (EUV) wavelength range having a multi-layer system extending over an area on a substrate. The system includes layers (54, 55′) made of at least two different materials with different real parts of the refractive index in the EUV arranged alternately. A layer of one of the two materials forms a stack with the layer or layers arranged between this layer and the nearest layer of the same material with increasing distance from the substrate. In at least one stack (53′), the material of the layer (55′) with the lower real part of the refractive index and/or the material of the layer (54) with the larger real part of the refractive index is a combination (551, 552) made of at least two substances.

公开(公告)号：US09810993B2

公开(公告)日：2017-11-07

申请号：US15144982

申请日：2016-05-03

Applicant: CARL ZEISS SMT GMBH

Inventor： Peter Huber

IPC: G03F7/20 ,  G02B5/08 ,  G02B5/28 ,  G21K1/06 ,  C23C8/20 ,  C23C28/00 ,  G02B1/14

CPC classification number: G03F7/702 ,  C23C8/20 ,  C23C28/322 ,  C23C28/341 ,  G02B1/14 ,  G02B5/0816 ,  G02B5/085 ,  G02B5/0891 ,  G02B5/28 ,  G03F7/70316 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface (10a), a mirror substrate (11) and a reflection layer stack (12) configured to reflect electromagnetic radiation that is incident on the optically effective surface. A metallic diffusion barrier layer (13) is arranged on that side of the reflection layer stack which faces toward the optically effective surface, and a stabilization layer (14) is arranged on the side of the diffusion barrier layer that faces toward the optically effective surface (10a). The stabilization layer reduces deformation of the diffusion barrier layer compared to an analogous structure without such a stabilization layer upon irradiation of the optically effective surface with electromagnetic radiation. The stabilization layer has a porosity, a relative density of which is no more than 80%, where the relative density is defined as the ratio between geometric density and true density.

公开(公告)号：US20170219503A1

公开(公告)日：2017-08-03

申请号：US15385518

申请日：2016-12-20

Applicant: University of Massachusetts

Inventor： Srinivasan Vedantham ,  Andrew Karellas

IPC: G01N23/20 ,  A61B6/00 ,  G21K1/06 ,  G01N23/04

CPC classification number: G01N23/20075 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/4452 ,  A61B6/484 ,  G01N23/04 ,  G01N2223/313 ,  G01N2223/6126 ,  G21K1/067 ,  G21K2201/067 ,  H05G1/30

Abstract: An x-ray phase contrast imaging apparatus and method of operating the same. The apparatus passes x-rays generated by an x-ray source through, in succession, a source grating, an object of interest, a phase grating, and an analyzer grating. The x-ray source, the source grating, the phase grating, and the analyzer grating move as a single entity relative to an object of interest. The phase grating and the analyzer grating remain in fixed relative location and fixed relative orientation with respect to one another. The detected x-rays are converted to a time sequence of electrical signals. In some cases, the apparatus is controlled, and the electrical signals are analyzed by, by a general purpose programmable computer provided with instructions recorded on a machine readable medium. One or more x-ray phase contrast images of the object of interest are generated, and can be recorded or displayed.

公开(公告)号：US09658533B2

公开(公告)日：2017-05-23

申请号：US14269276

申请日：2014-05-05

Applicant: Carl Zeiss SMT GmbH

Inventor： Johannes Ruoff ,  Heiko Feldmann ,  Michael Layh

IPC: G03B27/54 ,  G03F7/20 ,  G02B5/09 ,  G21K1/06 ,  G02B5/08 ,  B82Y10/00

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70075 ,  G03F7/702 ,  G03F7/70316 ,  G21K1/062 ,  G21K2201/067

Abstract: A mirror for EUV radiation comprises a total reflection surface, which has a first EUV-radiation-reflecting region and at least one second EUV-radiation-reflecting region, wherein the EUV-radiation-reflecting regions are structurally delimited from one another, wherein the first region comprises at least one first partial reflection surface which is surrounded along a circumference in each case by the at least one second region, and wherein the at least one second EUV-radiation-reflecting region comprises at least one second partial reflection surface which is embodied in a path-connected fashion and which is embodied in a continuous fashion.

公开(公告)号：US09632040B2

公开(公告)日：2017-04-25

申请号：US14701812

申请日：2015-05-01

Applicant: The Johns Hopkins University

Inventor： Dan Stutman

IPC: G03H5/00 ,  G01N23/04 ,  G01N23/20 ,  A61B6/00 ,  A61B6/03

CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/502 ,  A61B6/5205 ,  A61B6/5235 ,  G01N23/046 ,  G01N23/20075 ,  G01N2223/33 ,  G02B5/1871 ,  G21K2201/067

Abstract: A differential phase contrast X-ray imaging system includes an X-ray illumination system, a beam splitter arranged in a radiation path of the X-ray illumination system, and a detection system arranged in a radiation path to detect X-rays after passing through the beam splitter.

公开(公告)号：US20170110621A1

公开(公告)日：2017-04-20

申请号：US15275430

申请日：2016-09-25

Applicant: QING QIAN

Inventor： QING QIAN

IPC: H01L31/18 ,  H01L31/08

CPC classification number: G21K1/00 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067 ,  H01L31/085 ,  H01L31/1804

Abstract: A method of preparing two dimension bent X-ray crystal analyzers in strips feature is provided. A crystal wafer in strips is bonded to a curved substrate which offers the desired focus length. A crystal wafer in strips is pressed against the surface of the substrate forming curved shape by anodic bonding or glue bonding. The bonding is permanently formed between crystal wafer and its substrate surface, which makes crystal wafer has same curvature as previously prepared substrate.